JP2016535173A - 蒸発器デバイス内の液体金属の組成を制御するための方法および装置 - Google Patents
蒸発器デバイス内の液体金属の組成を制御するための方法および装置 Download PDFInfo
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- JP2016535173A JP2016535173A JP2016551043A JP2016551043A JP2016535173A JP 2016535173 A JP2016535173 A JP 2016535173A JP 2016551043 A JP2016551043 A JP 2016551043A JP 2016551043 A JP2016551043 A JP 2016551043A JP 2016535173 A JP2016535173 A JP 2016535173A
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- 229910001338 liquidmetal Inorganic materials 0.000 title claims abstract description 107
- 239000000203 mixture Substances 0.000 title claims abstract description 87
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000001704 evaporation Methods 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 230000008020 evaporation Effects 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 10
- 230000006698 induction Effects 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 7
- 238000005240 physical vapour deposition Methods 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 239000008199 coating composition Substances 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 239000000155 melt Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000013019 agitation Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
− 液体金属用の第1の容器内に、第1の組成の液体金属を補給するステップと、
− 液体金属用の第2の容器内に、第2の組成の液体金属を補給するステップと、
− 第1の容器の液体金属に、または蒸発器に、第2の組成の液体金属を供給するステップであって、第2の容器内の液体金属の組成が、蒸発器内の液体金属の組成を制御するように選択されるステップと
を含む方法を提供する。
図面を参照して、本発明をさらに説明する。
Claims (14)
- 真空チャンバ内の蒸発器デバイス内の液体金属の組成を制御するための装置であって、前記液体金属は、2種以上の金属を含み、前記装置は、液体金属を含有するための第1の容器および第2の容器と、前記第1の容器から前記蒸発器に前記液体金属を供給する手段と、前記第2の容器から前記第1の容器の前記液体金属に、または前記蒸発器に前記液体金属を供給する手段とを備える装置。
- 前記第1の容器から前記蒸発器に前記液体金属を供給する前記手段が、電磁流体力学式ポンプが設けられた補給ラインを備える、請求項1に記載の装置。
- 前記第1の容器から前記蒸発器に前記液体金属を供給する前記手段が、電磁流体力学式ポンプが設けられた戻りラインを備える、請求項1に記載の装置。
- 前記第2の容器から前記液体金属を供給する前記手段が、電磁流体力学式ポンプが設けられた供給ラインを備える、請求項1〜3のいずれか一項に記載の装置。
- 前記第2の容器の前記供給ラインが、前記第1の容器の前記補給ラインに接続する、請求項1〜4のいずれか一項に記載の装置。
- 前記第1の容器および前記第2の容器に、ならびに前記蒸発器に、レベルセンサが設けられている、請求項1〜5のいずれか一項に記載の装置。
- 前記供給ラインおよび前記戻りラインの両方に流量計が設けられている、請求項1〜6のいずれか一項に記載の装置。
- 前記補給ライン、前記供給ラインおよび前記戻りラインに弁が設けられている、請求項1〜7のいずれか一項に記載の装置。
- 前記蒸発器が、誘導加熱手段を有する、請求項1〜8のいずれか一項に記載の装置。
- 前記補給ライン、前記供給ライン、前記戻りライン、前記弁、前記電磁流体力学式ポンプ、ならびに前記第1の容器および前記第2の容器を加熱するために、加熱手段が設けられている、請求項1〜9のいずれか一項に記載の装置。
- 真空チャンバ内の蒸発器デバイス内の液体金属の組成を制御するための方法であって、前記液体金属は、2種以上の金属を含み、前記方法は、
− 液体金属用の第1の容器内に、第1の組成の液体金属を補給するステップと、
− 液体金属用の第2の容器内に、第2の組成の液体金属を補給するステップと、
− 前記第1の容器の前記液体金属に、または前記蒸発器に、前記第2の組成の前記液体金属を供給するステップであって、前記第2の容器内の前記液体金属の前記組成が、前記蒸発器内の前記液体金属の前記組成を制御するように選択されるステップと
を含む方法。 - 前記第2の容器内の前記液体金属の前記組成が、前記蒸発器からの前記金属の蒸発を補償するように選択される、請求項11に記載の方法。
- 前記第2の容器内の前記液体金属の前記組成が、所定の蒸気組成に対応する、請求項12に記載の方法。
- 前記第2の容器内の前記液体金属の前記組成が、前記第1の容器内の液体金属の所定の組成に対応する、請求項11に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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EP13005206.1 | 2013-11-05 | ||
EP13005206 | 2013-11-05 | ||
PCT/EP2014/073825 WO2015067662A1 (en) | 2013-11-05 | 2014-11-05 | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
Publications (2)
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JP2016535173A true JP2016535173A (ja) | 2016-11-10 |
JP6430528B2 JP6430528B2 (ja) | 2018-11-28 |
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JP2016551043A Active JP6430528B2 (ja) | 2013-11-05 | 2014-11-05 | 蒸発器デバイス内の液体金属の組成を制御するための方法および装置 |
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US (1) | US10131983B2 (ja) |
EP (1) | EP3066229B1 (ja) |
JP (1) | JP6430528B2 (ja) |
KR (1) | KR102242070B1 (ja) |
CN (1) | CN105793464B (ja) |
ES (1) | ES2817842T3 (ja) |
WO (1) | WO2015067662A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019515623A (ja) * | 2016-05-03 | 2019-06-06 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップTata Steel Nederland Technology Bv | 電磁ポンプの温度制御方法 |
JP2019515141A (ja) * | 2016-05-03 | 2019-06-06 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップTata Steel Nederland Technology Bv | 蒸発装置に液体材料を供給するための装置 |
JP2020186463A (ja) * | 2019-05-17 | 2020-11-19 | 株式会社アルバック | スパッタリング装置 |
Families Citing this family (3)
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KR102360308B1 (ko) * | 2016-05-03 | 2022-02-08 | 타타 스틸 네덜란드 테크날러지 베.뷔. | 증발 장치로 액체 금속을 공급하기 위한 장치 작동 방법 |
WO2018020296A1 (en) * | 2016-07-27 | 2018-02-01 | Arcelormittal | Apparatus and method for vacuum deposition |
KR102098455B1 (ko) * | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
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- 2014-11-05 CN CN201480065819.4A patent/CN105793464B/zh not_active Expired - Fee Related
- 2014-11-05 JP JP2016551043A patent/JP6430528B2/ja active Active
- 2014-11-05 ES ES14793569T patent/ES2817842T3/es active Active
- 2014-11-05 KR KR1020167014279A patent/KR102242070B1/ko active IP Right Grant
- 2014-11-05 US US15/032,572 patent/US10131983B2/en active Active
- 2014-11-05 WO PCT/EP2014/073825 patent/WO2015067662A1/en active Application Filing
- 2014-11-05 EP EP14793569.6A patent/EP3066229B1/en active Active
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019515623A (ja) * | 2016-05-03 | 2019-06-06 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップTata Steel Nederland Technology Bv | 電磁ポンプの温度制御方法 |
JP2019515141A (ja) * | 2016-05-03 | 2019-06-06 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップTata Steel Nederland Technology Bv | 蒸発装置に液体材料を供給するための装置 |
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JP7166174B2 (ja) | 2016-05-03 | 2022-11-07 | タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップ | 電磁ポンプの温度制御方法 |
JP2020186463A (ja) * | 2019-05-17 | 2020-11-19 | 株式会社アルバック | スパッタリング装置 |
JP7250614B2 (ja) | 2019-05-17 | 2023-04-03 | 株式会社アルバック | スパッタリング装置 |
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KR20160082523A (ko) | 2016-07-08 |
WO2015067662A1 (en) | 2015-05-14 |
CN105793464A (zh) | 2016-07-20 |
US10131983B2 (en) | 2018-11-20 |
ES2817842T3 (es) | 2021-04-08 |
US20160265102A1 (en) | 2016-09-15 |
EP3066229A1 (en) | 2016-09-14 |
KR102242070B1 (ko) | 2021-04-20 |
EP3066229B1 (en) | 2020-08-26 |
CN105793464B (zh) | 2018-01-02 |
JP6430528B2 (ja) | 2018-11-28 |
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