JP2017120820A - ウェーハの加工方法 - Google Patents
ウェーハの加工方法 Download PDFInfo
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- JP2017120820A JP2017120820A JP2015256353A JP2015256353A JP2017120820A JP 2017120820 A JP2017120820 A JP 2017120820A JP 2015256353 A JP2015256353 A JP 2015256353A JP 2015256353 A JP2015256353 A JP 2015256353A JP 2017120820 A JP2017120820 A JP 2017120820A
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- 238000003672 processing method Methods 0.000 title claims description 6
- 238000012545 processing Methods 0.000 claims abstract description 96
- 238000003384 imaging method Methods 0.000 claims abstract description 23
- 230000001678 irradiating effect Effects 0.000 claims abstract description 18
- 238000003754 machining Methods 0.000 claims abstract description 9
- 239000002184 metal Substances 0.000 claims description 44
- 229910052751 metal Inorganic materials 0.000 claims description 44
- 238000003860 storage Methods 0.000 claims description 36
- 238000005259 measurement Methods 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 210000002381 plasma Anatomy 0.000 description 25
- 238000012937 correction Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910009372 YVO4 Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 244000309466 calf Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
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Abstract
【解決手段】レーザー加工溝形成中に、ウェーハにパルスレーザー光線を照射することにより発生するビームプラズマ300を含む加工領域を撮像手段36によって撮像し、パルスレーザー光線のビームプラズマ300の位置とあらかじめ設定された加工位置36aとの位置関係を計測することにより、レーザー加工中に、所望の位置が加工されているか否かをリアルタイムに把握することができ、加工位置にずれがある場合は、直ちに加工位置を修正することが可能となる。
【選択図】図8
Description
(1)金属パターン位置記憶ステップ
図3(b)に示すように、領域11〜16のラインLX1及びLX3には、銅などの金属からなるTEG(Test Element Group)と呼ばれる金属パターン17が形成されている。また、ラインLY3にも金属パターン18が形成されている。金属パターン17,18は、領域11〜16のそれぞれに、一定の周期にて形成されている。したがって、いずれの領域においても、同一箇所に金属パターン17,18が形成されている。図3(b)の例では、ラインLX1及びLX3並びにラインLY3に金属パターン17,18が形成されているが、金属パターンが形成されるラインは、これらのラインには限られない。金属パターン17,18は、各デバイスDに発生する設計上や製造上の問題を見つけ出すためのテスト用素子としての役割を有している。金属パターン17,18も、レチクルを介したスパッタ、CVD等によって形成されるため、レチクルには、金属パターン17,18に対応したマスクが形成されている。
オペレータは、レチクルの仕様に関する情報に基づき、レーザー加工溝が所望の位置に形成されているか否かの検査(カーフチェック)を実施するラインとして、金属パターン17,18が形成されていないラインを設定して入力し、記憶手段81に記憶させる。例えば、図3(b)の例では、ラインLX4がカーフチェックの対象として設定される。
また、オペレータは、後のアライメントステップにおいて加工すべきラインを検出する際のパターンマッチングにおいて用いるキーパターンを特定し、そのキーパターンを含む画像を記憶手段81に記憶させる。例えば、デバイスDにおける特徴的な形状を有する特定の回路パターン、例えば図4に示すキーパターンKPをパターンマッチング用のキーパターンとしてあらかじめ選び、そのキーパターンKPを含む画像を記憶手段81に記憶させる。また、記憶手段81には、そのキーパターンKPから隣接するX軸方向に延びるライン(例えばラインLX2)の中央LOまでの距離DYの値も記憶させておく。なお、キーパターンとして、デバイスDの回路パターンではなく、パターンマッチング用にウェーハWのデバイスD以外の部分に設けられているものを使用してもよい。
(1)ウェーハWの向きの調整
チャックテーブル2に保持されたウェーハWは、チャックテーブル2が−X方向に移動することにより、カメラ70の下方に位置づけされる。そして、図4に示した2つのキーパターンKP、例えばX軸方向の両端部に位置する2つのキーパターンKPをパターンマッチングによって検出する。
次に、チャックテーブル2を回転させつつ、ウェーハWの周縁を例えば3箇所、例えば図5に示す周縁領域E1,E2,E3を撮像してそれぞれについての画像を取得し、エッジ検出することにより、制御手段80が、ウェーハWの周縁上の3点のX−Y座標をそれぞれ求める。具体的には、周縁領域E1,E2,E3のそれぞれの画像において、画素値があるしきい値以上変化した部分をエッジとして認識する画像処理を行うことによって、3点のX−Y座標を求める。制御手段80は、その3点の座標に基づき、ウェーハWの中心OのX−Y座標を求める。
次に、制御手段80は、記憶手段81にあらかじめ記憶されているウェーハWのサイズ(直径)に基づき、中心Oから半径分だけ外周側に離間した位置をウェーハWのエッジEとし、そのエッジのY座標を算出する。そして、エッジのY座標と、記憶手段81に記憶されたウェーハWのインデックスサイズ及びX軸方向のライン数に基づき、最初にレーザー加工する最外ラインのY座標を求め、記憶手段81に記憶させる。この最外ラインは、領域14,15,16のラインLX1である。このように、ウェーハWの中心Oを基準として最外ラインLX1を求めることにより、かりに、ウェーハWのチャックテーブル2への搬入時に、チャックテーブル2の中心とウェーハWの中心とが一致していなかったとしても、最外ラインLX1の位置を正確に求めることができる。
以上のようにして、レーザー加工及びレーザー加工によって形成されるレーザー加工溝のチェックに必要な情報が記憶手段81に記憶された後、各ラインに沿って実際のレーザー加工を行うとともに、レーザー加工によって形成されるレーザー加工溝が所望の位置に形成されているか否かの検査(カーフチェック)を行う。
レーザー光線の光源 :YVO4レーザー又はYAGレーザー
波長 :355nm
繰り返し周波数 :50kHz
平均出力 :3W
集光スポット径 :φ10μm
加工送り速度 :100mm/秒
金属パターン位置記憶ステップにおいてラインLX4をカーフチェック対象として記憶手段81に記憶させたため、本ステップでは、制御手段80がその情報を記憶手段81から読み出し、ラインLX4における金属パターン17,18が形成された位置以外の位置において、ラインLX4の加工によって形成されたレーザー加工溝のカーフチェックを行う。
2:チャックテーブル 20:吸引部 21:枠体 22:クランプ部
23:回転駆動部 24:カバー
3:レーザー光線照射手段
30:レーザー加工溝 300:ビームプラズマ 30a:ビームプラズマ中央線
31:パルスレーザー光線発振手段31
311:パルスレーザー光線発振器 312:繰り返し周波数設定手段
32:集光器 321:集光レンズ
33:ダイクロイックミラー
34:ストロボ光照射手段 341:ストロボ光源 342:絞り 343:レンズ
344:方向変換ミラー
35:ビームスプリッター
36:撮像手段 36a:基準線
361:組レンズ 361a:収差補正レンズ 361b:結像レンズ
362:撮像素子(CCD) 37:ズレ量
4:X軸方向移動手段
40:ボールネジ 41:ガイドレール 42:モータ 43:軸受部
44:移動基台 441:被案内溝
45:X軸方向位置検出手段 451:リニアスケール 452:読み取りヘッド
5:Y軸方向移動手段
50:ボールネジ 51:ガイドレール 52:モータ 53:軸受部
54:移動基台 541:被案内溝
55:Y軸方向位置検出手段 551:リニアスケール 552:読み取りヘッド
60:静止基台 61:支持部材 62:ケーシング
7:アライメント手段 70:カメラ
80:制御手段 81:記憶手段
W:ウェーハ W1:表面 D:デバイス
L,LX1〜LX5,LY1〜LY3:分割予定ライン 11〜16:領域
T:テープ F:フレーム
17,18:金属パターン KP:キーパターン
Claims (2)
- 基板の表面に格子状に形成された分割予定ラインによって区画された各領域にデバイスが形成されたウェーハにパルスレーザー光線を照射するレーザー光線照射手段によりウェーハを加工するウェーハの加工方法であって、
レーザー加工装置のアライメント手段によって該ウェーハの加工位置である該分割予定ラインを検出するアライメントステップと、
該アライメントステップを実施した後に、該パルスレーザー光線照射手段によってパルスレーザー光線を該分割予定ラインに沿って照射し、レーザー加工溝を形成するレーザー加工溝形成ステップと、から構成され、
該レーザー加工溝形成ステップの実施中に、該レーザー光線照射手段によって該ウェーハにパルスレーザー光線を照射することにより発生するビームプラズマを含む加工領域を撮像手段によって撮像して、該パルスレーザー光線の該ビームプラズマの位置とあらかじめ設定された加工位置との位置関係を計測する加工位置計測ステップを行う
ことを特徴とするウェーハの加工方法。 - 該ウェーハの該分割予定ラインにテスト用の金属パターンが一定の周期で形成されており、
該アライメントステップを実施する前に、
該金属パターンの周期及び位置情報をレーザー加工装置の記憶手段に記憶させる金属パターン位置記憶ステップを含み、
該加工位置計測ステップにおいては、該金属パターン位置記憶ステップで予め記憶した該金属パターンの周期及び位置情報に基いて該金属パターン位置以外の位置において該位置関係を計測する
ことを特徴とする請求項1記載のウェーハの加工方法。
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JP2020178033A (ja) * | 2019-04-18 | 2020-10-29 | 株式会社ディスコ | 加工装置及び被加工物の加工方法 |
CN112518110A (zh) * | 2019-09-19 | 2021-03-19 | 株式会社迪思科 | 激光加工方法和激光加工装置 |
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