JP2015524024A5 - - Google Patents
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- Publication number
- JP2015524024A5 JP2015524024A5 JP2015515485A JP2015515485A JP2015524024A5 JP 2015524024 A5 JP2015524024 A5 JP 2015524024A5 JP 2015515485 A JP2015515485 A JP 2015515485A JP 2015515485 A JP2015515485 A JP 2015515485A JP 2015524024 A5 JP2015524024 A5 JP 2015524024A5
- Authority
- JP
- Japan
- Prior art keywords
- plating bath
- electroless plating
- aqueous
- nickel
- aqueous electroless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007772 electroless plating Methods 0.000 claims 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 8
- 238000007747 plating Methods 0.000 claims 6
- 239000003638 chemical reducing agent Substances 0.000 claims 5
- 229910052739 hydrogen Inorganic materials 0.000 claims 4
- 239000001257 hydrogen Substances 0.000 claims 4
- 229910052759 nickel Inorganic materials 0.000 claims 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims 3
- 229910000990 Ni alloy Inorganic materials 0.000 claims 3
- 239000008139 complexing agent Substances 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 150000002431 hydrogen Chemical class 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 2
- 229910002065 alloy metal Inorganic materials 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 229910001453 nickel ion Inorganic materials 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 239000003381 stabilizer Substances 0.000 claims 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052787 antimony Inorganic materials 0.000 claims 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 1
- 229910000085 borane Inorganic materials 0.000 claims 1
- -1 borohydride Chemical compound 0.000 claims 1
- 229910052793 cadmium Inorganic materials 0.000 claims 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 239000010955 niobium Substances 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- 229910052762 osmium Inorganic materials 0.000 claims 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 239000010948 rhodium Substances 0.000 claims 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000011734 sodium Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052716 thallium Inorganic materials 0.000 claims 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20120170693 EP2671969A1 (en) | 2012-06-04 | 2012-06-04 | Plating bath for electroless deposition of nickel layers |
| EP12170693.1 | 2012-06-04 | ||
| PCT/EP2013/061280 WO2013182489A2 (en) | 2012-06-04 | 2013-05-31 | Plating bath for electroless deposition of nickel layers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015524024A JP2015524024A (ja) | 2015-08-20 |
| JP2015524024A5 true JP2015524024A5 (enExample) | 2016-06-30 |
| JP6161691B2 JP6161691B2 (ja) | 2017-07-12 |
Family
ID=48626419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015515485A Active JP6161691B2 (ja) | 2012-06-04 | 2013-05-31 | ニッケル層の無電解堆積用のめっき浴 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US9175399B2 (enExample) |
| EP (2) | EP2671969A1 (enExample) |
| JP (1) | JP6161691B2 (enExample) |
| KR (1) | KR101930585B1 (enExample) |
| CN (1) | CN104321463B (enExample) |
| BR (1) | BR112014028715B1 (enExample) |
| CA (1) | CA2875317C (enExample) |
| ES (1) | ES2688547T3 (enExample) |
| MY (1) | MY168645A (enExample) |
| TW (1) | TWI560316B (enExample) |
| WO (1) | WO2013182489A2 (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103952687B (zh) * | 2014-05-05 | 2017-02-15 | 广东东硕科技有限公司 | 印制线路板化学镀镍的防止渗镀方法 |
| US11685999B2 (en) * | 2014-06-02 | 2023-06-27 | Macdermid Acumen, Inc. | Aqueous electroless nickel plating bath and method of using the same |
| US9708693B2 (en) | 2014-06-03 | 2017-07-18 | Macdermid Acumen, Inc. | High phosphorus electroless nickel |
| JP6352079B2 (ja) * | 2014-07-03 | 2018-07-04 | 奥野製薬工業株式会社 | 無電解めっき液、めっき皮膜、めっき品及びめっき皮膜の形成方法 |
| EP3026143A1 (en) * | 2014-11-26 | 2016-06-01 | ATOTECH Deutschland GmbH | Plating bath and method for electroless deposition of nickel layers |
| ES2639300T3 (es) | 2014-12-16 | 2017-10-26 | Atotech Deutschland Gmbh | Composiciones de baño de chapado para el chapado no electrolítico de metales y aleaciones metálicas |
| KR102513653B1 (ko) | 2015-03-20 | 2023-03-23 | 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 | 실리콘 기판의 활성화 방법 |
| CN113215626A (zh) * | 2015-06-30 | 2021-08-06 | 麦德美乐思公司 | 微电子电路中的互连部的钴填充 |
| TWI707061B (zh) * | 2015-11-27 | 2020-10-11 | 德商德國艾托特克公司 | 鈀之電鍍浴組合物及無電電鍍方法 |
| CN105624656B (zh) * | 2015-12-30 | 2018-05-01 | 大连大学 | 一种化学镀Ni-P/Ni-Mo-P-PTFE复合结构镀层及其制备方法 |
| EP3190208B1 (en) | 2016-01-06 | 2018-09-12 | ATOTECH Deutschland GmbH | Electroless nickel plating baths comprising aminonitriles and a method for deposition of nickel and nickel alloys |
| TWI713737B (zh) | 2016-05-04 | 2020-12-21 | 德商德國艾托特克公司 | 沉積金屬或金屬合金至基板表面及包含基板表面活化之方法 |
| US10577692B2 (en) * | 2017-01-05 | 2020-03-03 | International Business Machines Corporation | Pretreatment of iron-based substrates for electroless plating |
| CN107313034A (zh) * | 2017-06-27 | 2017-11-03 | 佛山科学技术学院 | 一种高磷化学镀镍钴锰磷合金溶液及其制备方法 |
| CN107475699A (zh) * | 2017-08-28 | 2017-12-15 | 中石化炼化工程（集团）股份有限公司 | 气液分配器的防腐涂层、制备方法及其应用 |
| EP3456870A1 (en) * | 2017-09-13 | 2019-03-20 | ATOTECH Deutschland GmbH | A bath and method for filling a vertical interconnect access or trench of a work piece with nickel or a nickel alloy |
| KR102036329B1 (ko) * | 2017-09-20 | 2019-10-25 | 한국기계연구원 | 무전해 도금액, 무전해 도금 방법 및 이를 이용하여 형성된 도금층 |
| KR102036334B1 (ko) * | 2017-09-20 | 2019-10-25 | 한국기계연구원 | 무전해 도금액 및 무전해 도금 방법 |
| KR101932963B1 (ko) * | 2018-02-20 | 2018-12-27 | 한국기계연구원 | 촉매-프리 무전해도금용 조성물 및 이를 이용한 무전해도금 방법 |
| CA3092257C (en) * | 2018-02-26 | 2023-01-24 | Graphene Leaders Canada (Glc) Inc. | Electroless plating of objects with carbon-based material |
| CN108607586B (zh) * | 2018-04-28 | 2021-02-05 | 重庆长安汽车股份有限公司 | 一种镍磷化物、其制备方法及电解水制氢的方法 |
| JP7375009B2 (ja) * | 2018-11-06 | 2023-11-07 | アトテック ドイチュラント ゲー・エム・ベー・ハー ウント コー． カー・ゲー | 無電解ニッケルめっき溶液 |
| KR102250500B1 (ko) * | 2019-03-18 | 2021-05-12 | (주)엠에스씨 | 자동차 lds 전장 부품용 무전해 중성-중온 니켈도금액 |
| CN110079794A (zh) * | 2019-05-08 | 2019-08-02 | 深圳市长裕环保有限公司 | 一种纳米易焊高硬耐磨防腐装饰合金催化液及其制备方法 |
| DE102019112883B4 (de) * | 2019-05-16 | 2024-05-16 | Pac Tech - Packaging Technologies Gmbh | Beschichtungsbad zur stromlosen Beschichtung eines Substrats |
| CN115867695A (zh) * | 2020-05-08 | 2023-03-28 | 朗姆研究公司 | 电镀钴、镍及其合金 |
| LT6899B (lt) * | 2020-08-27 | 2022-04-11 | Valstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras | Vario paviršiaus cheminio nikeliavimo būdas, nenaudojant aktyvavimo paladžiu |
| US11505867B1 (en) | 2021-06-14 | 2022-11-22 | Consolidated Nuclear Security, LLC | Methods and systems for electroless plating a first metal onto a second metal in a molten salt bath, and surface pretreatments therefore |
| US20230103643A1 (en) * | 2021-10-04 | 2023-04-06 | Applied Materials, Inc. | ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR THE PROCESS CHAMBER COMPONENTS |
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| US2658841A (en) | 1950-11-08 | 1953-11-10 | Gen Am Transport | Process of chemical nickel plating and bath therefor |
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| CN102272356A (zh) * | 2008-11-07 | 2011-12-07 | 克斯塔里克公司 | 电沉积液、系统及方法 |
| EP2639335B1 (en) * | 2012-03-14 | 2015-09-16 | Atotech Deutschland GmbH | Alkaline plating bath for electroless deposition of cobalt alloys |
-
2012
- 2012-06-04 EP EP20120170693 patent/EP2671969A1/en not_active Withdrawn
-
2013
- 2013-05-31 ES ES13728988.0T patent/ES2688547T3/es active Active
- 2013-05-31 WO PCT/EP2013/061280 patent/WO2013182489A2/en not_active Ceased
- 2013-05-31 KR KR1020147033024A patent/KR101930585B1/ko active Active
- 2013-05-31 JP JP2015515485A patent/JP6161691B2/ja active Active
- 2013-05-31 CA CA2875317A patent/CA2875317C/en active Active
- 2013-05-31 US US14/398,195 patent/US9175399B2/en active Active
- 2013-05-31 CN CN201380026312.3A patent/CN104321463B/zh active Active
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