JP2009507366A5 - - Google Patents

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Publication number
JP2009507366A5
JP2009507366A5 JP2008528432A JP2008528432A JP2009507366A5 JP 2009507366 A5 JP2009507366 A5 JP 2009507366A5 JP 2008528432 A JP2008528432 A JP 2008528432A JP 2008528432 A JP2008528432 A JP 2008528432A JP 2009507366 A5 JP2009507366 A5 JP 2009507366A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
projection exposure
optical element
layers
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2008528432A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009507366A (ja
Filing date
Publication date
Priority claimed from DE102005041938A external-priority patent/DE102005041938A1/de
Application filed filed Critical
Publication of JP2009507366A publication Critical patent/JP2009507366A/ja
Publication of JP2009507366A5 publication Critical patent/JP2009507366A5/ja
Ceased legal-status Critical Current

Links

JP2008528432A 2005-09-03 2006-09-04 マイクロリソグラフィック投影露光装置 Ceased JP2009507366A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005041938A DE102005041938A1 (de) 2005-09-03 2005-09-03 Mikrolithographische Projektionsbelichtungsanlage
PCT/EP2006/008605 WO2007025783A2 (de) 2005-09-03 2006-09-04 Mikrolithographische projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
JP2009507366A JP2009507366A (ja) 2009-02-19
JP2009507366A5 true JP2009507366A5 (enExample) 2009-10-08

Family

ID=37421186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008528432A Ceased JP2009507366A (ja) 2005-09-03 2006-09-04 マイクロリソグラフィック投影露光装置

Country Status (5)

Country Link
US (4) US20080297754A1 (enExample)
JP (1) JP2009507366A (enExample)
KR (1) KR20080039469A (enExample)
DE (1) DE102005041938A1 (enExample)
WO (1) WO2007025783A2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005041938A1 (de) 2005-09-03 2007-03-08 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
JP2008135127A (ja) * 2006-11-29 2008-06-12 Konica Minolta Opto Inc 光学素子及び光ピックアップ装置
US7929115B2 (en) 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
DE102009037077B3 (de) 2009-08-13 2011-02-17 Carl Zeiss Smt Ag Katadioptrisches Projektionsobjektiv
CN109068044B (zh) * 2018-09-28 2023-11-03 武汉华星光电技术有限公司 光学组件以及显示装置
CN117192908B (zh) * 2023-08-22 2024-04-09 安徽国芯智能装备有限公司 一种直写式光刻机涨缩一致的补偿方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JPH08148411A (ja) * 1994-11-24 1996-06-07 Nikon Corp 投影露光装置
JP3924806B2 (ja) * 1996-06-10 2007-06-06 株式会社ニコン 反射防止膜
EP0952491A3 (en) 1998-04-21 2001-05-09 Asm Lithography B.V. Lithography apparatus
US6404499B1 (en) * 1998-04-21 2002-06-11 Asml Netherlands B.V. Lithography apparatus with filters for optimizing uniformity of an image
US6243203B1 (en) * 1998-04-24 2001-06-05 U.S. Philips Corporation Optical system with anti-reflection coating
EP0994368A3 (en) * 1998-10-13 2000-05-03 Nikon Corporation Anti-reflective films, optical elements and reduction-projection exposure apparatus utilizing same
JP2000357654A (ja) * 1998-10-13 2000-12-26 Nikon Corp 反射防止膜、光学素子、露光装置、及び電子物品
EP1152263A4 (en) * 1999-09-30 2003-08-20 Nikon Corp OPTICAL DEVICE WITH THIN MULTI-LAYER SYSTEM AND THEIR USE FOR ALIGNMENT
EP1227344A4 (en) * 1999-11-05 2005-08-31 Asahi Glass Co Ltd ANTIREFLECTION BASE FOR ULTRAVIOLET AND EXTREME ULTRAVIOLET ZONES
JP2002189101A (ja) * 2000-12-21 2002-07-05 Nikon Corp 反射防止膜、光学素子及び露光装置
JPWO2003003429A1 (ja) * 2001-06-28 2004-10-21 株式会社ニコン 投影光学系、露光装置および方法
DE10144243A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
DE10240598A1 (de) * 2002-08-27 2004-03-25 Carl Zeiss Smt Ag Optisches Abbildungssystem, insbesondere katadioptrisches Reduktionsobjektiv
DE10258715B4 (de) * 2002-12-10 2006-12-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Abbildungssystems
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
DE10329793A1 (de) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage
WO2005069078A1 (en) * 2004-01-19 2005-07-28 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus with immersion projection lens
JP4913041B2 (ja) 2004-06-04 2012-04-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 強度変化の補償を伴う投影系及びそのための補償素子
DE102005041938A1 (de) 2005-09-03 2007-03-08 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7518797B2 (en) * 2005-12-02 2009-04-14 Carl Zeiss Smt Ag Microlithographic exposure apparatus

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