JP2009507366A - マイクロリソグラフィック投影露光装置 - Google Patents

マイクロリソグラフィック投影露光装置 Download PDF

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Publication number
JP2009507366A
JP2009507366A JP2008528432A JP2008528432A JP2009507366A JP 2009507366 A JP2009507366 A JP 2009507366A JP 2008528432 A JP2008528432 A JP 2008528432A JP 2008528432 A JP2008528432 A JP 2008528432A JP 2009507366 A JP2009507366 A JP 2009507366A
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Japan
Prior art keywords
layer
exposure apparatus
projection exposure
optical element
layers
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Ceased
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JP2008528432A
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English (en)
Japanese (ja)
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JP2009507366A5 (enExample
Inventor
カメノフ，ウラディミール
クラーマー，ダニエル
グリュナー，トラルフ
ヴァイセンリーデル，カール−シュテファン
フェルトマン，ヘイコ
ツィルケル，エイキム
パッツィディス，アレキサンドラ
トメ，ブルーノ
シックス，ステファン
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2009507366A publication Critical patent/JP2009507366A/ja
Publication of JP2009507366A5 publication Critical patent/JP2009507366A5/ja
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2008528432A 2005-09-03 2006-09-04 マイクロリソグラフィック投影露光装置 Ceased JP2009507366A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005041938A DE102005041938A1 (de) 2005-09-03 2005-09-03 Mikrolithographische Projektionsbelichtungsanlage
PCT/EP2006/008605 WO2007025783A2 (de) 2005-09-03 2006-09-04 Mikrolithographische projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
JP2009507366A true JP2009507366A (ja) 2009-02-19
JP2009507366A5 JP2009507366A5 (enExample) 2009-10-08

Family

ID=37421186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008528432A Ceased JP2009507366A (ja) 2005-09-03 2006-09-04 マイクロリソグラフィック投影露光装置

Country Status (5)

Country Link
US (4) US20080297754A1 (enExample)
JP (1) JP2009507366A (enExample)
KR (1) KR20080039469A (enExample)
DE (1) DE102005041938A1 (enExample)
WO (1) WO2007025783A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013042155A (ja) * 2009-08-13 2013-02-28 Carl Zeiss Smt Gmbh 反射屈折投影対物系

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005041938A1 (de) 2005-09-03 2007-03-08 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
JP2008135127A (ja) * 2006-11-29 2008-06-12 Konica Minolta Opto Inc 光学素子及び光ピックアップ装置
US7929115B2 (en) 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
CN109068044B (zh) * 2018-09-28 2023-11-03 武汉华星光电技术有限公司 光学组件以及显示装置
CN117192908B (zh) * 2023-08-22 2024-04-09 安徽国芯智能装备有限公司 一种直写式光刻机涨缩一致的补偿方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08148411A (ja) * 1994-11-24 1996-06-07 Nikon Corp 投影露光装置
JP2000058442A (ja) * 1998-04-21 2000-02-25 Asm Lithography Bv リソグラフィック投影装置
JP2000357654A (ja) * 1998-10-13 2000-12-26 Nikon Corp 反射防止膜、光学素子、露光装置、及び電子物品
WO2001023914A1 (fr) * 1999-09-30 2001-04-05 Nikon Corporation Dispositif optique à film mince multicouche et aligneur
JP2002189101A (ja) * 2000-12-21 2002-07-05 Nikon Corp 反射防止膜、光学素子及び露光装置
WO2003003429A1 (en) * 2001-06-28 2003-01-09 Nikon Corporation Projection optical system, exposure system and method
US20030090638A1 (en) * 2001-09-05 2003-05-15 Carl Zeiss Semiconductor Manufacturing Technologies Ag Zoom system for an illumination device
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
US20050018312A1 (en) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projection lens for a microlithographic projection exposure apparatus
WO2005069078A1 (en) * 2004-01-19 2005-07-28 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus with immersion projection lens

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JP3924806B2 (ja) 1996-06-10 2007-06-06 株式会社ニコン 反射防止膜
EP0952491A3 (en) 1998-04-21 2001-05-09 Asm Lithography B.V. Lithography apparatus
US6243203B1 (en) * 1998-04-24 2001-06-05 U.S. Philips Corporation Optical system with anti-reflection coating
EP0994368A3 (en) * 1998-10-13 2000-05-03 Nikon Corporation Anti-reflective films, optical elements and reduction-projection exposure apparatus utilizing same
WO2001035125A1 (en) * 1999-11-05 2001-05-17 Asahi Glass Company, Limited Antireflection base for ultraviolet and vacuum ultraviolet regions
DE10240598A1 (de) * 2002-08-27 2004-03-25 Carl Zeiss Smt Ag Optisches Abbildungssystem, insbesondere katadioptrisches Reduktionsobjektiv
DE10258715B4 (de) * 2002-12-10 2006-12-21 Carl Zeiss Smt Ag Verfahren zur Herstellung eines optischen Abbildungssystems
KR101199076B1 (ko) 2004-06-04 2012-11-07 칼 짜이스 에스엠티 게엠베하 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
DE102005041938A1 (de) 2005-09-03 2007-03-08 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7518797B2 (en) 2005-12-02 2009-04-14 Carl Zeiss Smt Ag Microlithographic exposure apparatus

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08148411A (ja) * 1994-11-24 1996-06-07 Nikon Corp 投影露光装置
JP2000058442A (ja) * 1998-04-21 2000-02-25 Asm Lithography Bv リソグラフィック投影装置
JP2000357654A (ja) * 1998-10-13 2000-12-26 Nikon Corp 反射防止膜、光学素子、露光装置、及び電子物品
WO2001023914A1 (fr) * 1999-09-30 2001-04-05 Nikon Corporation Dispositif optique à film mince multicouche et aligneur
JP2002189101A (ja) * 2000-12-21 2002-07-05 Nikon Corp 反射防止膜、光学素子及び露光装置
WO2003003429A1 (en) * 2001-06-28 2003-01-09 Nikon Corporation Projection optical system, exposure system and method
US20030090638A1 (en) * 2001-09-05 2003-05-15 Carl Zeiss Semiconductor Manufacturing Technologies Ag Zoom system for an illumination device
JP2004302113A (ja) * 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
US20050018312A1 (en) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projection lens for a microlithographic projection exposure apparatus
WO2005069078A1 (en) * 2004-01-19 2005-07-28 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus with immersion projection lens

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013042155A (ja) * 2009-08-13 2013-02-28 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective

Also Published As

Publication number Publication date
WO2007025783A2 (de) 2007-03-08
US20170322343A1 (en) 2017-11-09
US20110222043A1 (en) 2011-09-15
US9733395B2 (en) 2017-08-15
DE102005041938A1 (de) 2007-03-08
US20140320955A1 (en) 2014-10-30
US20080297754A1 (en) 2008-12-04
WO2007025783A3 (de) 2007-05-10
KR20080039469A (ko) 2008-05-07

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