JP2019153537A5 - - Google Patents

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Publication number
JP2019153537A5
JP2019153537A5 JP2018039636A JP2018039636A JP2019153537A5 JP 2019153537 A5 JP2019153537 A5 JP 2019153537A5 JP 2018039636 A JP2018039636 A JP 2018039636A JP 2018039636 A JP2018039636 A JP 2018039636A JP 2019153537 A5 JP2019153537 A5 JP 2019153537A5
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JP
Japan
Prior art keywords
detector
poles
intensity
electron beam
reflected electrons
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JP2018039636A
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English (en)
Japanese (ja)
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JP7017437B2 (ja
JP2019153537A (ja
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Priority claimed from JP2018039636A external-priority patent/JP7017437B2/ja
Priority to JP2018039636A priority Critical patent/JP7017437B2/ja
Priority to PCT/JP2019/008066 priority patent/WO2019172115A1/ja
Priority to US16/977,808 priority patent/US11322332B2/en
Priority to KR1020207027569A priority patent/KR102764341B1/ko
Priority to CN201980016742.4A priority patent/CN111801764B/zh
Priority to TW108107245A priority patent/TWI784138B/zh
Publication of JP2019153537A publication Critical patent/JP2019153537A/ja
Publication of JP2019153537A5 publication Critical patent/JP2019153537A5/ja
Publication of JP7017437B2 publication Critical patent/JP7017437B2/ja
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JP2018039636A 2018-03-06 2018-03-06 反射電子のエネルギースペクトルを測定する装置および方法 Active JP7017437B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2018039636A JP7017437B2 (ja) 2018-03-06 2018-03-06 反射電子のエネルギースペクトルを測定する装置および方法
CN201980016742.4A CN111801764B (zh) 2018-03-06 2019-03-01 测定背散射电子能谱的装置及方法
US16/977,808 US11322332B2 (en) 2018-03-06 2019-03-01 Apparatus and method for measuring energy spectrum of backscattered electrons
KR1020207027569A KR102764341B1 (ko) 2018-03-06 2019-03-01 반사 전자의 에너지 스펙트럼을 측정하는 장치 및 방법
PCT/JP2019/008066 WO2019172115A1 (ja) 2018-03-06 2019-03-01 反射電子のエネルギースペクトルを測定する装置および方法
TW108107245A TWI784138B (zh) 2018-03-06 2019-03-05 測量反射電子的能量頻譜的裝置及方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018039636A JP7017437B2 (ja) 2018-03-06 2018-03-06 反射電子のエネルギースペクトルを測定する装置および方法

Publications (3)

Publication Number Publication Date
JP2019153537A JP2019153537A (ja) 2019-09-12
JP2019153537A5 true JP2019153537A5 (enExample) 2021-04-01
JP7017437B2 JP7017437B2 (ja) 2022-02-08

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JP2018039636A Active JP7017437B2 (ja) 2018-03-06 2018-03-06 反射電子のエネルギースペクトルを測定する装置および方法

Country Status (6)

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US (1) US11322332B2 (enExample)
JP (1) JP7017437B2 (enExample)
KR (1) KR102764341B1 (enExample)
CN (1) CN111801764B (enExample)
TW (1) TWI784138B (enExample)
WO (1) WO2019172115A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112071731B (zh) * 2020-07-23 2021-11-19 西安交通大学 一种基于维恩分析器校正二阶像差的设计方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4216730C2 (de) 1992-05-20 2003-07-24 Advantest Corp Rasterelektronenstrahlgerät
DE69920182T2 (de) 1998-12-17 2005-02-17 Fei Co., Hillsboro Korpuskularstrahloptisches gerät mit auger-elektronendetektion
KR101110224B1 (ko) * 2003-01-27 2012-02-15 가부시끼가이샤 도시바 샘플에서 반사된 전자들을 이용하여 샘플을 검사하는 맵핑 투영식 전자빔 장치
JP4256300B2 (ja) * 2004-05-28 2009-04-22 株式会社東芝 基板検査方法および基板検査装置
JP2006114225A (ja) 2004-10-12 2006-04-27 Hitachi High-Technologies Corp 荷電粒子線装置
KR101127813B1 (ko) 2004-12-29 2012-03-26 엘지디스플레이 주식회사 쉬프트 레지스터와 이를 이용한 액정 표시장치
US7205542B1 (en) * 2005-11-14 2007-04-17 Kla-Tencor Technologies Corporation Scanning electron microscope with curved axes
US7818073B2 (en) * 2006-04-20 2010-10-19 Asml Netherlands B.V. Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method
US7755043B1 (en) * 2007-03-21 2010-07-13 Kla-Tencor Technologies Corporation Bright-field/dark-field detector with integrated electron energy spectrometer
DE102008041815A1 (de) * 2008-09-04 2010-04-15 Carl Zeiss Nts Gmbh Verfahren zur Analyse einer Probe
JP5771628B2 (ja) * 2010-12-16 2015-09-02 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びそれを用いた測長方法
CN103890895B (zh) * 2011-09-27 2016-05-18 Snu精度株式会社 具备反射电子检测功能的扫描电子显微镜
US9053900B2 (en) * 2012-04-03 2015-06-09 Kla-Tencor Corporation Apparatus and methods for high-resolution electron beam imaging
EP2824445B1 (en) * 2013-07-08 2016-03-02 Fei Company Charged-particle microscopy combined with raman spectroscopy
US10103002B1 (en) * 2016-05-20 2018-10-16 Carl Zeiss Microscopy Gmbh Method for generating an image of an object and particle beam device for carrying out the method
US20180005797A1 (en) * 2016-06-29 2018-01-04 Ngr Inc. Scanning electron microscope
JP6932565B2 (ja) * 2017-06-23 2021-09-08 Ｔａｓｍｉｔ株式会社 パターン欠陥検出方法
JP7107653B2 (ja) * 2017-08-31 2022-07-27 東レエンジニアリング先端半導体Ｍｉテクノロジー株式会社 画像生成方法

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