JP2017016104A5 - - Google Patents
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- Publication number
- JP2017016104A5 JP2017016104A5 JP2016111005A JP2016111005A JP2017016104A5 JP 2017016104 A5 JP2017016104 A5 JP 2017016104A5 JP 2016111005 A JP2016111005 A JP 2016111005A JP 2016111005 A JP2016111005 A JP 2016111005A JP 2017016104 A5 JP2017016104 A5 JP 2017016104A5
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- pattern processing
- substrate
- optionally substituted
- processing composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000006850 spacer group Chemical group 0.000 claims description 4
- 238000003672 processing method Methods 0.000 claims description 3
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 125000001188 haloalkyl group Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229920001400 block copolymer Polymers 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000000463 material Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 125000001725 pyrenyl group Chemical group 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- UQRONKZLYKUEMO-UHFFFAOYSA-N 4-methyl-1-(2,4,6-trimethylphenyl)pent-4-en-2-one Chemical group CC(=C)CC(=O)Cc1c(C)cc(C)cc1C UQRONKZLYKUEMO-UHFFFAOYSA-N 0.000 description 1
- 125000000172 C5-C10 aryl group Chemical group 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 125000004965 chloroalkyl group Chemical group 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562170526P | 2015-06-03 | 2015-06-03 | |
| US62/170,526 | 2015-06-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017016104A JP2017016104A (ja) | 2017-01-19 |
| JP2017016104A5 true JP2017016104A5 (enExample) | 2017-08-31 |
| JP6233986B2 JP6233986B2 (ja) | 2017-11-22 |
Family
ID=57452476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016111005A Expired - Fee Related JP6233986B2 (ja) | 2015-06-03 | 2016-06-02 | パターン処理のための組成物及び方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9684241B2 (enExample) |
| JP (1) | JP6233986B2 (enExample) |
| KR (1) | KR101809569B1 (enExample) |
| CN (1) | CN106243514B (enExample) |
| TW (1) | TWI615460B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IN2015DN01286A (enExample) | 2012-08-24 | 2015-07-03 | Citrox Biosciences Ltd | |
| US10162265B2 (en) | 2015-12-09 | 2018-12-25 | Rohm And Haas Electronic Materials Llc | Pattern treatment methods |
| WO2018008481A1 (ja) * | 2016-07-07 | 2018-01-11 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
| JP6796416B2 (ja) * | 2016-07-08 | 2020-12-09 | 東京応化工業株式会社 | レジストパターン形成方法 |
| US9910355B2 (en) * | 2016-07-29 | 2018-03-06 | Rohm And Haas Electronic Materials Llc | Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom |
| US9910353B2 (en) * | 2016-07-29 | 2018-03-06 | Dow Global Technologies Llc | Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom |
| US10133179B2 (en) * | 2016-07-29 | 2018-11-20 | Rohm And Haas Electronic Materials Llc | Pattern treatment methods |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4665131A (en) * | 1985-06-14 | 1987-05-12 | Nippon Oil And Fats Company, Ltd. | Block copolymer |
| US5219945A (en) * | 1992-02-20 | 1993-06-15 | E. I. Du Pont De Nemours And Company | ABC triblock methacrylate polymers |
| US7094833B2 (en) * | 2001-07-16 | 2006-08-22 | Kaneka Corporation | Block copolymer |
| US6790908B2 (en) * | 2002-05-09 | 2004-09-14 | Rhodia Inc. | Block copolymer |
| JP3675434B2 (ja) | 2002-10-10 | 2005-07-27 | 東京応化工業株式会社 | 微細パターンの形成方法 |
| US7255920B2 (en) * | 2004-07-29 | 2007-08-14 | 3M Innovative Properties Company | (Meth)acrylate block copolymer pressure sensitive adhesives |
| JP4859437B2 (ja) | 2005-10-25 | 2012-01-25 | 大阪有機化学工業株式会社 | 被膜形成用樹脂組成物 |
| BRPI0806825A2 (pt) * | 2007-02-06 | 2011-09-13 | Ciba Holding Inc | copolimeros em bloco polissiloxano |
| JP5069494B2 (ja) * | 2007-05-01 | 2012-11-07 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
| JP4558064B2 (ja) | 2007-05-15 | 2010-10-06 | 富士フイルム株式会社 | パターン形成方法 |
| KR101355167B1 (ko) * | 2007-12-14 | 2014-01-28 | 삼성전자주식회사 | 적어도 세 개의 고분자 블록을 구비하는 블록 공중합체를이용한 미세 패턴 형성 방법 |
| US7763319B2 (en) * | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US7745077B2 (en) | 2008-06-18 | 2010-06-29 | Az Electronic Materials Usa Corp. | Composition for coating over a photoresist pattern |
| JP5515584B2 (ja) * | 2009-10-02 | 2014-06-11 | Ｊｓｒ株式会社 | レジストパターンコーティング剤及びレジストパターン形成方法 |
| US8821978B2 (en) | 2009-12-18 | 2014-09-02 | International Business Machines Corporation | Methods of directed self-assembly and layered structures formed therefrom |
| KR20140024256A (ko) * | 2010-11-24 | 2014-02-28 | 다우 코닝 코포레이션 | 블록 공중합체의 형태 제어 |
| JP5705669B2 (ja) * | 2011-07-14 | 2015-04-22 | メルクパフォーマンスマテリアルズＩｐ合同会社 | 微細パターン形成用組成物およびそれを用いた微細化されたパターン形成方法 |
| TW201323461A (zh) * | 2011-09-06 | 2013-06-16 | Univ Cornell | 嵌段共聚物及利用彼等之蝕印圖案化 |
| JP5793399B2 (ja) | 2011-11-04 | 2015-10-14 | 富士フイルム株式会社 | パターン形成方法及びその方法に用いる架橋層形成用組成物 |
| JP5979660B2 (ja) | 2012-02-09 | 2016-08-24 | 東京応化工業株式会社 | コンタクトホールパターンの形成方法 |
| JP5891075B2 (ja) | 2012-03-08 | 2016-03-22 | 東京応化工業株式会社 | ブロックコポリマー含有組成物及びパターンの縮小方法 |
| JPWO2014003023A1 (ja) * | 2012-06-29 | 2016-06-02 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
| US9334423B2 (en) * | 2012-08-31 | 2016-05-10 | Basf Se | Compositions comprising an acrylic block copolymer and a UV-curable copolymer and methods of making and using the same |
| US9606440B2 (en) | 2013-02-25 | 2017-03-28 | The University Of Queensland | Lithographically produced features |
| FR3003257B1 (fr) * | 2013-03-13 | 2015-03-20 | Polymem | Copolymere a blocs amphiphile et son utilisation pour la fabrication de membranes polymeres de filtration |
| KR20140120212A (ko) | 2013-04-02 | 2014-10-13 | 주식회사 동진쎄미켐 | 미세패턴 형성용 코팅 조성물 및 이를 이용한 미세패턴 형성방법 |
| JP6134619B2 (ja) | 2013-09-13 | 2017-05-24 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
| JP6233240B2 (ja) * | 2013-09-26 | 2017-11-22 | 信越化学工業株式会社 | パターン形成方法 |
| JP2015082011A (ja) * | 2013-10-22 | 2015-04-27 | 富士フイルム株式会社 | パターン形成方法、並びに、これを用いた電子デバイスの製造方法、及び、電子デバイス |
| KR102198023B1 (ko) | 2013-10-30 | 2021-01-05 | 삼성전자주식회사 | 반도체 소자의 패턴 형성방법 |
| KR20150101875A (ko) * | 2014-02-27 | 2015-09-04 | 삼성전자주식회사 | 블록 공중합체를 이용한 미세 패턴 형성 방법 |
| JP6459759B2 (ja) | 2014-05-26 | 2019-01-30 | 信越化学工業株式会社 | パターン形成方法及びシュリンク剤 |
| JP6598516B2 (ja) * | 2014-06-30 | 2019-10-30 | キヤノン株式会社 | 自己分散顔料の製造方法、インクの製造方法、及びインクジェット記録方法 |
| US9448483B2 (en) | 2014-07-31 | 2016-09-20 | Dow Global Technologies Llc | Pattern shrink methods |
| JP6398848B2 (ja) * | 2014-12-08 | 2018-10-03 | 信越化学工業株式会社 | シュリンク材料及びパターン形成方法 |
-
2016
- 2016-05-30 TW TW105116935A patent/TWI615460B/zh not_active IP Right Cessation
- 2016-06-01 CN CN201610384024.0A patent/CN106243514B/zh not_active Expired - Fee Related
- 2016-06-02 KR KR1020160068668A patent/KR101809569B1/ko not_active Expired - Fee Related
- 2016-06-02 JP JP2016111005A patent/JP6233986B2/ja not_active Expired - Fee Related
- 2016-06-03 US US15/172,276 patent/US9684241B2/en not_active Expired - Fee Related
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