KR102360308B1 - 증발 장치로 액체 금속을 공급하기 위한 장치 작동 방법 - Google Patents

증발 장치로 액체 금속을 공급하기 위한 장치 작동 방법 Download PDF

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Publication number
KR102360308B1
KR102360308B1 KR1020187033592A KR20187033592A KR102360308B1 KR 102360308 B1 KR102360308 B1 KR 102360308B1 KR 1020187033592 A KR1020187033592 A KR 1020187033592A KR 20187033592 A KR20187033592 A KR 20187033592A KR 102360308 B1 KR102360308 B1 KR 102360308B1
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KR
South Korea
Prior art keywords
electromagnetic pump
liquid metal
pressure
pressure control
control enclosure
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Expired - Fee Related
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KR1020187033592A
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English (en)
Korean (ko)
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KR20190003589A (ko
Inventor
에드조 조에스트버겐
콜린 코망되르
롤란드 얀 스니즈더스
에두아르드 폴 매튜스 배커
피터 윌리엄 헤이즐럿
더글라스 알렉산 해밀톤
스티븐 제임스 위디스
티모시 딘 카이저
Original Assignee
타타 스틸 네덜란드 테크날러지 베.뷔.
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Publication of KR20190003589A publication Critical patent/KR20190003589A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H02K44/04—Conduction pumps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
KR1020187033592A 2016-05-03 2017-05-01 증발 장치로 액체 금속을 공급하기 위한 장치 작동 방법 Expired - Fee Related KR102360308B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168162 2016-05-03
EP16168162.2 2016-05-03
PCT/EP2017/060317 WO2017191083A1 (en) 2016-05-03 2017-05-01 Method to operate an apparatus for feeding liquid metal to an evaporator device

Publications (2)

Publication Number Publication Date
KR20190003589A KR20190003589A (ko) 2019-01-09
KR102360308B1 true KR102360308B1 (ko) 2022-02-08

Family

ID=56083901

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187033592A Expired - Fee Related KR102360308B1 (ko) 2016-05-03 2017-05-01 증발 장치로 액체 금속을 공급하기 위한 장치 작동 방법

Country Status (8)

Country Link
US (1) US11414744B2 (enExample)
EP (1) EP3452631B1 (enExample)
JP (1) JP7182466B2 (enExample)
KR (1) KR102360308B1 (enExample)
CN (1) CN109072410B (enExample)
AU (1) AU2017260148B2 (enExample)
ES (1) ES2786975T3 (enExample)
WO (1) WO2017191083A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
EP3452633B1 (en) 2016-05-03 2020-03-25 Tata Steel Nederland Technology B.V. Apparatus for feeding a liquid metal to an evaporator device
CN107761058B (zh) * 2017-11-14 2018-11-13 中国科学院光电研究院 多元合金薄膜的制备装置及其制备方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN115094385A (zh) * 2022-07-21 2022-09-23 浙江艾微普科技有限公司 一种含有液体供给系统的镀膜设备和镀膜方法
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit

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US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
JPS5938379B2 (ja) 1979-09-14 1984-09-17 松下電工株式会社 屋根材
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US7339139B2 (en) 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
JP5259452B2 (ja) * 2008-06-19 2013-08-07 一般財団法人電力中央研究所 電磁ポンプ吐出量測定方法
KR101639811B1 (ko) 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
ES2566607T3 (es) * 2012-03-30 2016-04-14 Tata Steel Nederland Technology B.V. Método y aparato para cargar metal líquido en un dispositivo evaporador
WO2015067662A1 (en) * 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
CN204805055U (zh) * 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
EP3452633B1 (en) 2016-05-03 2020-03-25 Tata Steel Nederland Technology B.V. Apparatus for feeding a liquid metal to an evaporator device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit

Also Published As

Publication number Publication date
CN109072410B (zh) 2021-05-07
CN109072410A (zh) 2018-12-21
AU2017260148A1 (en) 2018-11-15
WO2017191083A1 (en) 2017-11-09
EP3452631A1 (en) 2019-03-13
JP7182466B2 (ja) 2022-12-02
US11414744B2 (en) 2022-08-16
ES2786975T3 (es) 2020-10-14
JP2019515140A (ja) 2019-06-06
US20190264320A1 (en) 2019-08-29
EP3452631B1 (en) 2020-03-25
AU2017260148B2 (en) 2022-08-25
KR20190003589A (ko) 2019-01-09

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