CN109072410B - 操作用于将液态金属供给至蒸发器设备的装置的方法 - Google Patents

操作用于将液态金属供给至蒸发器设备的装置的方法 Download PDF

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Publication number
CN109072410B
CN109072410B CN201780027325.0A CN201780027325A CN109072410B CN 109072410 B CN109072410 B CN 109072410B CN 201780027325 A CN201780027325 A CN 201780027325A CN 109072410 B CN109072410 B CN 109072410B
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China
Prior art keywords
electromagnetic pump
liquid metal
pressure control
pressure
control housing
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CN201780027325.0A
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English (en)
Chinese (zh)
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CN109072410A (zh
Inventor
E·策斯特贝尔根
C·科芒德尔
R·J·斯尼耶德斯
E·P·M·巴克
P·W·哈泽勒特
D·A·哈密尔顿
S·J·威狄斯
T·D·凯泽
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Tata Steel Nederland Technology BV
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Tata Steel Nederland Technology BV
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H02K44/04—Conduction pumps

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
CN201780027325.0A 2016-05-03 2017-05-01 操作用于将液态金属供给至蒸发器设备的装置的方法 Active CN109072410B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168162 2016-05-03
EP16168162.2 2016-05-03
PCT/EP2017/060317 WO2017191083A1 (en) 2016-05-03 2017-05-01 Method to operate an apparatus for feeding liquid metal to an evaporator device

Publications (2)

Publication Number Publication Date
CN109072410A CN109072410A (zh) 2018-12-21
CN109072410B true CN109072410B (zh) 2021-05-07

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CN201780027325.0A Active CN109072410B (zh) 2016-05-03 2017-05-01 操作用于将液态金属供给至蒸发器设备的装置的方法

Country Status (8)

Country Link
US (1) US11414744B2 (enExample)
EP (1) EP3452631B1 (enExample)
JP (1) JP7182466B2 (enExample)
KR (1) KR102360308B1 (enExample)
CN (1) CN109072410B (enExample)
AU (1) AU2017260148B2 (enExample)
ES (1) ES2786975T3 (enExample)
WO (1) WO2017191083A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador
CN107761058B (zh) * 2017-11-14 2018-11-13 中国科学院光电研究院 多元合金薄膜的制备装置及其制备方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN115094385A (zh) * 2022-07-21 2022-09-23 浙江艾微普科技有限公司 一种含有液体供给系统的镀膜设备和镀膜方法
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
CN1969056A (zh) * 2004-04-27 2007-05-23 冯·阿德纳设备有限公司 连续热真空沉积装置和方法
CN104395495A (zh) * 2012-03-30 2015-03-04 塔塔钢铁荷兰科技有限责任公司 用于将液态金属供给到蒸发器装置的方法和设备
WO2015067662A1 (en) * 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
CN204805055U (zh) * 2015-04-29 2015-11-25 周小林 电磁泵

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US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
JPS5938379B2 (ja) 1979-09-14 1984-09-17 松下電工株式会社 屋根材
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US7339139B2 (en) 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
JP5259452B2 (ja) * 2008-06-19 2013-08-07 一般財団法人電力中央研究所 電磁ポンプ吐出量測定方法
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
KR101639811B1 (ko) 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
CN1969056A (zh) * 2004-04-27 2007-05-23 冯·阿德纳设备有限公司 连续热真空沉积装置和方法
CN104395495A (zh) * 2012-03-30 2015-03-04 塔塔钢铁荷兰科技有限责任公司 用于将液态金属供给到蒸发器装置的方法和设备
WO2015067662A1 (en) * 2013-11-05 2015-05-14 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
CN204805055U (zh) * 2015-04-29 2015-11-25 周小林 电磁泵

Also Published As

Publication number Publication date
JP7182466B2 (ja) 2022-12-02
ES2786975T3 (es) 2020-10-14
EP3452631A1 (en) 2019-03-13
KR102360308B1 (ko) 2022-02-08
WO2017191083A1 (en) 2017-11-09
AU2017260148A1 (en) 2018-11-15
AU2017260148B2 (en) 2022-08-25
US11414744B2 (en) 2022-08-16
EP3452631B1 (en) 2020-03-25
JP2019515140A (ja) 2019-06-06
KR20190003589A (ko) 2019-01-09
US20190264320A1 (en) 2019-08-29
CN109072410A (zh) 2018-12-21

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