JP7069039B2 - 蒸発装置に液体材料を供給するための装置 - Google Patents

蒸発装置に液体材料を供給するための装置 Download PDF

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Publication number
JP7069039B2
JP7069039B2 JP2018557825A JP2018557825A JP7069039B2 JP 7069039 B2 JP7069039 B2 JP 7069039B2 JP 2018557825 A JP2018557825 A JP 2018557825A JP 2018557825 A JP2018557825 A JP 2018557825A JP 7069039 B2 JP7069039 B2 JP 7069039B2
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Japan
Prior art keywords
electromagnetic pump
liquid metal
container
evaporator
vacuum
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JP2018557825A
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English (en)
Japanese (ja)
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JP2019515141A (ja
JP2019515141A5 (enExample
Inventor
エッゾ、ゾエストベルヘン
コリン、コマンダー
ローランド、ヤン、スネイデルス
エデュアルト、パウル、マッテース、バッケル
ピーター、ウィリアム、ヘーゼレット
ダグラス、アレクサンダー、ハミルトン
スティーブン、ジェームズ、ウィディス
ティモシー、ディーン、カイザー
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Tata Steel Nederland Technology BV
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Tata Steel Nederland Technology BV
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Publication of JP2019515141A5 publication Critical patent/JP2019515141A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H02K44/04—Conduction pumps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Jet Pumps And Other Pumps (AREA)
JP2018557825A 2016-05-03 2017-05-01 蒸発装置に液体材料を供給するための装置 Active JP7069039B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168167.1 2016-05-03
EP16168167 2016-05-03
PCT/EP2017/060316 WO2017191082A1 (en) 2016-05-03 2017-05-01 Apparatus for feeding a liquid material to an evaporator device

Publications (3)

Publication Number Publication Date
JP2019515141A JP2019515141A (ja) 2019-06-06
JP2019515141A5 JP2019515141A5 (enExample) 2021-08-12
JP7069039B2 true JP7069039B2 (ja) 2022-05-17

Family

ID=56083902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018557825A Active JP7069039B2 (ja) 2016-05-03 2017-05-01 蒸発装置に液体材料を供給するための装置

Country Status (8)

Country Link
US (1) US11220739B2 (enExample)
EP (1) EP3452633B1 (enExample)
JP (1) JP7069039B2 (enExample)
KR (1) KR102357447B1 (enExample)
CN (1) CN109072414B (enExample)
AU (1) AU2017260147B2 (enExample)
ES (1) ES2787924T3 (enExample)
WO (1) WO2017191082A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2017260148B2 (en) 2016-05-03 2022-08-25 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
JP7315218B2 (ja) * 2019-12-24 2023-07-26 株式会社ヂーマグ 金属溶湯駆動装置および金属溶湯駆動方法
US20240397663A1 (en) * 2023-05-23 2024-11-28 Microsoft Technology Licensing, Llc Systems and methods for magnetic pumping in thermal management devices

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050072361A1 (en) 2003-10-03 2005-04-07 Yimou Yang Multi-layered radiant thermal evaporator and method of use
WO2015067662A1 (en) 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device

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US847395A (en) 1906-04-30 1907-03-19 Ernest Boehm Light-transmitting and light-diffusing object.
US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
IT1130947B (it) * 1980-03-10 1986-06-18 De Dionigi Manlio Perfezionamenti alle pompe elettromagnetiche alternative in particolare per fluidi non viscosi
US4392786A (en) 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
FR2562099B1 (fr) * 1984-03-30 1986-06-20 Commissariat Energie Atomique Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US6362098B1 (en) * 2001-02-28 2002-03-26 Motorola, Inc. Plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
DE102004041855B4 (de) 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
US20100124022A1 (en) * 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
US8920566B2 (en) * 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system
RU2584369C2 (ru) * 2011-01-14 2016-05-20 Арселормитталь Инвестигасион И Десаррольо Устройство автоматического питания промышленного генератора пара металла
CN103188912A (zh) * 2011-12-27 2013-07-03 刘源 使用液态金属工质的藕状规则多孔金属微通道热沉
ES2566607T3 (es) 2012-03-30 2016-04-14 Tata Steel Nederland Technology B.V. Método y aparato para cargar metal líquido en un dispositivo evaporador
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
AU2017260148B2 (en) 2016-05-03 2022-08-25 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050072361A1 (en) 2003-10-03 2005-04-07 Yimou Yang Multi-layered radiant thermal evaporator and method of use
WO2015067662A1 (en) 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
JP2016535173A (ja) 2013-11-05 2016-11-10 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 蒸発器デバイス内の液体金属の組成を制御するための方法および装置

Also Published As

Publication number Publication date
WO2017191082A1 (en) 2017-11-09
EP3452633B1 (en) 2020-03-25
CN109072414A (zh) 2018-12-21
AU2017260147A1 (en) 2018-11-15
CN109072414B (zh) 2022-02-22
JP2019515141A (ja) 2019-06-06
KR102357447B1 (ko) 2022-01-28
KR20190003587A (ko) 2019-01-09
US11220739B2 (en) 2022-01-11
US20190153587A1 (en) 2019-05-23
EP3452633A1 (en) 2019-03-13
AU2017260147B2 (en) 2022-08-25
ES2787924T3 (es) 2020-10-19

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