JP2016208028A - 積層形フォトカプラモジュール - Google Patents
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- 238000010521 absorption reaction Methods 0.000 claims description 8
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- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
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- 229920001296 polysiloxane Polymers 0.000 claims description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 2
- 230000036211 photosensitivity Effects 0.000 abstract description 2
- 230000005641 tunneling Effects 0.000 abstract 2
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- 238000001465 metallisation Methods 0.000 description 3
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- 230000015556 catabolic process Effects 0.000 description 1
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Abstract
【解決手段】送信領域SFを備えた送信モジュールSと、受信領域EFを備えた受信モジュールEと、平板状の電気的な絶縁体とを有する積層形フォトカプラモジュールOPTであって、絶縁体ISが間に設けられており、送信モジュールと受信モジュールとは互いに電気的に分離されつつ、光学的に結合されており、かつ、絶縁体は送信モジュールの放出波長に対して透明であり、送信モジュールの光が主に絶縁体を通過して、受信モジュールに作用する。受信モジュールが有する部分電圧源は、pn接合を有する半導体ダイオードD1からD4を備えており、それぞれ2つの連続する部分電圧源間にトンネルダイオードTD1からTD3が設けられており、共にモノリシック集積されている。
【選択図】図1
Description
Claims (17)
- ‐表面を有する送信領域(SF)を備えた送信モジュール(S)と、表面を有する受信領域(EF)を備えた受信モジュール(E)と、
‐平板状の電気的な絶縁体(IS)と、
を有する積層形のフォトカプラモジュール(OPT)であって、
‐前記絶縁体(IS)は、前記送信モジュール(S)と前記受信モジュール(E)との間に設けられており、
‐前記送信モジュール(S)と前記受信モジュール(E)と前記絶縁体(IS)とは、積層形に互いに上下に重ねられて配置されており、
‐前記送信モジュール(S)と前記受信モジュール(E)とは互いに電気的に分離されているが、互いに光学的に結合されており、かつ、前記絶縁体(IS)は少なくとも、前記送信領域(SF)の放出波長の一部に対して透明であり、
‐前記送信領域(SF)の表面の重心線と前記受信領域(EF)の表面の重心線とは互いに実質的または正確に平行であり、
‐前記送信モジュール(S)の光が主に前記絶縁体(IS)を通過して、または前記絶縁体(IS)のみを通過して、前記受信モジュール(E)に作用すべく、両重心線間のオフセットは、各重心線から前記送信領域(SF)の表面の外縁辺または前記受信領域(EF)の表面の外縁辺までの距離の1/2未満または1/10未満または1/50未満であり、
前記絶縁体(IS)は全ての側面において、積層体からバルコニー状に突出しており、
‐前記受信モジュール(E)は、互いに直列接続されたN個の部分電圧源を有し、ただし、Nは自然数であり、かつN≧2であり、
‐各部分電圧源の部分電圧の相互間の偏差は、20%未満であり、
‐各部分電圧源は、pn接合を有する半導体ダイオード(D1・・・DN)を備えており、
‐それぞれ2つの連続する部分電圧源間にトンネルダイオード(TD1・・・TDN−1)が設けられており、
‐前記部分電圧源と前記トンネルダイオード(TD1・・・TDN−1)とは、共にモノリシック集積されている、
ことを特徴とする積層形のフォトカプラモジュール(OPT)。 - 前記送信領域(SF)の表面の大きさと前記受信領域(EF)の表面の大きさとの差は、20%未満である、
請求項1記載の集積型のフォトカプラ(OPK)。 - 前記送信領域(SF)の表面および前記受信領域(EF)の表面は、4角形の形状であり、各4角形の最長の辺の長さは、2mm未満である、
請求項1または2記載の集積型のフォトカプラ(OPK)。 - 前記送信モジュール(S)と前記絶縁体(IS)と前記受信モジュール(E)とから成る積層体は、同一のパッケージ(G)内に集積されている、
請求項1から3までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信領域(SF)の表面と前記受信モジュール(E)の表面とは、等しい大きさであり、
電気的端子領域を除いて、前記送信領域(SF)全体が光(L)を放出して、前記受信領域(EF)全体が光(L)を吸収する、
請求項1から4までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信領域(SF)の表面および前記受信モジュール(E)の表面は、正方形であり、
前記各表面は、それぞれ、0.2×0.2mm2超かつ4mm2未満または1mm2未満の基礎面を有する、
請求項1から5までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信モジュール(S)は、送信側の波長またはRCLEDまたは面発光レーザに対する光学ミラーを有する、
請求項1から6までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 平板状の前記絶縁体(IS)は、プラスチックから、および/または、ガラスから、および/または、二酸化アルミニウムから、および/または、エポキシ樹脂から、および/または、シリコーンから成る、
請求項1から7までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記絶縁体(IS)は、全ての側面において、積層体から少なくとも5μm突出している、
請求項1から8までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記絶縁体(IS)の厚さは、0.5mm未満であり、なおかつ少なくとも50μmである、
請求項1から9までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信領域(SF)の放出波長は、前記受信領域(EF)の吸収端の波長に等しいか、または前記吸収端の波長より最大10%短い、
請求項1から10までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信モジュール(S)および前記受信モジュール(E)は、III−V族材料から成る、
請求項1から11までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記受信モジュール(E)は、GaAsおよび/またはGe基板を有する、
請求項1から12までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記受信モジュール(E)は、(Al)GaAsおよび/またはInGaPおよび/またはInGaAs材料を含む、
請求項1から13までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記受信モジュール(E)および前記送信モジュール(S)は、積層方向において角錐台状の形状を有し、
角錐台の下面と前記角錐台の上面との面積の差は、少なくとも5μm2である、
請求項1から14までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信領域(SF)の表面は前記絶縁体(IS)の上面に直接配置されており、かつ、受信領域(EF)の表面は前記絶縁体(IS)の下面に直接配置されていることにより、前記送信領域(SF)の表面と前記受信領域(EF)の表面とが互いに面している、
請求項1から15までのいずれか1項記載の集積型のフォトカプラ(OPK)。 - 前記送信モジュール(S)は、基板層(SUBS)を備えており、前記基板層(SUBS)は、前記絶縁体(IS)の上面に配置されており、かつ、前記受信モジュール(E)は、基板層(SUBE)を備えており、前記基板層(SUBE)は、前記絶縁体(IS)の下面に配置されていることにより、両基板層(SUBS,SUBE)は、互いに直接面している、
請求項1から15までのいずれか1項記載の集積型のフォトカプラ(OPK)。
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EP15001126.0A EP3082169A1 (de) | 2015-04-17 | 2015-04-17 | Stapelförmiger optokopplerbaustein |
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DE102017004149A1 (de) * | 2017-05-02 | 2018-11-08 | Azur Space Solar Power Gmbh | Lichtempfangseinheit |
EP3470872B1 (en) * | 2017-10-11 | 2021-09-08 | Melexis Technologies NV | Sensor device |
DE102017011643B4 (de) * | 2017-12-15 | 2020-05-14 | Azur Space Solar Power Gmbh | Optische Spannungsquelle |
US11658257B2 (en) * | 2020-03-27 | 2023-05-23 | Harvatek Corporation | Light source assembly, optical sensor assembly, and method of manufacturing a cell of the same |
US11322542B2 (en) * | 2020-03-27 | 2022-05-03 | Harvatek Corporation | Light-emitting diode (LED) assembly and method of manufacturing an LED cell of the same |
DE102021210619A1 (de) * | 2021-09-23 | 2023-03-23 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronische vorrichtung |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5893267A (ja) * | 1981-11-30 | 1983-06-02 | Toshiba Corp | 光結合集積回路 |
JPS62244181A (ja) * | 1986-04-17 | 1987-10-24 | Nec Corp | フオトカプラ |
JPS6344776A (ja) * | 1986-08-12 | 1988-02-25 | Res Dev Corp Of Japan | 量子井戸を用いた半導体素子 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4127862A (en) | 1977-09-06 | 1978-11-28 | Bell Telephone Laboratories, Incorporated | Integrated optical detectors |
JPS587886A (ja) * | 1981-07-07 | 1983-01-17 | Oki Electric Ind Co Ltd | 半導体装置の製造方法 |
DE3317054A1 (de) | 1983-05-10 | 1984-11-15 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Optokoppler |
US4996577A (en) | 1984-01-23 | 1991-02-26 | International Rectifier Corporation | Photovoltaic isolator and process of manufacture thereof |
US4766471A (en) * | 1986-01-23 | 1988-08-23 | Energy Conversion Devices, Inc. | Thin film electro-optical devices |
DE3633181C2 (de) | 1986-09-30 | 1998-12-10 | Siemens Ag | Reflexlichtschranke |
DE4005835C2 (de) * | 1989-02-23 | 1996-10-10 | Agency Ind Science Techn | Verfahren zum Betrieb eines photoelektrischen Wandlers und photoelektrischen Wandler zur Durchführung des Verfahrens |
JPH0368177A (ja) * | 1989-08-07 | 1991-03-25 | Sharp Corp | 薄膜フォトカプラ |
DD287356A5 (de) * | 1989-08-23 | 1991-02-21 | Veb Werk Fuer Fernsehelektronik,De | Hochspannungsfester optokoppler |
JPH0645636A (ja) * | 1992-07-24 | 1994-02-18 | Sharp Corp | 受発光素子およびこれを利用した受発光装置 |
JP3816114B2 (ja) * | 1993-01-18 | 2006-08-30 | シャープ株式会社 | 光結合装置 |
DE19638194A1 (de) * | 1996-09-19 | 1998-04-02 | Telefunken Microelectron | Verfahren zum Herstellen eines Koppelelements |
JP3874145B2 (ja) | 1998-06-10 | 2007-01-31 | ソニー株式会社 | 変調回路、送信装置及び送信回路 |
DE10011258A1 (de) | 2000-03-08 | 2001-09-20 | Rossendorf Forschzent | Integrierter Optokoppler und Verfahren zu seiner Herstellung |
US6787693B2 (en) * | 2001-12-06 | 2004-09-07 | International Rectifier Corporation | Fast turn on/off photovoltaic generator for photovoltaic relay |
US8134172B2 (en) * | 2003-09-01 | 2012-03-13 | Lg Innotek Co., Ltd. | LED and fabrication method thereof |
US20060004818A1 (en) | 2004-07-01 | 2006-01-05 | Claudatos Christopher H | Efficient information management |
US20060048811A1 (en) * | 2004-09-09 | 2006-03-09 | Krut Dimitri D | Multijunction laser power converter |
US20060060955A1 (en) | 2004-09-22 | 2006-03-23 | Texas Instruments Incorporated | Stacked die infrared transceiver bus |
ITMI20070101A1 (it) * | 2007-01-24 | 2008-07-25 | St Microelectronics Srl | Optoisolatore galvanico integrato monoliticamente su silicio e relativo processo di integrazione |
US20140036343A1 (en) * | 2012-07-31 | 2014-02-06 | Qualcomm Mems Technologies, Inc. | Interferometric modulator with improved primary colors |
US8853658B2 (en) | 2012-08-08 | 2014-10-07 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Face-to-face opto-coupler device and method of manufacture |
US20140212085A1 (en) | 2013-01-29 | 2014-07-31 | Georgios Margaritis | Optocoupler |
JP5865859B2 (ja) * | 2013-03-22 | 2016-02-17 | 株式会社東芝 | 光結合装置 |
JP2015029037A (ja) * | 2013-06-25 | 2015-02-12 | パナソニックIpマネジメント株式会社 | 光結合半導体装置 |
-
2015
- 2015-04-17 EP EP15001126.0A patent/EP3082169A1/de not_active Withdrawn
-
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- 2016-04-15 TW TW105111902A patent/TWI627762B/zh active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5893267A (ja) * | 1981-11-30 | 1983-06-02 | Toshiba Corp | 光結合集積回路 |
JPS62244181A (ja) * | 1986-04-17 | 1987-10-24 | Nec Corp | フオトカプラ |
JPS6344776A (ja) * | 1986-08-12 | 1988-02-25 | Res Dev Corp Of Japan | 量子井戸を用いた半導体素子 |
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US10050169B2 (en) | 2018-08-14 |
EP3082170A3 (de) | 2016-11-09 |
EP3082170A2 (de) | 2016-10-19 |
JP6129377B2 (ja) | 2017-05-17 |
EP3082170B1 (de) | 2021-02-17 |
US20160308085A1 (en) | 2016-10-20 |
CN106057962B (zh) | 2017-12-26 |
CN106057962A (zh) | 2016-10-26 |
TW201703271A (zh) | 2017-01-16 |
TWI627762B (zh) | 2018-06-21 |
EP3082169A1 (de) | 2016-10-19 |
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