JP2015515142A - 特にマイクロリソグラフィ投影露光装置の光学系 - Google Patents

特にマイクロリソグラフィ投影露光装置の光学系 Download PDF

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Publication number
JP2015515142A
JP2015515142A JP2015506176A JP2015506176A JP2015515142A JP 2015515142 A JP2015515142 A JP 2015515142A JP 2015506176 A JP2015506176 A JP 2015506176A JP 2015506176 A JP2015506176 A JP 2015506176A JP 2015515142 A JP2015515142 A JP 2015515142A
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JP
Japan
Prior art keywords
polarization
optical
optical system
influencing
birefringence
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JP2015506176A
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English (en)
Japanese (ja)
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JP2015515142A5 (enExample
Inventor
インゴ ゼンガー
インゴ ゼンガー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2015515142A publication Critical patent/JP2015515142A/ja
Publication of JP2015515142A5 publication Critical patent/JP2015515142A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2015506176A 2012-04-17 2013-04-08 特にマイクロリソグラフィ投影露光装置の光学系 Pending JP2015515142A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261625171P 2012-04-17 2012-04-17
DE102012206287A DE102012206287A1 (de) 2012-04-17 2012-04-17 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
US61/625,171 2012-04-17
DE102012206287.4 2012-04-17
PCT/EP2013/057329 WO2013156335A1 (en) 2012-04-17 2013-04-08 Optical system, in particular of a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
JP2015515142A true JP2015515142A (ja) 2015-05-21
JP2015515142A5 JP2015515142A5 (enExample) 2016-06-02

Family

ID=49232264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015506176A Pending JP2015515142A (ja) 2012-04-17 2013-04-08 特にマイクロリソグラフィ投影露光装置の光学系

Country Status (4)

Country Link
US (1) US9588433B2 (enExample)
JP (1) JP2015515142A (enExample)
DE (1) DE102012206287A1 (enExample)
WO (1) WO2013156335A1 (enExample)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003054590A1 (en) * 2001-12-10 2003-07-03 Nikon Corporation Fluoride crystal material for optical device used for photolithographic apparatus and its manufacturing method
WO2004019077A2 (en) * 2002-08-22 2004-03-04 Optical Research Associates Structures and methods for reducing retardance
WO2005026822A2 (en) * 2003-09-15 2005-03-24 Carl Zeiss Smt Ag Fly's eye condenser and illumination system therewith
US20060067618A1 (en) * 2004-09-27 2006-03-30 Hill Kenneth O Optical fiber/waveguide polarizer and method of fabrication
JP2007515768A (ja) * 2003-09-26 2007-06-14 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ照明方法及びその方法を実行するための投影照明系
WO2013104477A1 (en) * 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
WO2013123973A1 (en) * 2012-02-21 2013-08-29 Carl Zeiss Sms Ltd. Method and apparatus for compensating at least one defect of an optical system
WO2013143594A1 (en) * 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1483616A1 (en) 2002-03-14 2004-12-08 Carl Zeiss SMT AG Optical system with birefringent optical elements
JP4717813B2 (ja) 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
CN101793993B (zh) 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
EP1621930A3 (en) 2004-07-29 2011-07-06 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
US20070115551A1 (en) * 2005-04-01 2007-05-24 Alexis Spilman Space-variant waveplate for polarization conversion, methods and applications
JP4734364B2 (ja) * 2008-03-18 2011-07-27 株式会社東芝 偏光制御装置及び偏光制御方法
DE102009055184B4 (de) 2009-12-22 2011-11-10 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012205045A1 (de) 2012-03-29 2013-10-02 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206159A1 (de) 2012-04-16 2013-06-20 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003054590A1 (en) * 2001-12-10 2003-07-03 Nikon Corporation Fluoride crystal material for optical device used for photolithographic apparatus and its manufacturing method
WO2004019077A2 (en) * 2002-08-22 2004-03-04 Optical Research Associates Structures and methods for reducing retardance
WO2005026822A2 (en) * 2003-09-15 2005-03-24 Carl Zeiss Smt Ag Fly's eye condenser and illumination system therewith
JP2007515768A (ja) * 2003-09-26 2007-06-14 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ照明方法及びその方法を実行するための投影照明系
US20060067618A1 (en) * 2004-09-27 2006-03-30 Hill Kenneth O Optical fiber/waveguide polarizer and method of fabrication
WO2013104477A1 (en) * 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
WO2013123973A1 (en) * 2012-02-21 2013-08-29 Carl Zeiss Sms Ltd. Method and apparatus for compensating at least one defect of an optical system
WO2013143594A1 (en) * 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system

Also Published As

Publication number Publication date
US9588433B2 (en) 2017-03-07
WO2013156335A1 (en) 2013-10-24
US20150062551A1 (en) 2015-03-05
DE102012206287A1 (de) 2013-10-17

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