JP2017532586A - 反射シート及びその製造方法 - Google Patents

反射シート及びその製造方法 Download PDF

Info

Publication number
JP2017532586A
JP2017532586A JP2017506673A JP2017506673A JP2017532586A JP 2017532586 A JP2017532586 A JP 2017532586A JP 2017506673 A JP2017506673 A JP 2017506673A JP 2017506673 A JP2017506673 A JP 2017506673A JP 2017532586 A JP2017532586 A JP 2017532586A
Authority
JP
Japan
Prior art keywords
layer
reflective sheet
reflective
silver
apd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017506673A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017532586A5 (enExample
Inventor
シア ガオ，ジエン
シア ガオ，ジエン
パラニスワミー，ラヴィ
セバスチャン，ムトゥ
エム． トラヴァッソ，ドミニク
エム． トラヴァッソ，ドミニク
エー．，サード ノロンハ，オーギュスト
エー．，サード ノロンハ，オーギュスト
アン，ウー−ヨン
エム． デイヴィッド，モーゼズ
エム． デイヴィッド，モーゼズ
ピー． クリューター，ネイサン
ピー． クリューター，ネイサン
ソン，キフン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2017532586A publication Critical patent/JP2017532586A/ja
Publication of JP2017532586A5 publication Critical patent/JP2017532586A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0277—Bendability or stretchability details
    • H05K1/028—Bending or folding regions of flexible printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Laminated Bodies (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
JP2017506673A 2014-08-07 2015-08-05 反射シート及びその製造方法 Pending JP2017532586A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201462034382P 2014-08-07 2014-08-07
US62/034,382 2014-08-07
PCT/US2015/043715 WO2016022628A1 (en) 2014-08-07 2015-08-05 Reflection sheet and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JP2017532586A true JP2017532586A (ja) 2017-11-02
JP2017532586A5 JP2017532586A5 (enExample) 2018-09-13

Family

ID=54012263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017506673A Pending JP2017532586A (ja) 2014-08-07 2015-08-05 反射シート及びその製造方法

Country Status (5)

Country Link
US (1) US10143082B2 (enExample)
JP (1) JP2017532586A (enExample)
KR (1) KR20170038894A (enExample)
CN (1) CN106536783A (enExample)
WO (1) WO2016022628A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140122338A (ko) * 2013-04-09 2014-10-20 쓰리엠 이노베이티브 프로퍼티즈 캄파니 터치패널, 그 제조방법 및 터치패널용 Ag-Pd-Nd 합금
KR102639577B1 (ko) * 2016-11-21 2024-02-21 에스케이넥실리스 주식회사 금속 적층체 및 그 제조방법
CN108693578A (zh) * 2017-04-12 2018-10-23 扬明光学股份有限公司 反射元件及反射镜
GB2552248B (en) * 2017-05-19 2018-10-31 Cares Laboratory Ltd Heat reflective sheet for a tumble dryer
US11836304B2 (en) * 2020-04-30 2023-12-05 Hewlett-Packard Development Company, L.P. Digital pen sensor surface

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09277422A (ja) * 1996-04-16 1997-10-28 Mitsui Toatsu Chem Inc 反射体及びそれを用いた反射部材
JP2002116313A (ja) * 2000-10-11 2002-04-19 Mitsui Chemicals Inc 反射シート及びそれを用いたリフレクター
JP2003185813A (ja) * 2001-12-21 2003-07-03 Mitsui Chemicals Inc 反射体およびその用途
WO2006087873A1 (ja) * 2005-02-17 2006-08-24 Nippon Mining & Metals Co., Ltd. フレキシブル銅基板用バリア膜及びバリア膜形成用スパッタリングターゲット
JP2006284880A (ja) * 2005-03-31 2006-10-19 Kobe Steel Ltd 光反射膜および光反射板
JP2008078276A (ja) * 2006-09-20 2008-04-03 Sumitomo Metal Mining Co Ltd 高耐熱密着力を有する銅被覆ポリイミド基板
JP2012124310A (ja) * 2010-12-08 2012-06-28 Nitto Denko Corp 反射膜およびその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6125128A (ja) 1984-07-14 1986-02-04 Canon Inc カイラルスメクティック液晶素子
JP3292890B2 (ja) * 1992-08-10 2002-06-17 株式会社リコー 光反射放熱用材料を用いた相変化形光記録媒体
SG116432A1 (en) 2000-12-26 2005-11-28 Kobe Steel Ltd Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media.
JP2005029849A (ja) * 2003-07-07 2005-02-03 Kobe Steel Ltd リフレクター用Ａｇ合金反射膜、及び、このＡｇ合金反射膜を用いたリフレクター、並びに、このＡｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
US20060131700A1 (en) 2004-12-22 2006-06-22 David Moses M Flexible electronic circuit articles and methods of making thereof
JP5042019B2 (ja) * 2005-06-07 2012-10-03 パナソニック株式会社 情報記録媒体とその製造方法
KR20070103141A (ko) 2006-04-18 2007-10-23 삼성전자주식회사 반사판 일체형 회로 기판 및 이를 이용한 액정표시장치
KR20090032207A (ko) * 2007-09-27 2009-04-01 삼성전기주식회사 질화갈륨계 발광다이오드 소자
JP2013177667A (ja) 2012-02-02 2013-09-09 Kobe Steel Ltd 反射膜および／または透過膜、もしくは電気配線および／または電極に用いられるＡｇ合金膜、並びにＡｇ合金スパッタリングターゲットおよびＡｇ合金フィラー
KR20140122338A (ko) 2013-04-09 2014-10-20 쓰리엠 이노베이티브 프로퍼티즈 캄파니 터치패널, 그 제조방법 및 터치패널용 Ag-Pd-Nd 합금

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09277422A (ja) * 1996-04-16 1997-10-28 Mitsui Toatsu Chem Inc 反射体及びそれを用いた反射部材
JP2002116313A (ja) * 2000-10-11 2002-04-19 Mitsui Chemicals Inc 反射シート及びそれを用いたリフレクター
JP2003185813A (ja) * 2001-12-21 2003-07-03 Mitsui Chemicals Inc 反射体およびその用途
WO2006087873A1 (ja) * 2005-02-17 2006-08-24 Nippon Mining & Metals Co., Ltd. フレキシブル銅基板用バリア膜及びバリア膜形成用スパッタリングターゲット
JP2006284880A (ja) * 2005-03-31 2006-10-19 Kobe Steel Ltd 光反射膜および光反射板
JP2008078276A (ja) * 2006-09-20 2008-04-03 Sumitomo Metal Mining Co Ltd 高耐熱密着力を有する銅被覆ポリイミド基板
JP2012124310A (ja) * 2010-12-08 2012-06-28 Nitto Denko Corp 反射膜およびその製造方法

Also Published As

Publication number Publication date
KR20170038894A (ko) 2017-04-07
US20170164462A1 (en) 2017-06-08
WO2016022628A1 (en) 2016-02-11
CN106536783A (zh) 2017-03-22
US10143082B2 (en) 2018-11-27

Similar Documents

Publication Publication Date Title
TWI589431B (zh) A conductive film substrate, a transparent conductive film, a method of manufacturing the same, and a touch panel
JP5548428B2 (ja) 透明導電性フィルムの製造方法及び透明導電性フィルム
JP2017532586A (ja) 反射シート及びその製造方法
KR102650752B1 (ko) 금속층 적층 투명 도전성 필름 및 그것을 사용한 터치 센서
KR20190013591A (ko) 도전성 기판, 전자 장치 및 표시 장치
JP7548982B2 (ja) シート材、メタルメッシュ、配線基板及び表示装置、並びにそれらの製造方法
WO2015008617A1 (ja) タッチパネル用積層体、タッチパネル
TWI757255B (zh) 透明導電層層合用薄膜、該製造方法及透明導電性薄膜
JPWO2010032721A1 (ja) 有機エレクトロルミネッセンス素子
KR20090105781A (ko) 다층 전도성 박막의 식각용 조성물 및 이를 이용한 식각 방법
JP2018170389A (ja) フレキシブル基板、及び、それを用いたｌｅｄ表示装置
KR20160007369A (ko) 전극 패턴 제작용 적층체, 그 제조 방법, 터치 패널용 기판 및 화상 표시 장치
TWI701479B (zh) 導電性基板、液晶觸控面板
KR101668273B1 (ko) 발광 효율이 향상된 led 인테리어 벽 및 그 제조 방법
TWI791428B (zh) 黑化鍍液、導電性基板的製造方法
WO2015045965A1 (ja) タッチパネル用積層体、タッチパネル
TWI758734B (zh) 具有高反射性能的雙層覆蓋膜
WO2016190224A1 (ja) 黒化めっき液、導電性基板
WO2017022596A1 (ja) 導電性基板、導電性基板の製造方法
KR102811344B1 (ko) 광학 적층체, 이를 포함하는 투명 디스플레이 및 그 제조 방법
TW202231139A (zh) 電路板
JP6556483B2 (ja) 電極付き基板およびその製造方法
KR20250047706A (ko) 광학 적층체, 이를 포함하는 투명 디스플레이 및 그 제조 방법
CN118553841A (zh) 金属薄膜基板、包括其的透明显示器、所述金属薄膜基板的图案化方法及透明显示器的制造方法
JP2017518636A (ja) 反射基材上のフレキシブル回路

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180801

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180801

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190625

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190626

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20200609