ES2786975T3 - Método para operar un aparato para alimentar metal líquido a un dispositivo evaporador - Google Patents

Método para operar un aparato para alimentar metal líquido a un dispositivo evaporador Download PDF

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Publication number
ES2786975T3
ES2786975T3 ES17721357T ES17721357T ES2786975T3 ES 2786975 T3 ES2786975 T3 ES 2786975T3 ES 17721357 T ES17721357 T ES 17721357T ES 17721357 T ES17721357 T ES 17721357T ES 2786975 T3 ES2786975 T3 ES 2786975T3
Authority
ES
Spain
Prior art keywords
electromagnetic pump
liquid metal
feed tube
pressure
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES17721357T
Other languages
English (en)
Spanish (es)
Inventor
Edzo Zoestbergen
Colin Commandeur
Roland Snijders
Eduard Bakker
Peter Hazelett
Douglas Hamilton
Stephen Widdis
Timothy Kaiser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tata Steel Nederland Technology BV
Original Assignee
Tata Steel Nederland Technology BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tata Steel Nederland Technology BV filed Critical Tata Steel Nederland Technology BV
Application granted granted Critical
Publication of ES2786975T3 publication Critical patent/ES2786975T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K44/00Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02Electrodynamic pumps
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K44/00Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02Electrodynamic pumps
    • H02K44/04Conduction pumps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
ES17721357T 2016-05-03 2017-05-01 Método para operar un aparato para alimentar metal líquido a un dispositivo evaporador Active ES2786975T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP16168162 2016-05-03
PCT/EP2017/060317 WO2017191083A1 (en) 2016-05-03 2017-05-01 Method to operate an apparatus for feeding liquid metal to an evaporator device

Publications (1)

Publication Number Publication Date
ES2786975T3 true ES2786975T3 (es) 2020-10-14

Family

ID=56083901

Family Applications (1)

Application Number Title Priority Date Filing Date
ES17721357T Active ES2786975T3 (es) 2016-05-03 2017-05-01 Método para operar un aparato para alimentar metal líquido a un dispositivo evaporador

Country Status (8)

Country Link
US (1) US11414744B2 (enExample)
EP (1) EP3452631B1 (enExample)
JP (1) JP7182466B2 (enExample)
KR (1) KR102360308B1 (enExample)
CN (1) CN109072410B (enExample)
AU (1) AU2017260148B2 (enExample)
ES (1) ES2786975T3 (enExample)
WO (1) WO2017191083A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador
CN107761058B (zh) * 2017-11-14 2018-11-13 中国科学院光电研究院 多元合金薄膜的制备装置及其制备方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN115094385A (zh) * 2022-07-21 2022-09-23 浙江艾微普科技有限公司 一种含有液体供给系统的镀膜设备和镀膜方法
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
JPS5938379B2 (ja) 1979-09-14 1984-09-17 松下電工株式会社 屋根材
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US7339139B2 (en) 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) * 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
JP5259452B2 (ja) * 2008-06-19 2013-08-07 一般財団法人電力中央研究所 電磁ポンプ吐出量測定方法
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
KR101639811B1 (ko) 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
AU2013242397B2 (en) 2012-03-30 2017-06-15 Posco Method and apparatus for feeding liquid metal to an evaporator device
CN105793464B (zh) 2013-11-05 2018-01-02 塔塔钢铁荷兰科技有限责任公司 用于控制蒸发器装置中的液体金属的组成的方法和设备
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador

Also Published As

Publication number Publication date
JP7182466B2 (ja) 2022-12-02
EP3452631A1 (en) 2019-03-13
KR102360308B1 (ko) 2022-02-08
WO2017191083A1 (en) 2017-11-09
AU2017260148A1 (en) 2018-11-15
AU2017260148B2 (en) 2022-08-25
US11414744B2 (en) 2022-08-16
EP3452631B1 (en) 2020-03-25
CN109072410B (zh) 2021-05-07
JP2019515140A (ja) 2019-06-06
KR20190003589A (ko) 2019-01-09
US20190264320A1 (en) 2019-08-29
CN109072410A (zh) 2018-12-21

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