JP2017010015A5 - - Google Patents
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- Publication number
- JP2017010015A5 JP2017010015A5 JP2016111064A JP2016111064A JP2017010015A5 JP 2017010015 A5 JP2017010015 A5 JP 2017010015A5 JP 2016111064 A JP2016111064 A JP 2016111064A JP 2016111064 A JP2016111064 A JP 2016111064A JP 2017010015 A5 JP2017010015 A5 JP 2017010015A5
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- substrate
- pattern processing
- feature
- processing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 238000003672 processing method Methods 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 2
- 230000007261 regionalization Effects 0.000 claims 1
- 239000000463 material Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562170534P | 2015-06-03 | 2015-06-03 | |
| US62/170,534 | 2015-06-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017010015A JP2017010015A (ja) | 2017-01-12 |
| JP2017010015A5 true JP2017010015A5 (enExample) | 2017-08-31 |
| JP6231161B2 JP6231161B2 (ja) | 2017-11-15 |
Family
ID=57452864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016111064A Expired - Fee Related JP6231161B2 (ja) | 2015-06-03 | 2016-06-02 | パターン処理のための組成物及び方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9703203B2 (enExample) |
| JP (1) | JP6231161B2 (enExample) |
| KR (1) | KR101809571B1 (enExample) |
| CN (1) | CN106243513A (enExample) |
| TW (1) | TWI627220B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108351606A (zh) | 2015-11-19 | 2018-07-31 | Az电子材料（卢森堡）有限公司 | 用于形成细微抗蚀图案的组合物和使用该组合物的图案形成方法 |
| US10162265B2 (en) | 2015-12-09 | 2018-12-25 | Rohm And Haas Electronic Materials Llc | Pattern treatment methods |
| WO2018008481A1 (ja) * | 2016-07-07 | 2018-01-11 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
| US9910355B2 (en) * | 2016-07-29 | 2018-03-06 | Rohm And Haas Electronic Materials Llc | Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom |
| US9910353B2 (en) * | 2016-07-29 | 2018-03-06 | Dow Global Technologies Llc | Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4665131A (en) * | 1985-06-14 | 1987-05-12 | Nippon Oil And Fats Company, Ltd. | Block copolymer |
| US6790908B2 (en) * | 2002-05-09 | 2004-09-14 | Rhodia Inc. | Block copolymer |
| US7135506B2 (en) * | 2002-09-27 | 2006-11-14 | Fuji Photo Film Co., Ltd. | Oil based ink composition for inkjet printer and method of forming image using the same |
| JP3675434B2 (ja) | 2002-10-10 | 2005-07-27 | 東京応化工業株式会社 | 微細パターンの形成方法 |
| JP4859437B2 (ja) * | 2005-10-25 | 2012-01-25 | 大阪有機化学工業株式会社 | 被膜形成用樹脂組成物 |
| JP5069494B2 (ja) * | 2007-05-01 | 2012-11-07 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法 |
| JP4558064B2 (ja) | 2007-05-15 | 2010-10-06 | 富士フイルム株式会社 | パターン形成方法 |
| US7763319B2 (en) * | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US7745077B2 (en) | 2008-06-18 | 2010-06-29 | Az Electronic Materials Usa Corp. | Composition for coating over a photoresist pattern |
| US8821978B2 (en) | 2009-12-18 | 2014-09-02 | International Business Machines Corporation | Methods of directed self-assembly and layered structures formed therefrom |
| KR20140024256A (ko) * | 2010-11-24 | 2014-02-28 | 다우 코닝 코포레이션 | 블록 공중합체의 형태 제어 |
| JP5705669B2 (ja) * | 2011-07-14 | 2015-04-22 | メルクパフォーマンスマテリアルズＩｐ合同会社 | 微細パターン形成用組成物およびそれを用いた微細化されたパターン形成方法 |
| TW201323461A (zh) * | 2011-09-06 | 2013-06-16 | Univ Cornell | 嵌段共聚物及利用彼等之蝕印圖案化 |
| JP5793399B2 (ja) | 2011-11-04 | 2015-10-14 | 富士フイルム株式会社 | パターン形成方法及びその方法に用いる架橋層形成用組成物 |
| KR102028109B1 (ko) * | 2011-12-23 | 2019-11-15 | 금호석유화학 주식회사 | 미세패턴 형성용 수용성 수지 조성물 및 이를 이용한 미세패턴의 형성방법 |
| JP5979660B2 (ja) | 2012-02-09 | 2016-08-24 | 東京応化工業株式会社 | コンタクトホールパターンの形成方法 |
| JP5891075B2 (ja) | 2012-03-08 | 2016-03-22 | 東京応化工業株式会社 | ブロックコポリマー含有組成物及びパターンの縮小方法 |
| JPWO2014003023A1 (ja) * | 2012-06-29 | 2016-06-02 | Jsr株式会社 | パターン形成用組成物及びパターン形成方法 |
| US9606440B2 (en) | 2013-02-25 | 2017-03-28 | The University Of Queensland | Lithographically produced features |
| FR3003257B1 (fr) * | 2013-03-13 | 2015-03-20 | Polymem | Copolymere a blocs amphiphile et son utilisation pour la fabrication de membranes polymeres de filtration |
| KR20140120212A (ko) | 2013-04-02 | 2014-10-13 | 주식회사 동진쎄미켐 | 미세패턴 형성용 코팅 조성물 및 이를 이용한 미세패턴 형성방법 |
| US9382444B2 (en) * | 2013-06-24 | 2016-07-05 | Dow Global Technologies Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
| JP6134619B2 (ja) | 2013-09-13 | 2017-05-24 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
| JP6233240B2 (ja) * | 2013-09-26 | 2017-11-22 | 信越化学工業株式会社 | パターン形成方法 |
| KR102198023B1 (ko) | 2013-10-30 | 2021-01-05 | 삼성전자주식회사 | 반도체 소자의 패턴 형성방법 |
| KR20150101875A (ko) * | 2014-02-27 | 2015-09-04 | 삼성전자주식회사 | 블록 공중합체를 이용한 미세 패턴 형성 방법 |
| JP6459759B2 (ja) | 2014-05-26 | 2019-01-30 | 信越化学工業株式会社 | パターン形成方法及びシュリンク剤 |
| US9448483B2 (en) | 2014-07-31 | 2016-09-20 | Dow Global Technologies Llc | Pattern shrink methods |
| JP6483397B2 (ja) * | 2014-10-17 | 2019-03-13 | 東京応化工業株式会社 | レジストパターン形成方法 |
| JP6332113B2 (ja) * | 2014-12-08 | 2018-05-30 | 信越化学工業株式会社 | シュリンク材料及びパターン形成方法 |
-
2016
- 2016-05-30 TW TW105116936A patent/TWI627220B/zh not_active IP Right Cessation
- 2016-06-01 CN CN201610382359.9A patent/CN106243513A/zh active Pending
- 2016-06-02 KR KR1020160069076A patent/KR101809571B1/ko not_active Expired - Fee Related
- 2016-06-02 JP JP2016111064A patent/JP6231161B2/ja not_active Expired - Fee Related
- 2016-06-03 US US15/172,260 patent/US9703203B2/en not_active Expired - Fee Related