JP4421604B2 - 光学系、特に、マイクロリソグラフィ投影露光装置の照明装置又は投影対物レンズ - Google Patents
光学系、特に、マイクロリソグラフィ投影露光装置の照明装置又は投影対物レンズ Download PDFInfo
- Publication number
- JP4421604B2 JP4421604B2 JP2006327397A JP2006327397A JP4421604B2 JP 4421604 B2 JP4421604 B2 JP 4421604B2 JP 2006327397 A JP2006327397 A JP 2006327397A JP 2006327397 A JP2006327397 A JP 2006327397A JP 4421604 B2 JP4421604 B2 JP 4421604B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical system
- optical
- interference layer
- interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 94
- 238000005286 illumination Methods 0.000 title claims description 16
- 238000001393 microlithography Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims description 32
- 238000009826 distribution Methods 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 17
- 230000010287 polarization Effects 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 15
- 238000002834 transmittance Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims 2
- 229910052681 coesite Inorganic materials 0.000 claims 2
- 229910052906 cristobalite Inorganic materials 0.000 claims 2
- 229910052682 stishovite Inorganic materials 0.000 claims 2
- 229910052905 tridymite Inorganic materials 0.000 claims 2
- 101100274801 Caenorhabditis elegans dyf-3 gene Proteins 0.000 claims 1
- 229910016468 DyF3 Inorganic materials 0.000 claims 1
- 229910016495 ErF3 Inorganic materials 0.000 claims 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims 1
- QGJSAGBHFTXOTM-UHFFFAOYSA-K trifluoroerbium Chemical compound F[Er](F)F QGJSAGBHFTXOTM-UHFFFAOYSA-K 0.000 claims 1
- 239000010410 layer Substances 0.000 description 244
- 238000000151 deposition Methods 0.000 description 20
- 230000008021 deposition Effects 0.000 description 19
- 230000005684 electric field Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 238000007740 vapor deposition Methods 0.000 description 10
- 229910017768 LaF 3 Inorganic materials 0.000 description 6
- 239000006117 anti-reflective coating Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000008520 organization Effects 0.000 description 4
- 229910016569 AlF 3 Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74160505P | 2005-12-02 | 2005-12-02 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007156485A JP2007156485A (ja) | 2007-06-21 |
| JP2007156485A5 JP2007156485A5 (enExample) | 2009-05-21 |
| JP4421604B2 true JP4421604B2 (ja) | 2010-02-24 |
Family
ID=38240833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006327397A Expired - Fee Related JP4421604B2 (ja) | 2005-12-02 | 2006-12-04 | 光学系、特に、マイクロリソグラフィ投影露光装置の照明装置又は投影対物レンズ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7518797B2 (enExample) |
| JP (1) | JP4421604B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005041938A1 (de) * | 2005-09-03 | 2007-03-08 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| JP5224218B2 (ja) * | 2007-07-23 | 2013-07-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の光学システム |
| US9556505B2 (en) * | 2012-08-31 | 2017-01-31 | General Electric Company | Thermal barrier coating systems and methods of making and using the same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5932354A (en) | 1996-07-11 | 1999-08-03 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Obliquely deposited film element |
| US6072629A (en) | 1997-02-26 | 2000-06-06 | Reveo, Inc. | Polarizer devices and methods for making the same |
| JP2002189101A (ja) | 2000-12-21 | 2002-07-05 | Nikon Corp | 反射防止膜、光学素子及び露光装置 |
| US7239447B2 (en) | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| DE10210782A1 (de) | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
| JP2003266011A (ja) | 2001-09-17 | 2003-09-24 | Cark Zeiss Smt Ag | 光学部材用の基板の塗布方法および塗布装置 |
| JP2004302113A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
| JP4630574B2 (ja) | 2004-05-31 | 2011-02-09 | キヤノン株式会社 | 光学素子及びミラー並びに反射防止膜 |
| JP4913041B2 (ja) | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102004061464B4 (de) | 2004-12-17 | 2008-12-11 | Schott Ag | Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung |
| US7336416B2 (en) * | 2005-04-27 | 2008-02-26 | Asml Netherlands B.V. | Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
-
2006
- 2006-11-30 US US11/607,024 patent/US7518797B2/en not_active Expired - Fee Related
- 2006-12-04 JP JP2006327397A patent/JP4421604B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007156485A (ja) | 2007-06-21 |
| US7518797B2 (en) | 2009-04-14 |
| US20070128453A1 (en) | 2007-06-07 |
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