JP2019009175A - 切削装置 - Google Patents
切削装置 Download PDFInfo
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- JP2019009175A JP2019009175A JP2017121271A JP2017121271A JP2019009175A JP 2019009175 A JP2019009175 A JP 2019009175A JP 2017121271 A JP2017121271 A JP 2017121271A JP 2017121271 A JP2017121271 A JP 2017121271A JP 2019009175 A JP2019009175 A JP 2019009175A
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- 238000005520 cutting process Methods 0.000 title claims abstract description 142
- 238000003384 imaging method Methods 0.000 claims abstract description 56
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 46
- 230000003287 optical effect Effects 0.000 claims abstract description 15
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 230000003028 elevating effect Effects 0.000 description 6
- 230000004308 accommodation Effects 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/24—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising with cutting discs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D7/00—Accessories specially adapted for use with machines or devices of the preceding groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D7/00—Accessories specially adapted for use with machines or devices of the preceding groups
- B28D7/02—Accessories specially adapted for use with machines or devices of the preceding groups for removing or laying dust, e.g. by spraying liquids; for cooling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D7/00—Accessories specially adapted for use with machines or devices of the preceding groups
- B28D7/04—Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/51—Housings
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/54—Mounting of pick-up tubes, electronic image sensors, deviation or focusing coils
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/55—Optical parts specially adapted for electronic image sensors; Mounting thereof
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/57—Mechanical or electrical details of cameras or camera modules specially adapted for being embedded in other devices
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- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Mining & Mineral Resources (AREA)
- Dicing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Milling Processes (AREA)
Abstract
Description
また、板状ワークWの撮像時だけでなく、板状ワークWの切削加工中においても対物レンズ310の直下に渦巻き気流101を備える高圧エア層100を形成することで、対物レンズ310に切削水が付着するのを防ぐことができるため、ケース32の円開口320を閉じるシャッター等を別に備える必要がない。これにより、対物レンズ310を板状ワークWに近づけることが可能となり顕微鏡31の分解能を向上させることができる。
10:保持テーブル 10a:保持面 11:フレーム保持手段 12:フレーム載置台
13:クランプ部
20:切削手段 21:スピンドル 22:スピンドルハウジング 23:切削ブレード
24:ブレードカバー 240:カバー本体 241:第1のブロック
242:第2のブロック 25:切削水供給ノズル 26,26a:配管
27:切削水供給源
30:撮像手段 31:顕微鏡 310:対物レンズ 32:ケース 320:円開口
321:底部 33,33A:エア層形成手段
34:環状エア路 340,341:流入口 35,35A:エア導入口
36:案内板 37:逆環状円錐流路 38:エア噴出口 39:エア供給源
40:移動手段 41:ボールネジ 42:モータ 43:ガイドレール
44:移動ベース
50:割り出し送り手段 51:ボールネジ 52:モータ 53:ガイドレール
54:移動ベース
60:昇降手段 61:ボールネジ 62:モータ 63:ガイドレール 64:昇降板
100:高圧エア層 101:渦巻き気流
Claims (1)
- 被加工物を保持する保持テーブルと、切削ブレードが回転自在に装着され該保持テーブルが保持した被加工物に切削水を供給して切削加工する切削手段と、該保持テーブルが保持した被加工物を上方から撮像する撮像手段と、切削送り方向に該保持テーブルと該撮像手段とを相対的に移動させる移動手段と、を備えた切削装置であって、
該撮像手段は、該保持テーブルが保持した被加工物の上面に対向する対物レンズを備えた顕微鏡と、
該顕微鏡の周囲を覆い該対物レンズの光軸を中心とした撮影用の円開口を備えた環状の底部を有するケースと、
該底部から被加工物に向けてエアを噴出して該底部と被加工物との間に周囲より高圧なエア層を形成するエア層形成手段とを備え、
該エア層形成手段は、該対物レンズの光軸を中心とした環状エア路と、
該環状エア路にエアを導入するエア導入口と、
該エア導入口から導入されたエアを該環状エア路内で一方向に旋回させ渦巻き気流を生成させる案内板と、
該環状エア路から下方に縮径する逆環状円錐流路と、を備え、
該エア層形成手段から噴出したエアにより該対物レンズと被加工物の上面との間で該対物レンズの光軸を中心とした渦巻き気流を備える高圧エア層を形成し、該保持テーブルと該撮像手段とを相対的に該切削送り方向に移動させながら被加工物に形成された切削溝を撮像する際に、該保持テーブルが保持した被加工物の上面に残存する切削水を渦巻き気流で吹き飛ばしながら該切削溝を撮像することを特徴とする切削装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017121271A JP6985034B2 (ja) | 2017-06-21 | 2017-06-21 | 切削装置 |
TW107115386A TWI754746B (zh) | 2017-06-21 | 2018-05-07 | 切削裝置 |
KR1020180066666A KR102504620B1 (ko) | 2017-06-21 | 2018-06-11 | 절삭 장치 |
CN201810634412.9A CN109093863B (zh) | 2017-06-21 | 2018-06-20 | 切削装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017121271A JP6985034B2 (ja) | 2017-06-21 | 2017-06-21 | 切削装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019009175A true JP2019009175A (ja) | 2019-01-17 |
JP6985034B2 JP6985034B2 (ja) | 2021-12-22 |
Family
ID=64844834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017121271A Active JP6985034B2 (ja) | 2017-06-21 | 2017-06-21 | 切削装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6985034B2 (ja) |
KR (1) | KR102504620B1 (ja) |
CN (1) | CN109093863B (ja) |
TW (1) | TWI754746B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230168142A (ko) | 2022-06-03 | 2023-12-12 | 가부시기가이샤 디스코 | 고정 부재, 유체 분사 노즐 기구 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112223431B (zh) | 2019-07-15 | 2022-09-13 | 株式会社牧田 | 自动刨床 |
CN110744729B (zh) * | 2019-09-27 | 2021-09-07 | 湖南怀化永久轻建屋面科技开发有限公司 | 一种仿陶瓷复合板快速切割设备及方法 |
CN113523849A (zh) * | 2021-07-07 | 2021-10-22 | 苏州屹源康机电科技有限公司 | 一种cnc数控机床精密工件加工方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011073080A (ja) * | 2009-09-29 | 2011-04-14 | Disco Abrasive Syst Ltd | 撮像装置 |
KR20120100771A (ko) * | 2011-03-02 | 2012-09-12 | 가부시기가이샤 디스코 | 레이저 가공 장치 |
JP2013045868A (ja) * | 2011-08-24 | 2013-03-04 | Disco Abrasive Syst Ltd | 加工装置 |
JP2015205362A (ja) * | 2014-04-18 | 2015-11-19 | 株式会社ディスコ | レーザ変位計及び研削装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5936845B2 (ja) | 1979-04-10 | 1984-09-06 | 凸版印刷株式会社 | 立体模様を有する合成樹脂成形品の製造方法 |
JP2617001B2 (ja) | 1989-10-12 | 1997-06-04 | 株式会社東京精密 | ダイシングマシン |
JP2005219129A (ja) * | 2004-02-03 | 2005-08-18 | Disco Abrasive Syst Ltd | 切削装置 |
JP4664788B2 (ja) | 2005-09-26 | 2011-04-06 | 株式会社ディスコ | 切削装置 |
JP5060195B2 (ja) * | 2007-08-01 | 2012-10-31 | 株式会社ディスコ | 切削装置 |
JP5399662B2 (ja) * | 2008-08-19 | 2014-01-29 | 株式会社ディスコ | 切削装置 |
JP2012223855A (ja) * | 2011-04-20 | 2012-11-15 | Disco Corp | 加工装置 |
JP5769605B2 (ja) | 2011-12-02 | 2015-08-26 | 株式会社ディスコ | 切削装置 |
CN202747758U (zh) * | 2012-07-20 | 2013-02-20 | 湖北凯乐光电有限公司 | 射频缆轧纹芯线涡流吹干装置 |
JP2015047621A (ja) * | 2013-09-02 | 2015-03-16 | 三菱重工業株式会社 | 複合加工装置及び複合加工方法 |
CN204505011U (zh) * | 2015-02-05 | 2015-07-29 | 浙江杰克机床有限公司 | 一种数字激光端面检测机构 |
JP2016215343A (ja) * | 2015-05-22 | 2016-12-22 | ファナック株式会社 | 清掃手段を備えた工作機械 |
-
2017
- 2017-06-21 JP JP2017121271A patent/JP6985034B2/ja active Active
-
2018
- 2018-05-07 TW TW107115386A patent/TWI754746B/zh active
- 2018-06-11 KR KR1020180066666A patent/KR102504620B1/ko active IP Right Grant
- 2018-06-20 CN CN201810634412.9A patent/CN109093863B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011073080A (ja) * | 2009-09-29 | 2011-04-14 | Disco Abrasive Syst Ltd | 撮像装置 |
KR20120100771A (ko) * | 2011-03-02 | 2012-09-12 | 가부시기가이샤 디스코 | 레이저 가공 장치 |
JP2012179642A (ja) * | 2011-03-02 | 2012-09-20 | Disco Corp | レーザー加工装置 |
JP2013045868A (ja) * | 2011-08-24 | 2013-03-04 | Disco Abrasive Syst Ltd | 加工装置 |
JP2015205362A (ja) * | 2014-04-18 | 2015-11-19 | 株式会社ディスコ | レーザ変位計及び研削装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230168142A (ko) | 2022-06-03 | 2023-12-12 | 가부시기가이샤 디스코 | 고정 부재, 유체 분사 노즐 기구 |
Also Published As
Publication number | Publication date |
---|---|
CN109093863A (zh) | 2018-12-28 |
KR20180138527A (ko) | 2018-12-31 |
KR102504620B1 (ko) | 2023-02-27 |
CN109093863B (zh) | 2021-12-21 |
TWI754746B (zh) | 2022-02-11 |
JP6985034B2 (ja) | 2021-12-22 |
TW201904705A (zh) | 2019-02-01 |
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