JP2017522715A - 集積回路のためのピラー抵抗器構造 - Google Patents
集積回路のためのピラー抵抗器構造 Download PDFInfo
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Abstract
Description
Claims (23)
- 基板の上方に水平方向に延びる導電トレースと、
前記導電トレースの第1の端部と接触する抵抗材料から構成されるピラーであって、前記ピラーは前記第1の端部から第1のz高さ分延び、前記第1のz高さは、前記導電トレースと接合する前記ピラーの水平方向の長さより大きい、ピラーと、
前記ピラーと接触して配置される第1の抵抗器コンタクトと、
前記導電トレースの第2の端部と接触して配置される第2の抵抗器コンタクトと、を備える、集積回路(IC)構造。 - 前記ピラーの電気抵抗は、前記導電トレースの抵抗と、第1の抵抗器コンタクトの抵抗と、第2の抵抗器コンタクトの抵抗との累計の2倍より大きい、請求項1に記載のIC構造。
- 前記導電トレースは、第2のz高さと、前記第1のz高さより小さいが、前記ピラーの前記水平方向の長さと前記第2の抵抗器コンタクトの水平方向の長さとの累計より大きい水平方向の長さと、を有する第1の材料を含む、請求項1に記載のIC構造。
- 前記第2の抵抗器コンタクトは、前記導電トレースの前記第2の端部からの第3のz高さを有し、前記第3のz高さは、前記第1のz高さと前記第1の抵抗器コンタクトの第4のz高さとの累計と実質的に等しい、請求項3に記載のIC構造。
- 第1の抵抗器コンタクトは、前記ピラーの上面全体と接合し、前記導電トレースと接合する前記ピラーの前記水平方向の長さと実質的に等しい水平方向の長さを有する、請求項1に記載のIC構造。
- 前記ピラーおよび前記導電トレースはポリシリコンを含み、前記導電トレースは前記ピラーより高い不純物濃度にドープされている、請求項1に記載のIC構造。
- 前記基板の上方に、前記ピラーに隣接して配置されるトランジスタをさらに備え、
前記トランジスタは、
半導体チャネルの上方に配置されるゲートスタックであって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、ゲートスタックと、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインと、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトと、をさらに含み、
前記導電トレースは第2のz高さを有する第1の材料を含み、
前記ゲート電極は前記基板の上方に配置される絶縁誘電体の表面からz高さ分延び、前記z高さは前記第1のz高さと前記第2のz高さとの累計より大きい、請求項1に記載のIC構造。 - 前記第2の抵抗器コンタクトは前記導電トレースの前記第2の端部からの第3のz高さを有し、前記第3のz高さは、前記第1のz高さと前記第1の抵抗器コンタクトの第4のz高さとの累計とほぼ等しい、請求項7に記載のIC構造。
- 前記基板の上方に、前記ピラーに隣接して配置されるトランジスタをさらに備え、
前記トランジスタは、
半導体チャネルの上方に配置されるゲートスタックであって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、ゲートスタックと、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインと、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトと、をさらに含み、
前記一組のソース/ドレインコンタクトは、前記第1の抵抗器コンタクトおよび前記第2の抵抗器コンタクトと実質的に同一の組成を有する、請求項1に記載のIC構造。 - 前記基板の上方に、前記ピラーに隣接して配置されるトランジスタをさらに備え、
前記トランジスタは、
半導体チャネルの上方に配置されるゲートスタックであって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、ゲートスタックと、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインと、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトと、
前記ピラーおよび前記第1の抵抗器コンタクトを囲む絶縁誘電体であって、前記絶縁誘電体は前記ピラーを前記ゲート電極から、および前記第2の抵抗器コンタクトから水平方向に分離する、絶縁誘電体と、をさらに含む、請求項1に記載のIC構造。 - 前記第1のz高さは50〜200nmであり、
前記ピラーの水平方向の長さは25nm以下であり、
前記第2の抵抗器コンタクトの水平方向の長さは25nm以下であり、
前記導電トレースは、前記第1のz高さから、前記ピラーの前記水平方向の長さと前記第2の抵抗器コンタクトの水平方向の長さとの累計までの範囲内である水平方向の長さを有するドープされたポリシリコンを含む、請求項1に記載のIC構造。 - 集積回路(IC)構造を製造する方法であって、
基板の上方に水平方向に延びる導電トレースを形成する段階と、
前記導電トレースの第1の端部に抵抗器ピラーを形成する段階と、
前記ピラーに配置される第1の抵抗器コンタクトを形成する段階と、
前記導電トレースの第2の端部に配置される第2の抵抗器コンタクトを形成する段階と、を備える、方法。 - 前記導電トレースを形成する段階は、前記基板の上方に導電膜を堆積する段階と、前記導電膜を前記導電トレースにパターニングする段階と、をさらに含み、
前記導電トレースの第1の端部に前記抵抗器ピラーを形成する段階は、
前記導電トレースの上方に抵抗材料を堆積する段階と、
前記導電トレースの前記第1の端部の上方の前記抵抗材料内にリセスをパターニングする段階と、
犠牲充填材料で前記リセスをバックフィルする段階と、
前記犠牲充填材料と位置合わせされた前記ピラーを形成すべく、前記抵抗材料をパターニングする段階と、をさらに含む、請求項12に記載の方法。 - 前記第1の抵抗器コンタクトを形成する段階は、
前記抵抗器ピラーの周囲に絶縁誘電体を堆積する段階と、
前記ピラーを露出すべく、前記犠牲充填材料を除去する段階と、
露出された前記抵抗器ピラーにコンタクト金属を堆積する段階と、をさらに含み、
前記第2の抵抗器コンタクトを形成する段階は、
前記導電トレースの前記第2の端部の上方に配置される犠牲ピラーを形成すべく、前記抵抗材料をパターニングする段階と、
前記導電トレースの前記第2の端部にランドするビアを形成すべく、前記絶縁誘電体に対し選択的に前記犠牲ピラーを除去する段階と、
露出された前記抵抗器ピラーに前記コンタクト金属を堆積する段階と並行して、前記導電トレースの露出された端部に前記コンタクト金属を堆積する段階と、をさらに含む、請求項13に記載の方法。 - 前記基板の上方に、前記抵抗器ピラーに隣接するトランジスタを形成する段階をさらに備え、
前記トランジスタを形成する段階は、
半導体チャネル領域を形成する段階と、
前記半導体チャネルの上方に配置されるゲートスタックを形成する段階であって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、形成する段階と、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインを形成する段階と、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトを形成する段階と、をさらに含み、
前記一組のソース/ドレインコンタクトを形成する段階は、
露出された前記抵抗器ピラーに前記コンタクト金属を堆積する段階と並行して、前記一組の半導体ソース/ドレインに前記コンタクト金属を堆積する段階をさらに含む、請求項14に記載の方法。 - 前記基板の上方に、前記抵抗器ピラーに隣接するトランジスタを形成する段階をさらに備え、
前記トランジスタを形成する段階は、
半導体チャネル領域を形成する段階と、
前記半導体チャネルの上方に配置されるゲートスタックを形成する段階であって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、形成する段階と、をさらに含み、
前記ゲートスタックを形成する段階は、
前記半導体チャネルの上方に前記抵抗材料を堆積する段階と、
前記半導体チャネルの上方の前記抵抗材料を犠牲ゲートにパターニングする段階と、
前記抵抗器ピラーの周囲および前記犠牲ゲートの周囲に絶縁酸化物を堆積する段階の後、前記犠牲ゲートを除去する段階と、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインを形成する段階と、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトを形成する段階と、をさらに含む、請求項14に記載の方法。 - 前記基板の上方に前記導電膜を堆積する段階は、前記基板の上方に不純物がドープされたポリシリコン膜を堆積する段階をさらに含み、
前記導電トレースの上方に前記抵抗材料を堆積する段階は、前記不純物がドープされたポリシリコン膜の上方に、より少なくドープされたポリシリコン膜を堆積する段階をさらに含む、請求項13に記載の方法。 - 前記基板の上方に前記導電膜を堆積する段階は、前記基板の上方に不純物がドープされたポリシリコン膜を堆積する段階をさらに含み、
前記導電トレースの上方に前記抵抗材料を堆積する段階は、前記不純物がドープされたポリシリコン膜の上方に、より少なくドープされたポリシリコン膜を堆積する段階をさらに含み、
前記ピラーに配置される前記第1の抵抗器コンタクトを形成する段階は、前記ピラーに自己アライメントされる第1のリセスをコンタクト金属でバックフィルする段階をさらに含み、
前記導電トレースの第2の端部に配置される前記第2の抵抗器コンタクトを形成する段階は、第2のリセスを、z高さにおいて前記第1の抵抗器コンタクトとピラーとの累計にほぼ等しく、前記コンタクト金属でバックフィルする段階をさらに含む、請求項13に記載の方法。 - プロセッサ論理回路と、
前記プロセッサ論理回路に連結されるメモリ回路と、
前記プロセッサ論理回路に連結され、無線送信回路および無線受信回路を含むRF回路と、
DC電力供給を受ける入力、および前記プロセッサ論理回路と、前記メモリ回路と、前記RF回路とのうちの少なくとも1つに連結される出力を含む電力管理回路であって、前記プロセッサ論理回路と、前記メモリ回路と、前記RF回路と、または前記電力管理回路とのうちの少なくとも1つは集積回路(IC)構造を含む、電力管理回路と、を備え、
前記集積回路(IC)構造は、
基板の上方に水平方向に延びる導電トレースと、
前記導電トレースの第1の端部と接触する抵抗材料から構成されるピラーであって、前記ピラーは前記第1の端部から第1のz高さ分延び、前記第1のz高さは前記導電トレースと接合する前記ピラーの水平方向の長さより大きい、ピラーと、
前記ピラーと接触して配置され、第1の厚みだけ前記導電トレースから分離される第1の抵抗器コンタクトと、
前記導電トレースの第2の端部と接触して配置される第2の抵抗器コンタクトと、を含む、システムオンチップ(SOC)。 - 前記ピラーの電気抵抗は少なくとも2000Ωであり、前記導電トレースの抵抗と、前記第1の抵抗器コンタクトの抵抗と、前記第2の抵抗器コンタクトの抵抗との累計の2倍より大きい、請求項19に記載のSOC。
- プロセッサ論理回路と、
前記プロセッサ論理回路に連結されるメモリ回路と、
前記プロセッサ論理回路に連結され、無線送信回路および無線受信回路を含むRF回路と、
DC電力供給を受ける入力、および前記プロセッサ論理回路と、前記メモリ回路と、前記RF回路とのうちの少なくとも1つに連結される出力を含む電力管理回路であって、前記プロセッサ論理回路と、前記メモリ回路と、前記RF回路と、または電力管理回路とのうちの少なくとも1つが、請求項1から11のいずれか一項に記載の前記集積回路(IC)構造を含む、電力管理回路と、を備える、システムオンチップ(SOC)。 - 前記基板の上方に、前記ピラーに隣接して配置されるトランジスタをさらに備え、
前記トランジスタは、
半導体チャネルの上方に配置されるゲートスタックであって、前記ゲートスタックはゲート誘電体の上方に配置されるゲート電極を含む、ゲートスタックと、
前記半導体チャネルの対向する側に配置される一組の半導体ソース/ドレインと、
前記一組の半導体ソース/ドレインに配置される一組のソース/ドレインコンタクトと、をさらに含み、
前記導電トレースは第2のz高さを有する第1の材料を含み、
前記ゲート電極は前記基板の上方に配置される絶縁誘電体の表面からz高さ分延び、前記z高さは前記第1のz高さと前記第2のz高さとの累計より大きい、請求項1から6のいずれか一項に記載のIC構造。 - 前記第1のz高さは50〜200nmであり、
前記ピラーの水平方向の長さは25nm以下であり、
前記第2の抵抗器コンタクトの水平方向の長さは25nm以下であり、
前記導電トレースは、前記第1のz高さから、前記ピラーの前記水平方向の長さと前記第2の抵抗器コンタクトの水平方向の長さとの累計までの範囲内である水平方向の長さを有するドープされたポリシリコンを含む、請求項1から10のいずれか一項に記載のIC構造。
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