JP2018182290A - 静電チャック - Google Patents

静電チャック Download PDF

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Publication number
JP2018182290A
JP2018182290A JP2017242302A JP2017242302A JP2018182290A JP 2018182290 A JP2018182290 A JP 2018182290A JP 2017242302 A JP2017242302 A JP 2017242302A JP 2017242302 A JP2017242302 A JP 2017242302A JP 2018182290 A JP2018182290 A JP 2018182290A
Authority
JP
Japan
Prior art keywords
wafer
support surface
electrostatic chuck
grooves
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017242302A
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English (en)
Japanese (ja)
Other versions
JP2018182290A5 (enExample
Inventor
駿 糸井
Shun Itoi
駿 糸井
高橋　直也
Naoya Takahashi
直也 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Ion Equipment Co Ltd
Original Assignee
Nissin Ion Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Ion Equipment Co Ltd filed Critical Nissin Ion Equipment Co Ltd
Priority to CN201810035305.4A priority Critical patent/CN108735647A/zh
Publication of JP2018182290A publication Critical patent/JP2018182290A/ja
Publication of JP2018182290A5 publication Critical patent/JP2018182290A5/ja
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2017242302A 2017-04-18 2017-12-19 静電チャック Pending JP2018182290A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810035305.4A CN108735647A (zh) 2017-04-18 2018-01-15 静电吸盘

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017082419 2017-04-18
JP2017082419 2017-04-18

Publications (2)

Publication Number Publication Date
JP2018182290A true JP2018182290A (ja) 2018-11-15
JP2018182290A5 JP2018182290A5 (enExample) 2019-05-16

Family

ID=64276998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017242302A Pending JP2018182290A (ja) 2017-04-18 2017-12-19 静電チャック

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JP (1) JP2018182290A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022151515A (ja) * 2021-03-24 2022-10-07 Toto株式会社 静電チャック及び半導体製造装置
JP2024002287A (ja) * 2022-06-23 2024-01-11 日新イオン機器株式会社 基板搬送方法及び基板処理装置
KR102860448B1 (ko) * 2021-09-22 2025-09-17 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디. 정전 척 및 반도체 가공 디바이스
WO2025234340A1 (ja) * 2024-05-10 2025-11-13 筑波精工株式会社 静電吸着ツール及び対象物表面加工方法

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338357U (enExample) * 1989-08-21 1991-04-12
JPH06349938A (ja) * 1993-06-11 1994-12-22 Tokyo Electron Ltd 真空処理装置
JPH116069A (ja) * 1997-06-11 1999-01-12 Tokyo Electron Ltd 処理装置およびステージ装置
JP2001102435A (ja) * 1999-07-28 2001-04-13 Tokyo Electron Ltd 載置台構造及び処理装置
JP2002057209A (ja) * 2000-06-01 2002-02-22 Tokyo Electron Ltd 枚葉式処理装置および枚葉式処理方法
JP2005136104A (ja) * 2003-10-29 2005-05-26 Ngk Spark Plug Co Ltd 静電チャック
JP2006066857A (ja) * 2004-07-26 2006-03-09 Creative Technology:Kk 双極型静電チャック
JP2006179693A (ja) * 2004-12-22 2006-07-06 Shin Etsu Chem Co Ltd ヒータ付き静電チャック
JP2007201404A (ja) * 2005-12-27 2007-08-09 Samco Inc プラズマ処理方法及びプラズマ装置
JP2008166509A (ja) * 2006-12-28 2008-07-17 Shinko Electric Ind Co Ltd 静電チャック及び基板温調固定装置
JP2008210913A (ja) * 2007-02-26 2008-09-11 Creative Technology:Kk 静電チャック
JP2012043928A (ja) * 2010-08-18 2012-03-01 Samco Inc プラズマ処理方法及びプラズマ処理装置
JP2015088573A (ja) * 2013-10-30 2015-05-07 株式会社日立ハイテクノロジーズ プラズマ処理装置

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338357U (enExample) * 1989-08-21 1991-04-12
JPH06349938A (ja) * 1993-06-11 1994-12-22 Tokyo Electron Ltd 真空処理装置
JPH116069A (ja) * 1997-06-11 1999-01-12 Tokyo Electron Ltd 処理装置およびステージ装置
JP2001102435A (ja) * 1999-07-28 2001-04-13 Tokyo Electron Ltd 載置台構造及び処理装置
JP2002057209A (ja) * 2000-06-01 2002-02-22 Tokyo Electron Ltd 枚葉式処理装置および枚葉式処理方法
JP2005136104A (ja) * 2003-10-29 2005-05-26 Ngk Spark Plug Co Ltd 静電チャック
JP2006066857A (ja) * 2004-07-26 2006-03-09 Creative Technology:Kk 双極型静電チャック
JP2006179693A (ja) * 2004-12-22 2006-07-06 Shin Etsu Chem Co Ltd ヒータ付き静電チャック
JP2007201404A (ja) * 2005-12-27 2007-08-09 Samco Inc プラズマ処理方法及びプラズマ装置
JP2008166509A (ja) * 2006-12-28 2008-07-17 Shinko Electric Ind Co Ltd 静電チャック及び基板温調固定装置
JP2008210913A (ja) * 2007-02-26 2008-09-11 Creative Technology:Kk 静電チャック
JP2012043928A (ja) * 2010-08-18 2012-03-01 Samco Inc プラズマ処理方法及びプラズマ処理装置
JP2015088573A (ja) * 2013-10-30 2015-05-07 株式会社日立ハイテクノロジーズ プラズマ処理装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022151515A (ja) * 2021-03-24 2022-10-07 Toto株式会社 静電チャック及び半導体製造装置
JP7730458B2 (ja) 2021-03-24 2025-08-28 Toto株式会社 静電チャック及び半導体製造装置
KR102860448B1 (ko) * 2021-09-22 2025-09-17 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디. 정전 척 및 반도체 가공 디바이스
JP2024002287A (ja) * 2022-06-23 2024-01-11 日新イオン機器株式会社 基板搬送方法及び基板処理装置
JP7578120B2 (ja) 2022-06-23 2024-11-06 日新イオン機器株式会社 基板搬送方法及び基板処理装置
WO2025234340A1 (ja) * 2024-05-10 2025-11-13 筑波精工株式会社 静電吸着ツール及び対象物表面加工方法

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