JP2018525461A - スルフィド系高分子、これを含むフィルムおよびその製造方法 - Google Patents
スルフィド系高分子、これを含むフィルムおよびその製造方法 Download PDFInfo
- Publication number
- JP2018525461A JP2018525461A JP2017566368A JP2017566368A JP2018525461A JP 2018525461 A JP2018525461 A JP 2018525461A JP 2017566368 A JP2017566368 A JP 2017566368A JP 2017566368 A JP2017566368 A JP 2017566368A JP 2018525461 A JP2018525461 A JP 2018525461A
- Authority
- JP
- Japan
- Prior art keywords
- group
- polymer
- film
- substituted
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- DWSULPIRMPZLJW-UHFFFAOYSA-N CN(C)C(Sc1ccc(C2(c3ccccc3-c3c2cccc3)c(cc2)ccc2SC(N(C)C)=O)cc1)=O Chemical compound CN(C)C(Sc1ccc(C2(c3ccccc3-c3c2cccc3)c(cc2)ccc2SC(N(C)C)=O)cc1)=O DWSULPIRMPZLJW-UHFFFAOYSA-N 0.000 description 1
- PLVUIVUKKJTSDM-UHFFFAOYSA-N O=S(c(cc1)ccc1F)(c(cc1)ccc1F)=O Chemical compound O=S(c(cc1)ccc1F)(c(cc1)ccc1F)=O PLVUIVUKKJTSDM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
- C08G65/4012—Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
- C08G65/4056—(I) or (II) containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0209—Polyarylenethioethers derived from monomers containing one aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0227—Polyarylenethioethers derived from monomers containing two or more aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0236—Polyarylenethioethers containing atoms other than carbon or sulfur in a linkage between arylene groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/0204—Polyarylenethioethers
- C08G75/0245—Block or graft polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/20—Polysulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/20—Polysulfones
- C08G75/23—Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/06—Polysulfones; Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2381/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen, or carbon only; Polysulfones; Derivatives of such polymers
- C08J2381/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2381/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen, or carbon only; Polysulfones; Derivatives of such polymers
- C08J2381/06—Polysulfones; Polyethersulfones
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
[化学式1]
R1〜R9は、互いに同一または異なり、それぞれ独立に、水素;重水素;ハロゲン基;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基であるか、隣接した置換基は、互いに結合して置換もしくは非置換の芳香族環基を形成し、
a〜hは、それぞれ0〜4の整数であり、iは、0〜8の整数であり、
前記a〜iが2以上の場合の括弧内の置換基は、互いに同一または異なり、
mおよびnは、それぞれ1〜1000の整数である。
また、本出願は、上述した高分子を含むフィルムを提供する。
[化学式3]
Ra〜Rdは、互いに同一または異なり、それぞれ独立に、水素、重水素、ハロゲン基、置換もしくは非置換のアルキル基、置換もしくは非置換のシクロアルキル基、置換もしくは非置換のアリール基、または置換もしくは非置換のヘテロ環基であるか、隣接した置換基は、互いに結合して置換もしくは非置換の芳香族環基を形成してもよいし、
j〜qは、それぞれ0〜4の整数であり、前記j〜qが2以上の場合の括弧内の置換基は、互いに同一または異なる。
[化学式5]
rおよびoは、それぞれ0〜4の整数であり、pは、0〜8の整数であり、
前記r、oおよびpが2以上の場合の括弧内の置換基は、互いに同一または異なる。
[反応式1]
バルキーマスクジチオール(Bulky Masked dithiol)(0.2eq.)、ビフェニルマスクジチオール(Biphenyl Masked dithiol)(0.8eq.)、ジフルオロベンゾスルホン(Difluorobenzosulfone)(1eq.)、Cs2CO3(0.5eq.)、CaCO3(3eq.)、ジフェニルスルホン(Diphenylsulfone)(9eq.)をフラスコ(Flask)に投入後、窒素雰囲気下、200℃で3時間、240℃で3時間撹拌する。粘性のある(Viscous)溶液(Solution)をアセトン(Acetone)に沈殿および酸処理後、下記の高分子を得た。
前記製造例1において、バルキーマスクジチオール(Bulky Masked dithiol)(0.2eq.)、ビフェニルマスクジチオール(Biphenyl Masked dithiol)(0.8eq.)の代わりに、バルキーマスクジチオール(Bulky Masked dithiol)(1eq.)を適用したことを除いて同様に高分子を製造して、下記の高分子を得た。
前記製造例1において、バルキーマスクジチオール(Bulky Masked dithiol)(0.2eq.)、ビフェニルマスクジチオール(Biphenyl Masked dithiol)(0.8eq.)の代わりに、ビフェニルマスクジチオール(Biphenyl Masked dithiol)(1eq.)を適用したことを除いて同様に高分子を製造して、下記の高分子を得た。
前記製造例1で製造された高分子を、ジメチルアセトアミド(DMAC)に10:90の重量比率で添加して溶かした後、キャスティング後、150℃に設定されたオーブン中に入れて1日間乾燥して、高分子フィルムを製造した。
前記製造例2および3で製造された高分子は、実施例1でジメチルアセトアミド(DMAC)に溶けず、フィルムの製造が不可能であることを確認した。
Claims (9)
- 下記化学式1で表される第1単位と、
化学式2で表される第2単位とを含む高分子:
[化学式1]
R1〜R9は、互いに同一または異なり、それぞれ独立に、水素;重水素;ハロゲン基;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基であるか、隣接した置換基は、互いに結合して置換もしくは非置換の芳香族環基を形成し、
a〜hは、それぞれ0〜4の整数であり、
iは、0〜8の整数であり、
前記a〜iが2以上の場合の括弧内の置換基は、互いに同一または異なり、
mおよびnは、それぞれ1〜1000の整数である。 - 前記高分子中の前記第1単位の含有量は、1重量%以上99重量%以下であり、
第2単位の含有量は、1重量%以上99重量%以下である、
請求項1に記載の高分子。 - 前記高分子の重量平均分子量は、10,000〜200,000である、
請求項1または2に記載の高分子。 - 請求項1〜3のいずれか1項に記載の高分子を含む
フィルム。 - 前記フィルムの厚さは、5μm〜100μmである、
請求項4に記載のフィルム。 - 前記フィルムの屈折率は、1.7以上5以下である、
請求項4または5に記載のフィルム。 - 請求項1〜3のいずれか1項に記載の高分子を有機溶媒に溶かして高分子溶液を製造するステップと、
前記高分子溶液をキャスティングしてフィルムを製造するステップと
を含むものである
フィルムの製造方法。 - 前記有機溶媒は、
ジメチルアセトアミド(DMAC)、ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、テトラヒドロフラン(THF)、およびアセトンの中から選択される1種以上を含むものである、
請求項7に記載のフィルムの製造方法。 - 前記フィルムの厚さは、5μm〜100μmである、
請求項7または8に記載のフィルムの製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2016-0090102 | 2016-07-15 | ||
KR1020160090102A KR101888245B1 (ko) | 2016-07-15 | 2016-07-15 | 설파이드계 고분자, 이를 포함한 필름 및 이의 제조방법 |
PCT/KR2017/007302 WO2018012812A1 (ko) | 2016-07-15 | 2017-07-07 | 설파이드계 고분자, 이를 포함한 필름 및 이의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018525461A true JP2018525461A (ja) | 2018-09-06 |
JP6579407B2 JP6579407B2 (ja) | 2019-09-25 |
Family
ID=60951841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017566368A Active JP6579407B2 (ja) | 2016-07-15 | 2017-07-07 | スルフィド系高分子、これを含むフィルムおよびその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10428182B2 (ja) |
EP (1) | EP3333213B1 (ja) |
JP (1) | JP6579407B2 (ja) |
KR (1) | KR101888245B1 (ja) |
CN (1) | CN107849251B (ja) |
WO (1) | WO2018012812A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1264900A (ja) * | 1968-11-21 | 1972-02-23 | ||
JPH051149A (ja) * | 1991-06-25 | 1993-01-08 | Nippon Steel Corp | 耐熱性スルホン酸化ポリスルホン |
JP2006111663A (ja) * | 2004-10-12 | 2006-04-27 | Toyobo Co Ltd | ポリアリーレン系ポリマーの製造方法 |
JP2008069212A (ja) * | 2006-09-12 | 2008-03-27 | Tokyo Institute Of Technology | チオエーテルフルオレン骨格含有ポリマー及びその製造方法 |
JP2012082339A (ja) * | 2010-10-13 | 2012-04-26 | Jsr Corp | ポリアリーレンスルフィド、組成物および光学素子 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4777228A (en) | 1984-06-29 | 1988-10-11 | Kureha Kagaku Kogyo Kabushiki Kaisha | Biaxially oriented paraphenylene sulfide block copolymer film and process for producing the same |
KR101085313B1 (ko) | 2007-01-23 | 2011-11-22 | 주식회사 엘지화학 | 술폰기를 가지는 새로운 액정 화합물, 이를 포함하는 액정조성물 및 이 액정 조성물을 사용한 광학 필름 |
US20120129076A1 (en) * | 2009-08-03 | 2012-05-24 | Toyo Boseki Kabushiki Kaisha | Novel Sulfonic Acid Group-Containing Segmented Block Copolymer and Use Thereof |
KR101085266B1 (ko) | 2010-11-30 | 2011-11-22 | 주식회사 엘지화학 | 술폰기를 가지는 새로운 액정 화합물, 이를 포함하는 액정 조성물 및 이 액정 조성물을 사용한 광학 필름 |
JPWO2014157389A1 (ja) * | 2013-03-28 | 2017-02-16 | Jsr株式会社 | 電解質膜用組成物、固体高分子電解質膜、該電解質膜の製造方法、膜−電極接合体、固体高分子型燃料電池、水電解セルおよび水電解装置 |
EP2902431A1 (en) * | 2014-02-04 | 2015-08-05 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Polymer blends with high ion-exchange capacity and high ion-conductivity as well as methods for preparing the same |
KR20160090102A (ko) | 2015-01-21 | 2016-07-29 | 삼성전자주식회사 | 초음파 촬영 장치, 초음파 프로브 장치, 신호 처리 장치 및 초음파 촬영 장치의 제어 방법 |
-
2016
- 2016-07-15 KR KR1020160090102A patent/KR101888245B1/ko active IP Right Grant
-
2017
- 2017-07-07 EP EP17818413.1A patent/EP3333213B1/en active Active
- 2017-07-07 JP JP2017566368A patent/JP6579407B2/ja active Active
- 2017-07-07 CN CN201780002444.0A patent/CN107849251B/zh active Active
- 2017-07-07 WO PCT/KR2017/007302 patent/WO2018012812A1/ko active Application Filing
- 2017-07-07 US US15/741,642 patent/US10428182B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1264900A (ja) * | 1968-11-21 | 1972-02-23 | ||
JPH051149A (ja) * | 1991-06-25 | 1993-01-08 | Nippon Steel Corp | 耐熱性スルホン酸化ポリスルホン |
JP2006111663A (ja) * | 2004-10-12 | 2006-04-27 | Toyobo Co Ltd | ポリアリーレン系ポリマーの製造方法 |
JP2008069212A (ja) * | 2006-09-12 | 2008-03-27 | Tokyo Institute Of Technology | チオエーテルフルオレン骨格含有ポリマー及びその製造方法 |
JP2012082339A (ja) * | 2010-10-13 | 2012-04-26 | Jsr Corp | ポリアリーレンスルフィド、組成物および光学素子 |
Non-Patent Citations (2)
Title |
---|
ATUSHI HARA ET AL.: "Novel Synthesis of Aromatic Polysulfides from S,S'-Bis(trimethylsilyl)-Substituted Aromatic Dithiols", JOURNAL OF POLYMER SCIENCE: PART A: POLYMER CHEMISTRY, vol. 29, JPN6018052410, 1991, pages 1933-1940 * |
YONG DING ET AL.: "Novel Synthesis of Poly(arylene thioether)s via One-pot Polymerization of Bis(N,N'-dimethyl-S-carbam", TETRAHEDRON, vol. 53,43, JPN6018052411, 1997, pages 15237-15246 * |
Also Published As
Publication number | Publication date |
---|---|
KR20180008162A (ko) | 2018-01-24 |
CN107849251A (zh) | 2018-03-27 |
US10428182B2 (en) | 2019-10-01 |
CN107849251B (zh) | 2020-03-10 |
EP3333213A4 (en) | 2018-07-25 |
KR101888245B1 (ko) | 2018-08-13 |
WO2018012812A1 (ko) | 2018-01-18 |
EP3333213A1 (en) | 2018-06-13 |
EP3333213B1 (en) | 2019-12-18 |
JP6579407B2 (ja) | 2019-09-25 |
US20190077918A1 (en) | 2019-03-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108368261B (zh) | 可聚合组合物 | |
TW201544503A (zh) | 二酸酐與聚醯亞胺 | |
TW200418864A (en) | Preparation of 2,2'-di(3,4-ethylenedioxythiophene)s | |
CN110268003A (zh) | 固化性化合物 | |
KR101505490B1 (ko) | 유연기를 갖는 액정성 에폭시 화합물 및 제조방법 | |
JP7085737B2 (ja) | ポリベンゾイミダゾール、その前駆体ポリアミド及びそれらの製造方法 | |
JP6579407B2 (ja) | スルフィド系高分子、これを含むフィルムおよびその製造方法 | |
JP6922364B2 (ja) | 重合体、組成物及び成形体 | |
Wang et al. | Studies of fluorine‐containing bismaleimide resins part I: Synthesis and characteristics of model compounds | |
KR102193141B1 (ko) | 폴리아미드 수지의 제조방법 | |
WO2022267730A1 (zh) | 一类分子玻璃的合成方法及其作为高频低介电常数材料的应用 | |
TWI646128B (zh) | 聚合物製備方法 | |
KR102450354B1 (ko) | 디아민 화합물, 산무수물 화합물, 이를 이용한 폴리이미드계 고분자, 고분자 필름, 디스플레이 장치용 기판 및 광학 장치 | |
JP2017179119A (ja) | 熱硬化性化合物 | |
KR102631550B1 (ko) | 중합체 제조방법 | |
JP4273981B2 (ja) | アミノフェノール化合物、熱硬化性樹脂およびその製造法 | |
JP5804460B2 (ja) | ビナフチル骨格を有するポリ(アリーレンチオエーテル) | |
CN109890873B (zh) | 可聚合组合物 | |
RU2796817C2 (ru) | Соединение ангидрида кислоты, полимер на основе полиимида, полимерная пленка и оптическое устройство, для которого их используют | |
KR20200074675A (ko) | 폴리아미드 공중합체 및 고분자 필름 | |
WO2023219085A1 (ja) | フッ素化ポリアミド化合物、フッ素化ポリイミド化合物、低誘電材料および高周波エレクトロニクス部品 | |
KR20210021716A (ko) | 폴리아미드-이미드 중합체 및 이를 포함하는 엔지니어링 플라스틱 | |
TWI382011B (zh) | 低介電常數材料及其衍生物之製造方法 | |
JP2021127402A (ja) | ビニル化合物およびビニルポリマー | |
KR101319268B1 (ko) | 유연기를 갖는 말레이미드계 열경화성 액정 조성물 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180124 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20181227 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190108 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190319 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190730 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190814 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6579407 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |