JP2018500456A5 - - Google Patents
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- Publication number
- JP2018500456A5 JP2018500456A5 JP2017519872A JP2017519872A JP2018500456A5 JP 2018500456 A5 JP2018500456 A5 JP 2018500456A5 JP 2017519872 A JP2017519872 A JP 2017519872A JP 2017519872 A JP2017519872 A JP 2017519872A JP 2018500456 A5 JP2018500456 A5 JP 2018500456A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing composition
- mechanical polishing
- substrate
- chemical mechanical
- amino acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000005498 polishing Methods 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
- 239000003112 inhibitor Substances 0.000 claims description 20
- 150000003862 amino acid derivatives Chemical class 0.000 claims description 15
- 150000007942 carboxylates Chemical class 0.000 claims description 15
- 229910017052 cobalt Inorganic materials 0.000 claims description 15
- 239000010941 cobalt Substances 0.000 claims description 15
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 15
- 229940071089 sarcosinate Drugs 0.000 claims description 12
- 238000005260 corrosion Methods 0.000 claims description 10
- 230000007797 corrosion Effects 0.000 claims description 10
- 125000001931 aliphatic group Chemical group 0.000 claims description 9
- 239000007800 oxidant agent Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000008365 aqueous carrier Substances 0.000 claims description 7
- 125000000129 anionic group Chemical group 0.000 claims description 6
- -1 N -cocoyl glutamate Chemical compound 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000002401 inhibitory effect Effects 0.000 claims description 3
- 238000007517 polishing process Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 7
- 229940071124 cocoyl glutamate Drugs 0.000 claims 6
- NGOZDSMNMIRDFP-UHFFFAOYSA-N 2-[methyl(tetradecanoyl)amino]acetic acid Chemical compound CCCCCCCCCCCCCC(=O)N(C)CC(O)=O NGOZDSMNMIRDFP-UHFFFAOYSA-N 0.000 claims 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 4
- 150000001413 amino acids Chemical class 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 239000008119 colloidal silica Substances 0.000 claims 4
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 claims 4
- 229910052700 potassium Inorganic materials 0.000 claims 4
- 239000011591 potassium Substances 0.000 claims 4
- 150000003839 salts Chemical class 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- DIOYAVUHUXAUPX-ZHACJKMWSA-N 2-[methyl-[(e)-octadec-9-enoyl]amino]acetic acid Chemical compound CCCCCCCC\C=C\CCCCCCCC(=O)N(C)CC(O)=O DIOYAVUHUXAUPX-ZHACJKMWSA-N 0.000 claims 2
- KVTFEOAKFFQCCX-UHFFFAOYSA-N N-hexadecanoylglycine Chemical compound CCCCCCCCCCCCCCCC(=O)NCC(O)=O KVTFEOAKFFQCCX-UHFFFAOYSA-N 0.000 claims 2
- DYUGTPXLDJQBRB-UHFFFAOYSA-N N-myristoylglycine Chemical compound CCCCCCCCCCCCCC(=O)NCC(O)=O DYUGTPXLDJQBRB-UHFFFAOYSA-N 0.000 claims 2
- 235000021314 Palmitic acid Nutrition 0.000 claims 2
- QNAYBMKLOCPYGJ-UHFFFAOYSA-M alaninate Chemical compound CC(N)C([O-])=O QNAYBMKLOCPYGJ-UHFFFAOYSA-M 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- 229910045601 alloy Inorganic materials 0.000 claims 2
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229940070782 myristoyl sarcosinate Drugs 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 9
- 239000002280 amphoteric surfactant Substances 0.000 description 8
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 description 8
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 8
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 8
- 229910019142 PO4 Inorganic materials 0.000 description 7
- 239000010452 phosphate Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 6
- 239000003623 enhancer Substances 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- SDIXRDNYIMOKSG-UHFFFAOYSA-L disodium methyl arsenate Chemical compound [Na+].[Na+].C[As]([O-])([O-])=O SDIXRDNYIMOKSG-UHFFFAOYSA-L 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229930195712 glutamate Natural products 0.000 description 1
- DLHSXQSAISCVNN-UHFFFAOYSA-M hydroxy(oxo)cobalt Chemical compound O[Co]=O DLHSXQSAISCVNN-UHFFFAOYSA-M 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462066484P | 2014-10-21 | 2014-10-21 | |
| US62/066,484 | 2014-10-21 | ||
| US201562198013P | 2015-07-28 | 2015-07-28 | |
| US62/198,013 | 2015-07-28 | ||
| PCT/US2015/056744 WO2016065057A1 (en) | 2014-10-21 | 2015-10-21 | Corrosion inhibitors and related compositions and methods |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018500456A JP2018500456A (ja) | 2018-01-11 |
| JP2018500456A5 true JP2018500456A5 (enExample) | 2020-04-09 |
| JP6810029B2 JP6810029B2 (ja) | 2021-01-06 |
Family
ID=55748310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017519872A Active JP6810029B2 (ja) | 2014-10-21 | 2015-10-21 | 腐食抑制剤及び関連組成物並びに方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10124464B2 (enExample) |
| EP (1) | EP3209815B1 (enExample) |
| JP (1) | JP6810029B2 (enExample) |
| KR (1) | KR102477843B1 (enExample) |
| CN (2) | CN116288366A (enExample) |
| TW (1) | TWI611049B (enExample) |
| WO (1) | WO2016065057A1 (enExample) |
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| JP6890656B2 (ja) * | 2017-02-28 | 2021-06-18 | 富士フイルム株式会社 | 研磨液、研磨液の製造方法、研磨液原液、研磨液原液収容体、化学的機械的研磨方法 |
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| US10077382B1 (en) | 2017-03-06 | 2018-09-18 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method for polishing cobalt-containing substrate |
| CN110431209B (zh) * | 2017-03-14 | 2022-06-28 | 福吉米株式会社 | 研磨用组合物、其制造方法以及使用其的研磨方法及基板的制造方法 |
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| JP6894513B2 (ja) * | 2017-08-03 | 2021-06-30 | 日華化学株式会社 | 金属用洗浄剤組成物 |
| CA3072899A1 (en) * | 2017-09-07 | 2019-03-14 | Stepan Company | Corrosion inhibitors for oilfield applications |
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| US10647887B2 (en) * | 2018-01-08 | 2020-05-12 | Cabot Microelectronics Corporation | Tungsten buff polishing compositions with improved topography |
| US20190211228A1 (en) * | 2018-01-09 | 2019-07-11 | Cabot Microelectronics Corporation | Tungsten bulk polishing method with improved topography |
| US11021786B2 (en) * | 2018-12-04 | 2021-06-01 | Texas Instruments Incorporated | Copper passivation |
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| CN112501617B (zh) * | 2020-11-12 | 2021-11-23 | 陕西科技大学 | 一种双疏水链改性l-组氨酸缓蚀剂及其制备方法和应用 |
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| TWI456013B (zh) | 2012-04-10 | 2014-10-11 | Uwiz Technology Co Ltd | 研磨液組成物 |
| US8717710B2 (en) | 2012-05-08 | 2014-05-06 | HGST Netherlands, B.V. | Corrosion-resistant bit patterned media (BPM) and discrete track media (DTM) and methods of production thereof |
| US8980750B2 (en) * | 2012-07-06 | 2015-03-17 | Basf Se | Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt |
| CN102796458B (zh) * | 2012-07-17 | 2014-04-23 | 清华大学 | 化学机械抛光水性组合物及钛基片化学机械抛光工艺方法 |
| KR102152964B1 (ko) | 2013-01-11 | 2020-09-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 화학 기계적 폴리싱 장치 및 방법 |
| SG11201506102TA (en) * | 2013-02-28 | 2015-09-29 | Fujimi Inc | Polishing slurry for cobalt removal |
| US8865635B1 (en) * | 2013-04-09 | 2014-10-21 | S.C. Johnson & Son, Inc. | Aqueous-based cleaning composition with a water-insoluble, fatty alcohol-based builder |
| US10358579B2 (en) | 2013-12-03 | 2019-07-23 | Cabot Microelectronics Corporation | CMP compositions and methods for polishing nickel phosphorous surfaces |
| EP3112436A4 (en) * | 2014-02-26 | 2017-02-22 | Fujimi Incorporated | Polishing composition |
| US10217645B2 (en) * | 2014-07-25 | 2019-02-26 | Versum Materials Us, Llc | Chemical mechanical polishing (CMP) of cobalt-containing substrate |
-
2015
- 2015-10-21 WO PCT/US2015/056744 patent/WO2016065057A1/en not_active Ceased
- 2015-10-21 US US14/919,404 patent/US10124464B2/en active Active
- 2015-10-21 CN CN202310169002.2A patent/CN116288366A/zh active Pending
- 2015-10-21 KR KR1020177013244A patent/KR102477843B1/ko active Active
- 2015-10-21 CN CN201580057443.7A patent/CN107148496A/zh active Pending
- 2015-10-21 TW TW104134573A patent/TWI611049B/zh active
- 2015-10-21 EP EP15853494.1A patent/EP3209815B1/en active Active
- 2015-10-21 JP JP2017519872A patent/JP6810029B2/ja active Active
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