JP7182466B2 - 液体金属を蒸発装置に供給するための装置を操作するための方法 - Google Patents

液体金属を蒸発装置に供給するための装置を操作するための方法 Download PDF

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Publication number
JP7182466B2
JP7182466B2 JP2018557815A JP2018557815A JP7182466B2 JP 7182466 B2 JP7182466 B2 JP 7182466B2 JP 2018557815 A JP2018557815 A JP 2018557815A JP 2018557815 A JP2018557815 A JP 2018557815A JP 7182466 B2 JP7182466 B2 JP 7182466B2
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Japan
Prior art keywords
electromagnetic pump
liquid metal
pressure
evaporator
supply pipe
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JP2018557815A
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English (en)
Japanese (ja)
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JP2019515140A5 (enExample
JP2019515140A (ja
Inventor
エッゾ、ゾエストベルヘン
コリン、コマンダー
ローランド、ヤン、スネイデルス
エデュアルト、パウル、マッテース、バッケル
ピーター、ウィリアム、ヘーゼレット
ダグラス、アレクサンダー、ハミルトン
スティーブン、ジェームズ、ウィディス
ティモシー、ディーン、カイザー
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Tata Steel Nederland Technology BV
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Tata Steel Nederland Technology BV
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Publication of JP2019515140A5 publication Critical patent/JP2019515140A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K44/00—Machines in which the dynamo-electric interaction between a plasma or flow of conductive liquid or of fluid-borne conductive or magnetic particles and a coil system or magnetic field converts energy of mass flow into electrical energy or vice versa
    • H02K44/02—Electrodynamic pumps
    • H02K44/04—Conduction pumps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
JP2018557815A 2016-05-03 2017-05-01 液体金属を蒸発装置に供給するための装置を操作するための方法 Active JP7182466B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16168162 2016-05-03
EP16168162.2 2016-05-03
PCT/EP2017/060317 WO2017191083A1 (en) 2016-05-03 2017-05-01 Method to operate an apparatus for feeding liquid metal to an evaporator device

Publications (3)

Publication Number Publication Date
JP2019515140A JP2019515140A (ja) 2019-06-06
JP2019515140A5 JP2019515140A5 (enExample) 2021-08-12
JP7182466B2 true JP7182466B2 (ja) 2022-12-02

Family

ID=56083901

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Application Number Title Priority Date Filing Date
JP2018557815A Active JP7182466B2 (ja) 2016-05-03 2017-05-01 液体金属を蒸発装置に供給するための装置を操作するための方法

Country Status (8)

Country Link
US (1) US11414744B2 (enExample)
EP (1) EP3452631B1 (enExample)
JP (1) JP7182466B2 (enExample)
KR (1) KR102360308B1 (enExample)
CN (1) CN109072410B (enExample)
AU (1) AU2017260148B2 (enExample)
ES (1) ES2786975T3 (enExample)
WO (1) WO2017191083A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador
CN107761058B (zh) * 2017-11-14 2018-11-13 中国科学院光电研究院 多元合金薄膜的制备装置及其制备方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN115094385A (zh) * 2022-07-21 2022-09-23 浙江艾微普科技有限公司 一种含有液体供给系统的镀膜设备和镀膜方法
CN118756099B (zh) * 2024-09-09 2024-12-17 湘潭宏大真空技术股份有限公司 一种用于af膜的蒸发镀膜装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015519469A (ja) 2012-03-30 2015-07-09 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 液体金属を蒸発器に供給する方法および装置

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US2664852A (en) 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US3059612A (en) 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3581766A (en) 1968-08-02 1971-06-01 Jones & Laughlin Steel Corp Supplying liquid to a vacuum chamber
US3550924A (en) 1968-12-06 1970-12-29 United States Steel Corp Mechanism for controlling flow of liquid to a vacuum-treating vessel
JPS5938379B2 (ja) 1979-09-14 1984-09-17 松下電工株式会社 屋根材
US4392786A (en) * 1980-10-16 1983-07-12 Merenkov Jury F Electromagnetic induction pump
JPS5938379A (ja) 1982-08-26 1984-03-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置のスタ−トアツプ法
JP3452617B2 (ja) * 1993-12-10 2003-09-29 真空冶金株式会社 ガスデポジション装置
US7339139B2 (en) 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
DE102004041855B4 (de) * 2004-04-27 2007-09-13 Von Ardenne Anlagentechnik Gmbh Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung
JP5259452B2 (ja) * 2008-06-19 2013-08-07 一般財団法人電力中央研究所 電磁ポンプ吐出量測定方法
US20100124022A1 (en) 2008-11-14 2010-05-20 Suad Causevic Thermoelectric cooling apparatus and method for cooling an integrated circuit
KR101639811B1 (ko) 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
EP2652167B1 (en) 2010-12-13 2015-04-08 Posco Continuous coating apparatus
CN105793464B (zh) 2013-11-05 2018-01-02 塔塔钢铁荷兰科技有限责任公司 用于控制蒸发器装置中的液体金属的组成的方法和设备
CN204805055U (zh) 2015-04-29 2015-11-25 周小林 电磁泵
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
ES2787924T3 (es) 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015519469A (ja) 2012-03-30 2015-07-09 タタ、スティール、ネダーランド、テクノロジー、ベスローテン、フェンノートシャップＴａｔａ Ｓｔｅｅｌ Ｎｅｄｅｒｌａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｂｖ 液体金属を蒸発器に供給する方法および装置

Also Published As

Publication number Publication date
ES2786975T3 (es) 2020-10-14
EP3452631A1 (en) 2019-03-13
KR102360308B1 (ko) 2022-02-08
WO2017191083A1 (en) 2017-11-09
AU2017260148A1 (en) 2018-11-15
AU2017260148B2 (en) 2022-08-25
US11414744B2 (en) 2022-08-16
EP3452631B1 (en) 2020-03-25
CN109072410B (zh) 2021-05-07
JP2019515140A (ja) 2019-06-06
KR20190003589A (ko) 2019-01-09
US20190264320A1 (en) 2019-08-29
CN109072410A (zh) 2018-12-21

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