JP2007156485A5 - - Google Patents
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- Publication number
- JP2007156485A5 JP2007156485A5 JP2006327397A JP2006327397A JP2007156485A5 JP 2007156485 A5 JP2007156485 A5 JP 2007156485A5 JP 2006327397 A JP2006327397 A JP 2006327397A JP 2006327397 A JP2006327397 A JP 2006327397A JP 2007156485 A5 JP2007156485 A5 JP 2007156485A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical system
- optical
- interference layer
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 38
- 239000000463 material Substances 0.000 claims 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000010287 polarization Effects 0.000 claims 2
- 229910016569 AlF 3 Inorganic materials 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 239000006117 anti-reflective coating Substances 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000001393 microlithography Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74160505P | 2005-12-02 | 2005-12-02 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007156485A JP2007156485A (ja) | 2007-06-21 |
| JP2007156485A5 true JP2007156485A5 (enExample) | 2009-05-21 |
| JP4421604B2 JP4421604B2 (ja) | 2010-02-24 |
Family
ID=38240833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006327397A Expired - Fee Related JP4421604B2 (ja) | 2005-12-02 | 2006-12-04 | 光学系、特に、マイクロリソグラフィ投影露光装置の照明装置又は投影対物レンズ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7518797B2 (enExample) |
| JP (1) | JP4421604B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005041938A1 (de) * | 2005-09-03 | 2007-03-08 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| JP5224218B2 (ja) * | 2007-07-23 | 2013-07-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学システム |
| US9556505B2 (en) * | 2012-08-31 | 2017-01-31 | General Electric Company | Thermal barrier coating systems and methods of making and using the same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5932354A (en) | 1996-07-11 | 1999-08-03 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Obliquely deposited film element |
| US6072629A (en) | 1997-02-26 | 2000-06-06 | Reveo, Inc. | Polarizer devices and methods for making the same |
| JP2002189101A (ja) | 2000-12-21 | 2002-07-05 | Nikon Corp | 反射防止膜、光学素子及び露光装置 |
| US7239447B2 (en) | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| DE10210782A1 (de) | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
| JP2003266011A (ja) | 2001-09-17 | 2003-09-24 | Cark Zeiss Smt Ag | 光学部材用の基板の塗布方法および塗布装置 |
| JP2004302113A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
| JP4630574B2 (ja) | 2004-05-31 | 2011-02-09 | キヤノン株式会社 | 光学素子及びミラー並びに反射防止膜 |
| JP4913041B2 (ja) | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102004061464B4 (de) | 2004-12-17 | 2008-12-11 | Schott Ag | Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung |
| US7336416B2 (en) * | 2005-04-27 | 2008-02-26 | Asml Netherlands B.V. | Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
-
2006
- 2006-11-30 US US11/607,024 patent/US7518797B2/en not_active Expired - Fee Related
- 2006-12-04 JP JP2006327397A patent/JP4421604B2/ja not_active Expired - Fee Related
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