JP2016525631A - 改良された金属蒸気ディスペンサー - Google Patents

改良された金属蒸気ディスペンサー Download PDF

Info

Publication number
JP2016525631A
JP2016525631A JP2016524922A JP2016524922A JP2016525631A JP 2016525631 A JP2016525631 A JP 2016525631A JP 2016524922 A JP2016524922 A JP 2016524922A JP 2016524922 A JP2016524922 A JP 2016524922A JP 2016525631 A JP2016525631 A JP 2016525631A
Authority
JP
Japan
Prior art keywords
metal vapor
dispenser
thread
metal
surface area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016524922A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016525631A5 (cg-RX-API-DMAC7.html
Inventor
ディエゴ・ディ・ジャンピエトロ
アントニオ・ボヌッチ
ジアンニ・サンテラ
Original Assignee
サエス・ゲッターズ・エッセ・ピ・ア
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by サエス・ゲッターズ・エッセ・ピ・ア filed Critical サエス・ゲッターズ・エッセ・ピ・ア
Publication of JP2016525631A publication Critical patent/JP2016525631A/ja
Publication of JP2016525631A5 publication Critical patent/JP2016525631A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K11/00—Resistance welding; Severing by resistance heating
    • B23K11/0013—Resistance welding; Severing by resistance heating welding for reasons other than joining, e.g. build up welding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/38—Exhausting, degassing, filling, or cleaning vessels
    • H01J9/395—Filling vessels

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Physical Vapour Deposition (AREA)
  • Resistance Heating (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electroluminescent Light Sources (AREA)
JP2016524922A 2013-07-11 2014-07-02 改良された金属蒸気ディスペンサー Pending JP2016525631A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI2013A001171 2013-07-11
IT001171A ITMI20131171A1 (it) 2013-07-11 2013-07-11 Erogatore migliorato di vapori metallici
PCT/IB2014/062788 WO2015004574A1 (en) 2013-07-11 2014-07-02 Improved metal vapour dispenser

Publications (2)

Publication Number Publication Date
JP2016525631A true JP2016525631A (ja) 2016-08-25
JP2016525631A5 JP2016525631A5 (cg-RX-API-DMAC7.html) 2017-06-22

Family

ID=49085124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016524922A Pending JP2016525631A (ja) 2013-07-11 2014-07-02 改良された金属蒸気ディスペンサー

Country Status (7)

Country Link
US (1) US20160340769A1 (cg-RX-API-DMAC7.html)
EP (1) EP3001879B8 (cg-RX-API-DMAC7.html)
JP (1) JP2016525631A (cg-RX-API-DMAC7.html)
KR (1) KR20160030119A (cg-RX-API-DMAC7.html)
CN (1) CN105359248B (cg-RX-API-DMAC7.html)
IT (1) ITMI20131171A1 (cg-RX-API-DMAC7.html)
WO (1) WO2015004574A1 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109920711B (zh) * 2017-12-13 2021-06-15 有研工程技术研究院有限公司 一种碱金属释放剂所用释放器的制备方法
CN109950787B (zh) * 2019-03-08 2020-04-21 山西大学 一种可精确控制原子密度的碱金属蒸汽池

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4952572A (cg-RX-API-DMAC7.html) * 1972-06-15 1974-05-22
JP2004532932A (ja) * 2001-05-15 2004-10-28 サエス ゲッターズ ソチエタ ペル アツィオニ セシウム供給装置及びその使用方法
JP2004353085A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2008512570A (ja) * 2004-09-10 2008-04-24 サエス ゲッタース ソチエタ ペル アツィオニ リチウムの蒸発及びリチウム・ディスペンサのための混合物
JP2008231573A (ja) * 2007-03-08 2008-10-02 Applied Materials Inc 気化るつぼ、および気化特徴を適合した気化装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2557530A (en) * 1946-09-07 1951-06-19 Eastman Kodak Co Electric heating element
US3579459A (en) 1966-12-13 1971-05-18 Getters Spa Metal vapor generating compositions
GB1274528A (en) * 1968-09-13 1972-05-17 Getters Spa Improvements in or relating to metal vapour generators
NL6913693A (cg-RX-API-DMAC7.html) * 1968-09-13 1970-03-17
US3678246A (en) * 1970-06-24 1972-07-18 Oster Mfg Co John Liquid heating vessel
US4112290A (en) * 1976-10-27 1978-09-05 Denki Kagaku Kogyo Kabushiki Kaisha Evaporation vessel for use in vacuum evaporation
NL7802116A (nl) 1977-03-14 1978-09-18 Getters Spa Alkalimetaaldampgenerator.
NL8802172A (nl) * 1988-09-02 1990-04-02 Philips Nv Alkalimetaaldamp-dispenser.
ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
JP2007238967A (ja) * 2006-03-03 2007-09-20 Sharp Corp 気相成長装置、気相成長方法、基板加熱装置、および基板加熱方法
EP1967605A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation tube and evaporation apparatus with adapted evaporation characteristic
DE102007035593B4 (de) * 2007-07-30 2018-05-09 Ledvance Gmbh Elektrische Lampe mit einem Außenkolben, einem Tellerfuß und einer Einbaulampe
ITMI20082187A1 (it) * 2008-12-11 2010-06-12 Getters Spa Sistema dispensatore di mercurio per lampade a fluorescenza
US8052310B2 (en) * 2009-05-14 2011-11-08 Tyco Electronics Corporation Lighting device
ATE539443T1 (de) * 2009-07-15 2012-01-15 Getters Spa Träger für fadenförmige elemente mit einem wirkstoff

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4952572A (cg-RX-API-DMAC7.html) * 1972-06-15 1974-05-22
JP2004532932A (ja) * 2001-05-15 2004-10-28 サエス ゲッターズ ソチエタ ペル アツィオニ セシウム供給装置及びその使用方法
JP2004353085A (ja) * 2003-05-08 2004-12-16 Sanyo Electric Co Ltd 蒸発装置
JP2008512570A (ja) * 2004-09-10 2008-04-24 サエス ゲッタース ソチエタ ペル アツィオニ リチウムの蒸発及びリチウム・ディスペンサのための混合物
JP2008231573A (ja) * 2007-03-08 2008-10-02 Applied Materials Inc 気化るつぼ、および気化特徴を適合した気化装置

Also Published As

Publication number Publication date
CN105359248B (zh) 2017-07-07
KR20160030119A (ko) 2016-03-16
EP3001879A1 (en) 2016-04-06
US20160340769A1 (en) 2016-11-24
EP3001879B8 (en) 2017-04-12
WO2015004574A1 (en) 2015-01-15
EP3001879B1 (en) 2016-12-07
ITMI20131171A1 (it) 2015-01-11
CN105359248A (zh) 2016-02-24

Similar Documents

Publication Publication Date Title
US11469129B2 (en) Wafer support table
JP5847902B2 (ja) ヒーターカートリッジ組品の製作方法およびヒーターカートリッジ組品
JP2009289756A (ja) 水銀放出用装置
JP2008166265A (ja) 電子放出源
JP5266310B2 (ja) Ｘ線源
JP2016525631A (ja) 改良された金属蒸気ディスペンサー
JP6611451B2 (ja) 粉末ろう材、並びに、接合体及び真空容器
TWI374940B (en) Dispensing system for alkali metals capable of releasing a high quantity of metals
JP6650265B2 (ja) 半田ごて
JP7444946B2 (ja) ヒータ
Pereira et al. Slower impedance collapse with hot anode and enhanced emission cathode
JP6319566B2 (ja) サーミスタ用金属窒化物材料及びその製造方法並びにフィルム型サーミスタセンサ
JP2011173778A (ja) 金属層付きセラミックス部材、金属−セラミックス接合体、金属層付きセラミックス部材の製造方法
JP3489002B2 (ja) 電子部品及びその製造方法
CN223365016U (zh) 一种发热件、雾化芯以及雾化装置
JPH0987051A (ja) セラミックスの接合体およびセラミックスの接合方法
JP2009516344A (ja) 電極および電極部品の改良
JP4769136B2 (ja) セラミック接合体およびセラミックヒータの製造方法
JP2012031008A (ja) 導電層付きセラミック体、およびセラミックスと金属との接合体
TW200811907A (en) Electrode for cold cathode fluorescent lamp
WO2025126317A1 (ja) セラミックサセプタ
JP2002299015A (ja) セラミックヒーター
JPS639339B2 (cg-RX-API-DMAC7.html)
JP5572795B2 (ja) 電子管用部品およびマグネトロン管用エンドハットの製造方法
JPH0747782Y2 (ja) マイクロ波管用カソード

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170512

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170512

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20170512

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20170607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170612

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20170809

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20180226