JP2016115701A - 気密封止用蓋材の製造方法および気密封止用蓋材 - Google Patents
気密封止用蓋材の製造方法および気密封止用蓋材 Download PDFInfo
- Publication number
- JP2016115701A JP2016115701A JP2014250728A JP2014250728A JP2016115701A JP 2016115701 A JP2016115701 A JP 2016115701A JP 2014250728 A JP2014250728 A JP 2014250728A JP 2014250728 A JP2014250728 A JP 2014250728A JP 2016115701 A JP2016115701 A JP 2016115701A
- Authority
- JP
- Japan
- Prior art keywords
- metal plate
- plating
- hermetic sealing
- shaped
- sealing lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 161
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 38
- 239000002184 metal Substances 0.000 claims abstract description 125
- 229910052751 metal Inorganic materials 0.000 claims abstract description 125
- 238000005260 corrosion Methods 0.000 claims abstract description 63
- 230000007797 corrosion Effects 0.000 claims abstract description 63
- 238000004080 punching Methods 0.000 claims abstract description 22
- 238000007747 plating Methods 0.000 claims description 179
- 238000007789 sealing Methods 0.000 claims description 169
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 57
- 238000000034 method Methods 0.000 claims description 50
- 238000003860 storage Methods 0.000 claims description 23
- 238000012545 processing Methods 0.000 claims description 14
- 239000003566 sealing material Substances 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 200
- 229910045601 alloy Inorganic materials 0.000 description 19
- 239000000956 alloy Substances 0.000 description 19
- 229910019589 Cr—Fe Inorganic materials 0.000 description 15
- 238000012360 testing method Methods 0.000 description 14
- 229910052804 chromium Inorganic materials 0.000 description 13
- 229910000833 kovar Inorganic materials 0.000 description 12
- 238000003466 welding Methods 0.000 description 12
- 229910052759 nickel Inorganic materials 0.000 description 11
- 238000009751 slip forming Methods 0.000 description 10
- 229910052742 iron Inorganic materials 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 230000002829 reductive effect Effects 0.000 description 8
- 239000000919 ceramic Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 238000005219 brazing Methods 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 229910018487 Ni—Cr Inorganic materials 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/10—Containers; Seals characterised by the material or arrangement of seals between parts, e.g. between cap and base of the container or between leads and walls of the container
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
- H03H9/1021—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0621—In horizontal cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/06—Containers; Seals characterised by the material of the container or its electrical properties
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1071—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the SAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/133—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials for electromechanical delay lines or filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01028—Nickel [Ni]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0504—Holders; Supports for bulk acoustic wave devices
- H03H9/0514—Holders; Supports for bulk acoustic wave devices consisting of mounting pads or bumps
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
まず、図1および図2を参照して、本発明の第1実施形態による気密封止用蓋材1の構造について説明する。
次に、図1、図2および図9〜図11を参照して、本発明の第2実施形態による気密封止用蓋材1の製造プロセスについて説明する。この第2実施形態による気密封止用蓋材1の製造方法は、第1実施形態の気密封止用蓋材1の製造方法とは異なり、フープめっき処理の前にスリット加工処理を行う例について説明する。なお、気密封止用蓋材1自体の構造は、上記第1実施形態と同様であるので説明を省略する。
次に、図2、図12および図13を参照して、上記実施形態の効果を確認するために行った気密封止用蓋材に用いる基材層の検討について説明する。
まず、耐食性試験として、組成の異なる試験材の各々に対して、JIS C60068−2−11に従い、35±2℃の温度、5±1質量%の塩濃度、および、6.5以上7.2以下のpHの条件下で、塩水噴霧試験を48時間以上行った。そして、各々の試験材における腐食の度合いを観察した。ここで、24時間経過後と、48時間経過後とにおいて、耐食性を評価した。また、42Ni−4Cr−Fe合金の試験材については、72時間経過後における耐食性も評価した。また、42Ni−6Cr−Fe合金の試験材については、72時間経過後と、144時間経過後とにおける耐食性も評価した。その際、耐食性の評価として、多くの腐食が確認された金属板には、×印(バツ印)を付した。一方、腐食が若干確認されたものの、実用上問題ない程度である場合には、△印(三角印)を付し、腐食が確認できなかった場合には、○印(丸印)を付した。その結果を参照して、実用上特に適していると評価した基材層の材質には、☆印(星印)、実用上好ましいと評価した基材層の材質には、◎印(二重丸印)、実用上用いることが可能であると評価した基材層の材質には、○印(二重丸印)、実用上不適であると評価した基材層の材質には、×印(バツ印)をそれぞれ付した。
次に、上記した試験材の平均熱膨張係数に基づいて、本発明の基材層に適した金属について検討した。なお、封止における溶接対象(基台31)を構成するアルミナ(Al2O3)などのセラミックスの熱膨張係数に近い熱膨張係数を有するFe合金が、基材層としてより適していると考えられる。
1a (気密封止用蓋材の)下面
1b (気密封止用蓋材の)上面
1c (気密封止用蓋材の)側面
10 基材層
10a (基材層の)下面
10b (基材層の)上面
10c (基材層の)側面
11、12、41 Niめっき層
20 水晶振動子(電子部品)
40 金属板
70、170 Niめっきスリット板(Niめっき金属板)
100 電子部品収納用パッケージ
Claims (9)
- 電子部品が収納される電子部品収納用パッケージに用いられる気密封止用蓋材の製造方法であって、
耐食性を有する金属板の表面にNiめっき層を形成してNiめっき金属板を形成する工程と、
前記Niめっき金属板を打抜き加工して、気密封止用蓋材を形成する工程とを備える、気密封止用蓋材の製造方法。 - 前記金属板または前記Niめっき金属板をスリット加工する工程をさらに備える、請求項1に記載の気密封止用蓋材の製造方法。
- 前記スリット加工する工程は、スリット加工された前記金属板または前記Niめっき金属板が、前記気密封止用蓋材の厚みの2倍以上の取り代だけ前記気密封止用蓋材の幅よりも大きい幅を有するように、前記金属板または前記Niめっき金属板をスリット加工する工程を含む、請求項2に記載の気密封止用蓋材の製造方法。
- 前記Niめっき金属板を形成する工程は、電解Niめっき処理により、前記金属板の表面に前記Niめっき層を形成する工程を含む、請求項1〜3のいずれか1項に記載の気密封止用蓋材の製造方法。
- 前記Niめっき金属板を形成する工程は、前記耐食性を有する金属板の上面および下面の両方または一方に前記Niめっき層を形成する工程を含み、
前記気密封止用蓋材を形成する工程は、前記Niめっき金属板を打抜き加工することにより、前記気密封止用蓋材の上面、下面および側面のうち、前記側面には前記Niめっき層が形成されずに、前記上面および前記下面の両方または一方に前記Niめっき層が形成された前記気密封止用蓋材を形成する工程を含む、請求項1〜4のいずれか1項に記載の気密封止用蓋材の製造方法。 - 電子部品が収納される電子部品収納用パッケージに用いられる気密封止用蓋材であって、
耐食性を有する金属板からなる基材層と、
前記基材層の上面、下面および側面のうち、前記側面には形成されずに、前記上面および前記下面の両方または一方に形成されたNiめっき層とを備える、気密封止用蓋材。 - 前記基材層を構成する前記耐食性を有する金属板は、Feと4質量%以上のCrとを少なくとも含むFe合金により構成されている、請求項6に記載の気密封止用蓋材。
- 前記Fe合金は、さらにNiを含む、請求項7に記載の気密封止用蓋材。
- 前記Fe合金は、さらにCoを含む、請求項8に記載の気密封止用蓋材。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014250728A JP6387818B2 (ja) | 2014-12-11 | 2014-12-11 | 気密封止用蓋材の製造方法 |
US15/527,779 US10461001B2 (en) | 2014-12-11 | 2015-11-17 | Method for manufacturing hermetic sealing lid member, and method for manufacturing electronic component housing package |
KR1020177012480A KR101947296B1 (ko) | 2014-12-11 | 2015-11-17 | 기밀 밀봉용 덮개재의 제조 방법, 기밀 밀봉용 덮개재 및 전자 부품 수납용 패키지의 제조 방법 |
CN201580066756.9A CN107005211B (zh) | 2014-12-11 | 2015-11-17 | 气密密封用盖材的制造方法、气密密封用盖材和电子部件收纳用封装的制造方法 |
EP15866889.7A EP3232568A4 (en) | 2014-12-11 | 2015-11-17 | Method for manufacturing hermetic-sealing lid member, hermetic-sealing lid member, and method for manufacturing electronic component storing package |
PCT/JP2015/082189 WO2016093021A1 (ja) | 2014-12-11 | 2015-11-17 | 気密封止用蓋材の製造方法、気密封止用蓋材および電子部品収納用パッケージの製造方法 |
TW104141510A TWI612770B (zh) | 2014-12-11 | 2015-12-10 | 氣密密封用蓋材之製造方法、氣密密封用蓋材及電子零件收納用包裝之製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014250728A JP6387818B2 (ja) | 2014-12-11 | 2014-12-11 | 気密封止用蓋材の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016115701A true JP2016115701A (ja) | 2016-06-23 |
JP6387818B2 JP6387818B2 (ja) | 2018-09-12 |
Family
ID=56107215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014250728A Active JP6387818B2 (ja) | 2014-12-11 | 2014-12-11 | 気密封止用蓋材の製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10461001B2 (ja) |
EP (1) | EP3232568A4 (ja) |
JP (1) | JP6387818B2 (ja) |
KR (1) | KR101947296B1 (ja) |
CN (1) | CN107005211B (ja) |
TW (1) | TWI612770B (ja) |
WO (1) | WO2016093021A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6787662B2 (ja) * | 2015-12-22 | 2020-11-18 | 京セラ株式会社 | シールリング、電子部品収納用パッケージ、電子デバイスおよびこれらの製造方法 |
EP3639817B1 (en) | 2017-06-16 | 2024-10-09 | Korpharm Co., Ltd. | Compositions containing pterosin compound and derivatives thereof active ingredients for prevention or treatment of degenerative brain diseases |
EP4040475A4 (en) * | 2019-09-30 | 2023-11-08 | Kyocera Corporation | COVER BODY, ELECTRONIC COMPONENT HOUSING AND ELECTRONIC DEVICE |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63104721A (ja) * | 1986-10-21 | 1988-05-10 | Watanabe Tekko Kk | フ−プ上面無接触緊張装置 |
JPH0496256A (ja) * | 1990-08-03 | 1992-03-27 | Mitsubishi Materials Corp | 金属製ハーメチックシール蓋 |
JPH05275603A (ja) * | 1992-03-26 | 1993-10-22 | Nec Corp | リードフレーム用金属板 |
JP2004186995A (ja) * | 2002-12-03 | 2004-07-02 | Citizen Watch Co Ltd | 電子デバイス用パッケージの製造方法 |
WO2014073665A1 (ja) * | 2012-11-12 | 2014-05-15 | 株式会社Neomaxマテリアル | 気密封止用蓋材および電子部品収納用パッケージ |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3010076A1 (de) | 1980-03-15 | 1981-09-24 | W.C. Heraeus Gmbh, 6450 Hanau | Halbzeug fuer die herstellung von metalldeckeln zum verschliessen von gehaeusen aus keramischem werkstoff |
JPS61223199A (ja) | 1986-02-28 | 1986-10-03 | Electroplating Eng Of Japan Co | リードフレームのメツキ処理装置 |
US6390353B1 (en) * | 1998-01-06 | 2002-05-21 | Williams Advanced Materials, Inc. | Integral solder and plated sealing cover and method of making the same |
JPH11240653A (ja) | 1998-02-25 | 1999-09-07 | Dainippon Printing Co Ltd | スリット基材の巻取装置 |
JP3448865B2 (ja) | 1998-12-17 | 2003-09-22 | 株式会社大真空 | 電子部品用パッケージおよび圧電振動デバイス |
JP2000236228A (ja) | 1999-02-12 | 2000-08-29 | Daishinku Corp | 圧電振動子の気密封止構造 |
KR100442830B1 (ko) * | 2001-12-04 | 2004-08-02 | 삼성전자주식회사 | 저온의 산화방지 허메틱 실링 방법 |
JP2004055580A (ja) * | 2002-07-16 | 2004-02-19 | Matsushita Electric Ind Co Ltd | 電子部品パッケージ封止用蓋体 |
WO2004070836A1 (ja) * | 2003-02-06 | 2004-08-19 | Neomax Co., Ltd. | 気密封止用キャップおよびその製造方法 |
JP3734481B2 (ja) | 2003-05-08 | 2006-01-11 | 日東電工株式会社 | Tab用テープキャリアの製造方法 |
JP3991274B2 (ja) | 2003-05-19 | 2007-10-17 | セイコーエプソン株式会社 | 圧電デバイス |
US20040232535A1 (en) * | 2003-05-22 | 2004-11-25 | Terry Tarn | Microelectromechanical device packages with integral heaters |
JP4026573B2 (ja) | 2003-09-24 | 2007-12-26 | 株式会社デンソー | 電子装置を収納するパッケージの製造方法 |
KR101133339B1 (ko) * | 2004-11-05 | 2012-04-06 | 가부시키가이샤 네오맥스 마테리아르 | 기밀 밀봉용 캡, 기밀 밀봉용 캡의 제조 방법 및 전자 부품수납용 패키지 |
JP2006165284A (ja) * | 2004-12-08 | 2006-06-22 | Ngk Spark Plug Co Ltd | 電子部品用パッケージ、および電子部品用パッケージ集合体、ならびに当該集合体の製造方法 |
JP4630338B2 (ja) * | 2006-02-15 | 2011-02-09 | 株式会社Neomaxマテリアル | 気密封止用キャップ、電子部品収納用パッケージおよび気密封止用キャップの製造方法 |
DE102008007346A1 (de) * | 2008-02-04 | 2009-08-06 | Robert Bosch Gmbh | Metallisches Gehäuseteil und Verfahren zur Herstellung des Gehäuseteiles |
DE112009001079B4 (de) * | 2008-05-02 | 2020-02-06 | Hitachi Metals, Ltd. | Hermetisch abdichtende Kappe |
US10014189B2 (en) * | 2015-06-02 | 2018-07-03 | Ngk Spark Plug Co., Ltd. | Ceramic package with brazing material near seal member |
-
2014
- 2014-12-11 JP JP2014250728A patent/JP6387818B2/ja active Active
-
2015
- 2015-11-17 CN CN201580066756.9A patent/CN107005211B/zh active Active
- 2015-11-17 EP EP15866889.7A patent/EP3232568A4/en not_active Ceased
- 2015-11-17 KR KR1020177012480A patent/KR101947296B1/ko active IP Right Grant
- 2015-11-17 WO PCT/JP2015/082189 patent/WO2016093021A1/ja active Application Filing
- 2015-11-17 US US15/527,779 patent/US10461001B2/en active Active
- 2015-12-10 TW TW104141510A patent/TWI612770B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63104721A (ja) * | 1986-10-21 | 1988-05-10 | Watanabe Tekko Kk | フ−プ上面無接触緊張装置 |
JPH0496256A (ja) * | 1990-08-03 | 1992-03-27 | Mitsubishi Materials Corp | 金属製ハーメチックシール蓋 |
JPH05275603A (ja) * | 1992-03-26 | 1993-10-22 | Nec Corp | リードフレーム用金属板 |
JP2004186995A (ja) * | 2002-12-03 | 2004-07-02 | Citizen Watch Co Ltd | 電子デバイス用パッケージの製造方法 |
WO2014073665A1 (ja) * | 2012-11-12 | 2014-05-15 | 株式会社Neomaxマテリアル | 気密封止用蓋材および電子部品収納用パッケージ |
Also Published As
Publication number | Publication date |
---|---|
EP3232568A1 (en) | 2017-10-18 |
CN107005211B (zh) | 2020-08-21 |
US20170330811A1 (en) | 2017-11-16 |
EP3232568A4 (en) | 2018-08-08 |
KR20170076701A (ko) | 2017-07-04 |
TW201630341A (zh) | 2016-08-16 |
US10461001B2 (en) | 2019-10-29 |
WO2016093021A1 (ja) | 2016-06-16 |
KR101947296B1 (ko) | 2019-02-12 |
TWI612770B (zh) | 2018-01-21 |
CN107005211A (zh) | 2017-08-01 |
JP6387818B2 (ja) | 2018-09-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6387818B2 (ja) | 気密封止用蓋材の製造方法 | |
JP6263574B2 (ja) | ブレージングシート及びその製造方法並びにアルミニウム構造体のろう付方法 | |
JP5632563B2 (ja) | 気密封止用蓋材および電子部品収納用パッケージ | |
JP5705687B2 (ja) | 異種金属接合体およびそれを用いた組電池 | |
CN105552295A (zh) | 电池用端子、电池用端子的制造方法和电池 | |
JP5948385B2 (ja) | 点火プラグ用電極を製造するためのクラッド構造を有するテープ材 | |
TWI555046B (zh) | Electronic Parts | |
KR100703829B1 (ko) | 전자부품용 패키지, 그 덮개체용 덮개재 및 그 덮개재의 제조방법 | |
KR102001288B1 (ko) | 전지용 리드재 및 전지용 리드재의 제조 방법 | |
US10862096B2 (en) | Lead material for negative electrode and method for manufacturing lead material for negative electrode | |
CN211840836U (zh) | 一种抗盐雾腐蚀的平行缝焊合金盖板 | |
JP6221690B2 (ja) | ろう材付き基材およびろう材付き基材の製造方法 | |
US5639014A (en) | Integral solder and plated sealing cover and method of making same | |
JP2012035296A (ja) | 溶接方法 | |
JP2018125998A (ja) | 積層鉄心の製造方法 | |
JP2008010895A (ja) | 低い抵抗値を有するチップ抵抗器の製造方法 | |
TWI608572B (zh) | Hermetically sealed cover material and electronic component storage package | |
CN110977362A (zh) | 一种抗盐雾腐蚀的平行缝焊合金盖板及其制备方法 | |
JP2016006820A (ja) | 封止部材、および電子部品用パッケージの製造方法 | |
JP2007250787A (ja) | コイル部品 | |
JP6419657B2 (ja) | 電子部品用パッケージの蓋用素材とその製造方法 | |
TW201608647A (zh) | 氣密密封用蓋材及電子零件收納用包裝 | |
JP2004250758A (ja) | ろう材付き電子部品。 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160726 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20160803 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170523 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170707 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180123 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180312 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180717 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180730 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6387818 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |