JP2019158926A5 - - Google Patents

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Publication number
JP2019158926A5
JP2019158926A5 JP2018041198A JP2018041198A JP2019158926A5 JP 2019158926 A5 JP2019158926 A5 JP 2019158926A5 JP 2018041198 A JP2018041198 A JP 2018041198A JP 2018041198 A JP2018041198 A JP 2018041198A JP 2019158926 A5 JP2019158926 A5 JP 2019158926A5
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JP
Japan
Prior art keywords
pattern forming
light
alignment mark
forming apparatus
substrate
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JP2018041198A
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English (en)
Japanese (ja)
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JP7114277B2 (ja
JP2019158926A (ja
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Priority claimed from JP2018041198A external-priority patent/JP7114277B2/ja
Priority to JP2018041198A priority Critical patent/JP7114277B2/ja
Priority to EP19160584.9A priority patent/EP3537219B1/en
Priority to TW108106986A priority patent/TWI722394B/zh
Priority to US16/292,953 priority patent/US10747116B2/en
Priority to CN201910167636.8A priority patent/CN110244519B/zh
Publication of JP2019158926A publication Critical patent/JP2019158926A/ja
Publication of JP2019158926A5 publication Critical patent/JP2019158926A5/ja
Publication of JP7114277B2 publication Critical patent/JP7114277B2/ja
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JP2018041198A 2018-03-07 2018-03-07 パターン形成装置及び物品の製造方法 Active JP7114277B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2018041198A JP7114277B2 (ja) 2018-03-07 2018-03-07 パターン形成装置及び物品の製造方法
EP19160584.9A EP3537219B1 (en) 2018-03-07 2019-03-04 Pattern forming apparatus and article manufacturing method
TW108106986A TWI722394B (zh) 2018-03-07 2019-03-04 圖案形成裝置及物品製造方法
US16/292,953 US10747116B2 (en) 2018-03-07 2019-03-05 Pattern forming apparatus and article manufacturing method
CN201910167636.8A CN110244519B (zh) 2018-03-07 2019-03-06 图案形成装置、基板保持装置和物品制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018041198A JP7114277B2 (ja) 2018-03-07 2018-03-07 パターン形成装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2019158926A JP2019158926A (ja) 2019-09-19
JP2019158926A5 true JP2019158926A5 (enExample) 2021-04-15
JP7114277B2 JP7114277B2 (ja) 2022-08-08

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ID=65686727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018041198A Active JP7114277B2 (ja) 2018-03-07 2018-03-07 パターン形成装置及び物品の製造方法

Country Status (5)

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US (1) US10747116B2 (enExample)
EP (1) EP3537219B1 (enExample)
JP (1) JP7114277B2 (enExample)
CN (1) CN110244519B (enExample)
TW (1) TWI722394B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6980562B2 (ja) * 2018-02-28 2021-12-15 キヤノン株式会社 パターン形成装置、アライメントマークの検出方法及びパターン形成方法
JP7659388B2 (ja) 2020-12-08 2025-04-09 キヤノン株式会社 検出装置、検出方法、露光装置、露光システム、物品製造方法、およびプログラム
CN114047137B (zh) * 2021-09-28 2023-09-12 深圳市麓邦技术有限公司 偏振信息转化或复制拼接方法
CN118448324B (zh) * 2024-03-27 2025-06-06 深圳稳顶聚芯技术有限公司 对准装置及对准方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62262426A (ja) * 1986-05-09 1987-11-14 Canon Inc 露光装置
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
JP2535889B2 (ja) * 1987-03-26 1996-09-18 株式会社ニコン 投影光学装置
JP2803667B2 (ja) * 1997-11-17 1998-09-24 株式会社ニコン 露光方法
JP2001356488A (ja) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd レーザ描画装置
US7113258B2 (en) * 2001-01-15 2006-09-26 Asml Netherlands B.V. Lithographic apparatus
US6768539B2 (en) * 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus
JP2003233198A (ja) * 2002-02-12 2003-08-22 Konica Corp 画像露光装置
US20090128792A1 (en) * 2007-10-19 2009-05-21 Asml Netherlands B.V. Lithographic apparatus and method
NL1036308A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Lithographic method.
CN102483580B (zh) * 2009-08-20 2015-04-01 株式会社尼康 物体处理装置、曝光装置及曝光方法、以及元件制造方法
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
JP6116456B2 (ja) * 2013-09-25 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス 描画方法および描画装置
CN105807578A (zh) * 2014-12-29 2016-07-27 上海微电子装备有限公司 一种背面对准测量装置及方法
JP6207671B1 (ja) * 2016-06-01 2017-10-04 キヤノン株式会社 パターン形成装置、基板配置方法及び物品の製造方法

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