DE102012206287A1 - Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage - Google Patents
Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage Download PDFInfo
- Publication number
- DE102012206287A1 DE102012206287A1 DE102012206287A DE102012206287A DE102012206287A1 DE 102012206287 A1 DE102012206287 A1 DE 102012206287A1 DE 102012206287 A DE102012206287 A DE 102012206287A DE 102012206287 A DE102012206287 A DE 102012206287A DE 102012206287 A1 DE102012206287 A1 DE 102012206287A1
- Authority
- DE
- Germany
- Prior art keywords
- polarization
- optical system
- influencing
- optical
- birefringence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 180
- 230000010287 polarization Effects 0.000 claims description 76
- 238000009826 distribution Methods 0.000 claims description 66
- 230000005855 radiation Effects 0.000 claims description 20
- 230000007547 defect Effects 0.000 claims description 19
- 238000005286 illumination Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 8
- 230000005684 electric field Effects 0.000 description 5
- 210000001747 pupil Anatomy 0.000 description 5
- 239000013598 vector Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000000711 polarimetry Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012206287A DE102012206287A1 (de) | 2012-04-17 | 2012-04-17 | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
| PCT/EP2013/057329 WO2013156335A1 (en) | 2012-04-17 | 2013-04-08 | Optical system, in particular of a microlithographic projection exposure apparatus |
| JP2015506176A JP2015515142A (ja) | 2012-04-17 | 2013-04-08 | 特にマイクロリソグラフィ投影露光装置の光学系 |
| US14/501,770 US9588433B2 (en) | 2012-04-17 | 2014-09-30 | Optical system, in particular of a microlithographic projection exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012206287A DE102012206287A1 (de) | 2012-04-17 | 2012-04-17 | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012206287A1 true DE102012206287A1 (de) | 2013-10-17 |
Family
ID=49232264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012206287A Withdrawn DE102012206287A1 (de) | 2012-04-17 | 2012-04-17 | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9588433B2 (enExample) |
| JP (1) | JP2015515142A (enExample) |
| DE (1) | DE102012206287A1 (enExample) |
| WO (1) | WO2013156335A1 (enExample) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003077011A1 (en) | 2002-03-14 | 2003-09-18 | Carl Zeiss Smt Ag | Optical system with birefringent optical elements |
| WO2005026843A2 (en) | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| WO2005069081A2 (en) | 2004-01-16 | 2005-07-28 | Carl Zeiss Smt Ag | Polarization-modulating optical element |
| US20060055909A1 (en) | 2004-07-29 | 2006-03-16 | Carl Zeiss Smt Ag | Illumination system for a microlithographic projection exposure apparatus |
| US20070115551A1 (en) * | 2005-04-01 | 2007-05-24 | Alexis Spilman | Space-variant waveplate for polarization conversion, methods and applications |
| US20090237909A1 (en) * | 2008-03-18 | 2009-09-24 | Advanced Mask Inspection Technology, Inc. | Light polarization control using serial combination of surface-segmented half wavelength plates |
| DE102009055184B4 (de) | 2009-12-22 | 2011-11-10 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2003054590A1 (ja) | 2001-12-10 | 2005-04-28 | 株式会社ニコン | 光リソグラフィー装置に用いられる光学素子用のフッ化物結晶材料及びその製造方法 |
| US6958864B2 (en) | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| DE10344010A1 (de) | 2003-09-15 | 2005-04-07 | Carl Zeiss Smt Ag | Wabenkondensor und Beleuchtungssystem damit |
| ATE396428T1 (de) | 2003-09-26 | 2008-06-15 | Zeiss Carl Smt Ag | Belichtungsverfahren sowie projektions- belichtungssystem zur ausführung des verfahrens |
| US7408616B2 (en) * | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
| CA2521203C (en) | 2004-09-27 | 2012-03-13 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Industry Through The Communications Research Centre Canada | An optical fiber/waveguide polarizer and a method of fabrication |
| DE102012200371A1 (de) | 2012-01-12 | 2013-07-18 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren |
| JP6315343B2 (ja) | 2012-02-21 | 2018-04-25 | カール ツァイス エスエムエス リミテッド | 光学系の少なくとも１つの欠陥を補償する方法 |
| DE102012205045A1 (de) | 2012-03-29 | 2013-10-02 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
| JP6049043B2 (ja) | 2012-03-29 | 2016-12-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光系のチャネルの欠陥を補償するための装置及び方法 |
| DE102012206159A1 (de) | 2012-04-16 | 2013-06-20 | Carl Zeiss Smt Gmbh | Polarisationsbeeinflussende optische Anordnung |
-
2012
- 2012-04-17 DE DE102012206287A patent/DE102012206287A1/de not_active Withdrawn
-
2013
- 2013-04-08 JP JP2015506176A patent/JP2015515142A/ja active Pending
- 2013-04-08 WO PCT/EP2013/057329 patent/WO2013156335A1/en not_active Ceased
-
2014
- 2014-09-30 US US14/501,770 patent/US9588433B2/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003077011A1 (en) | 2002-03-14 | 2003-09-18 | Carl Zeiss Smt Ag | Optical system with birefringent optical elements |
| WO2005026843A2 (en) | 2003-09-12 | 2005-03-24 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| WO2005069081A2 (en) | 2004-01-16 | 2005-07-28 | Carl Zeiss Smt Ag | Polarization-modulating optical element |
| US20060055909A1 (en) | 2004-07-29 | 2006-03-16 | Carl Zeiss Smt Ag | Illumination system for a microlithographic projection exposure apparatus |
| US20070115551A1 (en) * | 2005-04-01 | 2007-05-24 | Alexis Spilman | Space-variant waveplate for polarization conversion, methods and applications |
| US20090237909A1 (en) * | 2008-03-18 | 2009-09-24 | Advanced Mask Inspection Technology, Inc. | Light polarization control using serial combination of surface-segmented half wavelength plates |
| DE102009055184B4 (de) | 2009-12-22 | 2011-11-10 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage |
Non-Patent Citations (4)
| Title |
|---|
| Beresna, M. et al.: "Radially polarized optical vortex converter created by femtosecond laser nanostructuring of glass", Applied Physics Letters Vol.98, S.201101-1 bis S.201101-3 (2011) * |
| Beresna, M. et al.: „Radially polarized optical vortex converter created by femtosecond laser nanostructuring of glass", Applied Physics Letters Vol.98, S.201101-1 bis S.201101-3 (2011) |
| Sudrie, L. et al.: "Study of damage in fused silica induced by ultra-short IR laser pulses", Optics Communications Vol.191, S.333-S.339 (2001) * |
| Sudrie, L. et al.: „Study of damage in fused silica induced by ultra-short IR laser pulses", Optics Communications Vol.191, S.333-S.339 (2001) |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2013156335A1 (en) | 2013-10-24 |
| US20150062551A1 (en) | 2015-03-05 |
| US9588433B2 (en) | 2017-03-07 |
| JP2015515142A (ja) | 2015-05-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R120 | Application withdrawn or ip right abandoned |