JP2019016600A5 - - Google Patents

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JP2019016600A5
JP2019016600A5 JP2018130626A JP2018130626A JP2019016600A5 JP 2019016600 A5 JP2019016600 A5 JP 2019016600A5 JP 2018130626 A JP2018130626 A JP 2018130626A JP 2018130626 A JP2018130626 A JP 2018130626A JP 2019016600 A5 JP2019016600 A5 JP 2019016600A5
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Japan
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calibration surface
charged particle
light
area
light beam
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JP2018130626A
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JP6951298B2 (ja
JP2019016600A (ja
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JP2018130626A 2017-07-10 2018-07-10 荷電粒子ビームに光ビームをアライメントするための方法 Active JP6951298B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762530829P 2017-07-10 2017-07-10
US62/530,829 2017-07-10

Publications (3)

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JP2019016600A JP2019016600A (ja) 2019-01-31
JP2019016600A5 true JP2019016600A5 (enExample) 2021-07-26
JP6951298B2 JP6951298B2 (ja) 2021-10-20

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JP2018130626A Active JP6951298B2 (ja) 2017-07-10 2018-07-10 荷電粒子ビームに光ビームをアライメントするための方法

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US (1) US10777383B2 (enExample)
EP (1) EP3428950B1 (enExample)
JP (1) JP6951298B2 (enExample)
KR (1) KR102410589B1 (enExample)
CN (1) CN109243953B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10896802B2 (en) * 2017-12-27 2021-01-19 Fei Company Combined SEM-CL and FIB-IOE microscopy
KR102456983B1 (ko) * 2018-09-11 2022-10-21 주식회사 히타치하이테크 전자선 장치
DE102019203493A1 (de) * 2019-03-14 2020-09-17 BLZ Bayerisches Laserzentrum Gemeinnützige Forschungsgesellschaft mbH Verfahren zur ultrahochaufgelösten Modifikation, insbesondere zur physischen Materialabtragung oder internen Materialänderung, eines Werkstücks
CN110346400A (zh) * 2019-06-18 2019-10-18 北京科技大学 一种模拟火炮烧蚀的试验装置及方法
TWI845751B (zh) 2019-08-30 2024-06-21 荷蘭商Ａｓｍｌ荷蘭公司 帶電粒子束系統及成像方法
JP7148467B2 (ja) * 2019-08-30 2022-10-05 株式会社日立ハイテク 荷電粒子線装置
JP7308710B2 (ja) * 2019-09-25 2023-07-14 株式会社日立ハイテクサイエンス 集束イオンビーム装置
US11257657B2 (en) * 2020-02-18 2022-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with interferometer for height measurement
DE102020115869A1 (de) * 2020-06-16 2021-12-16 RUHR-UNIVERSITäT BOCHUM Herstellung eines Objekts mittels Zwei-Photonen-Polymerisation
CN113964006B (zh) * 2020-07-21 2023-09-12 聚束科技（北京）有限公司 一种粒子束装置束斑追踪方法及系统
TWI727869B (zh) * 2020-07-27 2021-05-11 聚威科技股份有限公司 光學顯微鏡之雷射加工之能量動態調整方法與光斑大小動態調整方法
KR20230118110A (ko) * 2020-12-16 2023-08-10 에이에스엠엘 네델란즈 비.브이. Acc 모듈에 의한 하전 입자 시스템의 열-지원 검사
CN114047657B (zh) * 2021-12-13 2025-05-23 国开启科量子技术(北京)有限公司 一种粒子的照亮装置
CN113984821B (zh) * 2021-12-29 2022-03-11 中国科学院地质与地球物理研究所 纳米结构三维成像系统与方法
US12165832B2 (en) * 2021-12-31 2024-12-10 Fei Company Systems and methods for performing sample lift-out for highly reactive materials
WO2023187876A1 (ja) * 2022-03-28 2023-10-05 株式会社日立ハイテク 荷電粒子線装置の調整方法及び荷電粒子線装置
CN115128788B (zh) * 2022-05-30 2023-11-28 中国人民解放军国防科技大学 与观测物平行的水平放置显微装置
CN115083869B (zh) * 2022-06-06 2025-09-26 惠然科技有限公司 机械对中装置及电子显微镜
US12237142B2 (en) * 2022-06-16 2025-02-25 Fei Company Methods for determining the virtual source location of a liquid metal ion source
US11658001B1 (en) * 2022-12-07 2023-05-23 Institute Of Geology And Geophysics, Chinese Academy Of Sciences Ion beam cutting calibration system and method
KR102850108B1 (ko) 2023-11-01 2025-08-28 씨아이에스(주) 유센트릭 스테이지용 클램핑장치
KR102850109B1 (ko) 2023-11-01 2025-08-28 씨아이에스(주) 유센트릭 스테이지
CN118039438B (zh) * 2024-02-23 2024-09-20 深圳市鹏芯微集成电路制造有限公司 离子注入机的校准设备及校准方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0815064B2 (ja) * 1987-11-25 1996-02-14 株式会社日立製作所 集束エネルギービーム加工装置および加工方法
JPH10312768A (ja) * 1997-05-15 1998-11-24 Hitachi Ltd 集束イオンビーム装置
US6627903B1 (en) * 2000-09-11 2003-09-30 Nikon Corporation Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same
JP2003016988A (ja) * 2001-06-27 2003-01-17 Fujitsu Ltd フォーカストイオンビーム装置及びそれを利用したフォーカストイオンビーム加工方法
US6855622B2 (en) 2002-05-30 2005-02-15 Nptest, Llc Method and apparatus for forming a cavity in a semiconductor substrate using a charged particle beam
WO2010052854A1 (ja) * 2008-11-05 2010-05-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE102009015341A1 (de) 2009-03-27 2010-10-07 Carl Zeiss Ag Verfahren und Vorrichtungen zur optischen Untersuchung von Proben
KR101854287B1 (ko) 2010-04-07 2018-05-03 에프이아이 컴파니 레이저 및 하전 입자 빔 시스템 결합
EP2601477B1 (en) * 2010-08-02 2021-09-22 Oxford Instruments America, Inc. Method for acquiring simultaneous and overlapping optical and charged particle beam images
US8766213B2 (en) * 2012-09-07 2014-07-01 Fei Company Automated method for coincident alignment of a laser beam and a charged particle beam
US9991090B2 (en) * 2012-11-15 2018-06-05 Fei Company Dual laser beam system used with an electron microscope and FIB
JP6232195B2 (ja) 2013-03-21 2017-11-15 株式会社荏原製作所 試料検査装置及び試料の検査方法

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