JP2015510489A5 - - Google Patents

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JP2015510489A5
JP2015510489A5 JP2014558853A JP2014558853A JP2015510489A5 JP 2015510489 A5 JP2015510489 A5 JP 2015510489A5 JP 2014558853 A JP2014558853 A JP 2014558853A JP 2014558853 A JP2014558853 A JP 2014558853A JP 2015510489 A5 JP2015510489 A5 JP 2015510489A5
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substrate
cmos compatible
surface treatment
treatment process
carbon source
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JP2015510489A (ja
JP6262156B2 (ja
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Priority claimed from PCT/US2013/027284 external-priority patent/WO2013126671A1/en
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JP2014558853A 2012-02-24 2013-02-22 グラフェン形成のための方法およびシステム Active JP6262156B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201261603104P 2012-02-24 2012-02-24
US61/603,104 2012-02-24
US201261607337P 2012-03-06 2012-03-06
US61/607,337 2012-03-06
US201261677323P 2012-07-30 2012-07-30
US61/677,323 2012-07-30
PCT/US2013/027284 WO2013126671A1 (en) 2012-02-24 2013-02-22 Method and system for graphene formation

Related Child Applications (1)

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JP2017238223A Division JP6562996B2 (ja) 2012-02-24 2017-12-13 銅材料を銅基板から除去する方法

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JP2015510489A JP2015510489A (ja) 2015-04-09
JP2015510489A5 true JP2015510489A5 (enExample) 2016-11-10
JP6262156B2 JP6262156B2 (ja) 2018-01-17

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JP2014558853A Active JP6262156B2 (ja) 2012-02-24 2013-02-22 グラフェン形成のための方法およびシステム
JP2017238223A Active JP6562996B2 (ja) 2012-02-24 2017-12-13 銅材料を銅基板から除去する方法

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US (3) US9150418B2 (enExample)
EP (1) EP2817261B1 (enExample)
JP (2) JP6262156B2 (enExample)
KR (1) KR102107382B1 (enExample)
CN (2) CN106744866B (enExample)
SG (3) SG10201908213VA (enExample)
TW (1) TWI552954B (enExample)
WO (1) WO2013126671A1 (enExample)

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