JP2015515142A5 - - Google Patents

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Publication number
JP2015515142A5
JP2015515142A5 JP2015506176A JP2015506176A JP2015515142A5 JP 2015515142 A5 JP2015515142 A5 JP 2015515142A5 JP 2015506176 A JP2015506176 A JP 2015506176A JP 2015506176 A JP2015506176 A JP 2015506176A JP 2015515142 A5 JP2015515142 A5 JP 2015515142A5
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JP
Japan
Prior art keywords
polarization
optical
optical system
influencing
birefringence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015506176A
Other languages
English (en)
Japanese (ja)
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JP2015515142A (ja
Filing date
Publication date
Priority claimed from DE102012206287A external-priority patent/DE102012206287A1/de
Application filed filed Critical
Publication of JP2015515142A publication Critical patent/JP2015515142A/ja
Publication of JP2015515142A5 publication Critical patent/JP2015515142A5/ja
Pending legal-status Critical Current

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JP2015506176A 2012-04-17 2013-04-08 特にマイクロリソグラフィ投影露光装置の光学系 Pending JP2015515142A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261625171P 2012-04-17 2012-04-17
DE102012206287A DE102012206287A1 (de) 2012-04-17 2012-04-17 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US61/625,171 2012-04-17
DE102012206287.4 2012-04-17
PCT/EP2013/057329 WO2013156335A1 (en) 2012-04-17 2013-04-08 Optical system, in particular of a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
JP2015515142A JP2015515142A (ja) 2015-05-21
JP2015515142A5 true JP2015515142A5 (enExample) 2016-06-02

Family

ID=49232264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015506176A Pending JP2015515142A (ja) 2012-04-17 2013-04-08 特にマイクロリソグラフィ投影露光装置の光学系

Country Status (4)

Country Link
US (1) US9588433B2 (enExample)
JP (1) JP2015515142A (enExample)
DE (1) DE102012206287A1 (enExample)
WO (1) WO2013156335A1 (enExample)

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1464992A1 (en) * 2001-12-10 2004-10-06 Nikon Corporation Fluoride crystal material for optical device used for photolithographic apparatus and its manufacturing method
EP1483616A1 (en) 2002-03-14 2004-12-08 Carl Zeiss SMT AG Optical system with birefringent optical elements
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
DE10344010A1 (de) 2003-09-15 2005-04-07 Carl Zeiss Smt Ag Wabenkondensor und Beleuchtungssystem damit
EP1668420B1 (en) 2003-09-26 2008-05-21 Carl Zeiss SMT AG Exposure method as well as projection exposure system for carrying out the method
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
CN101793993B (zh) 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
EP1621930A3 (en) 2004-07-29 2011-07-06 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
CA2521203C (en) 2004-09-27 2012-03-13 Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Industry Through The Communications Research Centre Canada An optical fiber/waveguide polarizer and a method of fabrication
US20070115551A1 (en) * 2005-04-01 2007-05-24 Alexis Spilman Space-variant waveplate for polarization conversion, methods and applications
JP4734364B2 (ja) * 2008-03-18 2011-07-27 株式会社東芝 偏光制御装置及び偏光制御方法
DE102009055184B4 (de) 2009-12-22 2011-11-10 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012200371A1 (de) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
JP6315343B2 (ja) 2012-02-21 2018-04-25 カール ツァイス エスエムエス リミテッド 光学系の少なくとも１つの欠陥を補償する方法
DE102012205045A1 (de) 2012-03-29 2013-10-02 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
WO2013143594A1 (en) * 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
DE102012206159A1 (de) 2012-04-16 2013-06-20 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung

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