JP2016534222A - ポリマー表面への銅の接着性を高めるための方法 - Google Patents
ポリマー表面への銅の接着性を高めるための方法 Download PDFInfo
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Abstract
Description
本発明は、図面に示した実施形態を参照して説明されるが、本発明は、実施形態の多くの代替形態で具体化することができることを理解すべきである。さらに、要素又は材料のいずれの適切なサイズ、形状、又はタイプを使用することができる。例えば、ポリマー−金属構造が説明されている一方で、本明細書に記載された方法及び装置は、他のマイクロスケールのフィーチャ(features)に適用してよい。
希ガスと窒素含有ガスとを含有する第1のプロセスガスを導入するステップと、
2W/cm2以下の第1の電力条件において作動される銅ターゲット(例えば金属源114)から銅をスパッタリングするステップと
を包含してよい。窒素含有ガスは、窒素の濃度は1%乃至50%の範囲である窒素アルゴン混合物を包含し得る。特定の一実施形態において、最大(up to)3μmの銅層に接着するため、窒素混合物は約5%であり得る。他の実施形態において、窒素濃度は、より厚い(thicker)金属スタックのために、より高い百分率でありえる。窒素濃度はまた、これらの金属スタックの上に堆積されてもよい他の材料のために最適化されてもよい。一実施形態において、少なくとも図1に示されるように、窒素及びアルゴンガスの濃度は、チャンバ内へのガス流量によって制御される(例えば、アルゴン 116、N2 118)。ガス流量は、マスフローコントローラを介して制御されてよい。しかしながら、ガスの濃度は、その他の手段によって制御されてもよい。その他の手段は、存在するN2及びArの量を決定するため、サンプリングPVDチャンバ102を包含してよいが、それに限定されない。
Claims (20)
- ポリマー材料に銅を接着させる方法であって、
基板に対する銅含有層の接着性を高めるために、窒素含有環境に基板を曝露するステップであって、前記基板は、少なくとも部分的にポリマー材料で被覆されている半導体デバイスのトレイを有するステップと、
基板の上に存在するポリマー材料の表面上に銅含有層を堆積するステップと
を有する、方法。 - 前記堆積するステップと曝露するステップとは、並行して行われる、請求項1に記載の方法。
- 前記曝露するステップは、前記堆積するステップに先立って行われる、請求項1に記載の方法。
- ターゲット層厚さを達成するため、前記銅含有層が堆積されるとき、前記銅含有層は、実質的にCuに遷移するポリマー表面に近接したCuNxを有する、
請求項1に記載の方法。 - 前記銅含有層はCuNxを有し、且つ前記銅含有層の窒素含有量は、ポリマー表面からの距離と共に減少する、請求項1に記載の方法。
- 前記基板は、プリント回路基板又は別の電子デバイスに結合することができるカプセル化電子デバイスを有する、請求項1に記載の方法。
- 前記堆積するステップは、物理蒸着(PVD)プロセスを実行することを含む、請求項1に記載の方法。
- 前記曝露するステップは、ポリマー表面を窒素含有プラズマに曝露することを含む、請求項1に記載の方法。
- 前記曝露するステップは、ポリマー表面を窒素もしくは窒素含有イオンビームに曝露することを含む、請求項1に記載の方法。
- パッケージ化された電子デバイス上に金属層を堆積させる方法であって、当該方法は、
露出されたポリマー表面を有する前記パッケージ化された電子デバイスを受け取るステップと、
前記露出されたポリマー表面に窒素含有プラズマを適用するステップと、
前記窒素含有プラズマを使用してアクティベートされた後の前記露出されたポリマー表面上に銅含有層を堆積するステップと
を有する、方法。 - パッケージ化された電子デバイス上に金属層を堆積する方法であって、当該方法は、
露出されたポリマー材料を有する前記パッケージ化された電子デバイスを受け取るステップと、
窒素含有プラズマで露出されたポリマー材料を処理することにより、前記露出されたポリマー材料をアクティベートするステップと、
物理蒸着プロセスを介して露出されたポリマー材料上に銅層を堆積させるステップであって、前記銅層は、前記パッケージ化された電子デバイスのための電磁遮蔽を提供する提供するステップと
を有する、方法。 - 前記露出されたポリマー材料をアクティベートするステップは、第1の処理チャンバ内で生じ、且つ
前記銅層を堆積させるステップは、第2の処理チャンバ内で生じる、
請求項11に記載の方法。 - 前記第1の処理チャンバは、電極又はアンテナを含むエッチングチャンバを有し、且つ第2の処理チャンバは、マグネトロンを含む物理蒸着チャンバを有する、請求項12に記載の方法。
- 窒素含有プラズマで露出されたポリマー材料を処理するステップは、原子状窒素(N)、二原子状窒素(N2)、原子状窒素イオン(N+)、二原子状窒素イオン(N2 +)、又は準安定窒素(N*、N2 *)を包含するが、それらに限定されない、窒素含有化学種を有する窒素プラズマで前記露出されたポリマー材料を等方性衝突させることを含む、請求項11に記載の方法。
- 窒素含有プラズマで(to with)露出されたポリマー材料を処理するステップは、原子状窒素(N)、二原子窒素(N2)、原子状窒素イオン(N+)、二原子窒素イオン(N2 +)、又は準安定窒素(N*、N2 *)を包含するが、それらに限定されない、窒素含有化学種を有する窒素プラズマで前記露出されたポリマー材料を異方性衝突させることを含む、請求項11に記載の方法。
- 前記銅層を堆積させるステップは、
希ガスと窒素含有ガスとを含有する第1のプロセスガスを導入するステップと、
単位面積当たりのスパッタ電力1W/cm2以上を包含する電力条件において作動される銅ターゲットから銅をスパッタリングするステップと
を含む、請求項11に記載の方法。 - 前記露出されたポリマー材料をアクティベートするステップは、アルゴンと窒素プラズマとを混合するステップをさらに有し、混合物は、少なくとも25%のアルゴンを有する、請求項11に記載の方法。
- カプセル化された半導体デバイスは、前記パッケージ化された電子デバイスの外部にある回路に結合することができる金属接点を含む、請求項11に記載の方法。
- 前記ポリマー材料は、エポキシ樹脂又はシリコーンを含浸させたエポキシを有する、請求項11に記載の方法。
- 前記パッケージ化された電子デバイスは、電気リード又はボール接点を有する、請求項11に記載の方法。
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JP7377543B2 (ja) * | 2020-12-28 | 2023-11-10 | ロック技研工業株式会社 | 樹脂シート表面処理方法及び樹脂シート表面処理装置 |
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