JP2015121823A5 - - Google Patents
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- Publication number
- JP2015121823A5 JP2015121823A5 JP2015052908A JP2015052908A JP2015121823A5 JP 2015121823 A5 JP2015121823 A5 JP 2015121823A5 JP 2015052908 A JP2015052908 A JP 2015052908A JP 2015052908 A JP2015052908 A JP 2015052908A JP 2015121823 A5 JP2015121823 A5 JP 2015121823A5
- Authority
- JP
- Japan
- Prior art keywords
- absorbing material
- thickness
- radiation absorbing
- projection system
- structures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261587587P | 2012-01-17 | 2012-01-17 | |
| US61/587,587 | 2012-01-17 | ||
| US201261587941P | 2012-01-18 | 2012-01-18 | |
| US61/587,941 | 2012-01-18 | ||
| US201261589027P | 2012-01-20 | 2012-01-20 | |
| US61/589,027 | 2012-01-20 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013003300A Division JP2013148898A (ja) | 2012-01-17 | 2013-01-11 | リソグラフィマスク、リソグラフィ装置及び方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015121823A JP2015121823A (ja) | 2015-07-02 |
| JP2015121823A5 true JP2015121823A5 (enExample) | 2016-01-28 |
| JP6298418B2 JP6298418B2 (ja) | 2018-03-20 |
Family
ID=48754783
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013003300A Pending JP2013148898A (ja) | 2012-01-17 | 2013-01-11 | リソグラフィマスク、リソグラフィ装置及び方法 |
| JP2015052908A Expired - Fee Related JP6298418B2 (ja) | 2012-01-17 | 2015-03-17 | リソグラフィマスク、リソグラフィ装置及び方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013003300A Pending JP2013148898A (ja) | 2012-01-17 | 2013-01-11 | リソグラフィマスク、リソグラフィ装置及び方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8974989B2 (enExample) |
| JP (2) | JP2013148898A (enExample) |
| KR (1) | KR101538995B1 (enExample) |
| CN (1) | CN103207516B (enExample) |
| NL (1) | NL2010025A (enExample) |
| TW (1) | TWI467319B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8793626B2 (en) * | 2012-03-23 | 2014-07-29 | Texas Instruments Incorporated | Computational lithography with feature upsizing |
| CN104570589B (zh) * | 2013-10-12 | 2018-08-07 | 北大方正集团有限公司 | 掩模板及利用掩模板进行光刻和测量步进精度的方法 |
| CN104635418B (zh) * | 2013-11-07 | 2018-01-02 | 北大方正集团有限公司 | 一种掩模版及一种测量光刻机的版旋转偏差的方法 |
| US10437157B2 (en) | 2014-12-09 | 2019-10-08 | Asml Netherlands B.V. | Method and apparatus for image analysis |
| WO2016091536A1 (en) * | 2014-12-09 | 2016-06-16 | Asml Netherlands B.V. | Method and apparatus for image analysis |
| JP2018508048A (ja) * | 2015-03-12 | 2018-03-22 | レイヴ リミテッド ライアビリティ カンパニー | 間接的表面清浄化装置および方法 |
| KR102405701B1 (ko) | 2017-02-25 | 2022-06-07 | 에이에스엠엘 네델란즈 비.브이. | 패턴화 디바이스, 그 제조 방법, 및 패턴화 디바이스 설계 방법 |
| CN110361936B (zh) * | 2018-03-26 | 2021-03-12 | 上海微电子装备（集团）股份有限公司 | 掩模版厚度检测装置、存储机构、传输机构及光刻系统 |
| CN113260926B (zh) | 2019-01-03 | 2025-01-07 | Asml荷兰有限公司 | 用于测量光刻设备的聚焦性能的方法、图案形成装置和设备、以及器件制造方法 |
| CN110442172B (zh) * | 2019-07-24 | 2021-02-19 | 昆明理工大学 | 一种基于嵌入式cps的工业危险品临时存储的实时监控装置 |
| CN113031390B (zh) * | 2021-03-15 | 2024-09-27 | 广东省大湾区集成电路与系统应用研究院 | 激光直写及其仿真的方法、装置 |
| US20230280644A1 (en) * | 2022-03-03 | 2023-09-07 | International Business Machines Corporation | Method of making euv mask with an absorber layer |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07199447A (ja) * | 1993-12-28 | 1995-08-04 | Sony Corp | 単層ハーフトーン方式位相シフトマスク及びその作製方法 |
| JP3178516B2 (ja) * | 1997-11-05 | 2001-06-18 | 日本電気株式会社 | 位相シフトマスク |
| TW512424B (en) | 2000-05-01 | 2002-12-01 | Asml Masktools Bv | Hybrid phase-shift mask |
| US6593041B2 (en) * | 2001-07-31 | 2003-07-15 | Intel Corporation | Damascene extreme ultraviolet lithography (EUVL) photomask and method of making |
| JP2002268201A (ja) * | 2002-03-11 | 2002-09-18 | Dainippon Printing Co Ltd | 位相シフトフォトマスク及び位相シフトフォトマスク用ブランクスの製造方法 |
| US7029802B2 (en) | 2003-06-16 | 2006-04-18 | Taiwan Semiconductor Manufacturing Company | Embedded bi-layer structure for attenuated phase shifting mask |
| US8252487B2 (en) | 2003-12-17 | 2012-08-28 | Asml Netherlands B.V. | Device manufacturing method and mask for use therein |
| JP4588368B2 (ja) * | 2004-06-15 | 2010-12-01 | 富士通セミコンダクター株式会社 | 露光計測方法及び装置、並びに半導体装置の製造方法 |
| EP1804119A1 (en) | 2005-12-27 | 2007-07-04 | Interuniversitair Microelektronica Centrum | Method for manufacturing attenuated phase- shift masks and devices obtained therefrom |
| JP2007271712A (ja) * | 2006-03-30 | 2007-10-18 | Toshiba Corp | フォトマスク、露光装置及びパターン形成方法 |
| JP2009122566A (ja) * | 2007-11-19 | 2009-06-04 | Dainippon Printing Co Ltd | 低反射型フォトマスクブランクスおよびフォトマスク |
| JP2009139632A (ja) * | 2007-12-06 | 2009-06-25 | Elpida Memory Inc | マスクパターン補正方法及び露光用マスク |
| JP5295553B2 (ja) * | 2007-12-07 | 2013-09-18 | 株式会社東芝 | 反射型マスク |
| JP2009259976A (ja) * | 2008-04-15 | 2009-11-05 | Toshiba Corp | 露光方法およびそれを用いた半導体デバイスの製造方法 |
| KR100948770B1 (ko) * | 2008-06-27 | 2010-03-24 | 주식회사 에스앤에스텍 | 블랭크 마스크, 포토마스크 및 이의 제조 방법 |
| CN102171618B (zh) * | 2008-10-06 | 2014-03-19 | Asml荷兰有限公司 | 使用二维目标的光刻聚焦和剂量测量 |
| JP2013003300A (ja) | 2011-06-15 | 2013-01-07 | Mitsubishi Rayon Co Ltd | マイクロレンズシートの製造方法 |
-
2012
- 2012-12-20 NL NL2010025A patent/NL2010025A/en not_active Application Discontinuation
-
2013
- 2013-01-11 JP JP2013003300A patent/JP2013148898A/ja active Pending
- 2013-01-15 CN CN201310013801.7A patent/CN103207516B/zh active Active
- 2013-01-16 US US13/743,231 patent/US8974989B2/en active Active
- 2013-01-16 KR KR1020130004844A patent/KR101538995B1/ko not_active Expired - Fee Related
- 2013-01-17 TW TW102101901A patent/TWI467319B/zh not_active IP Right Cessation
-
2015
- 2015-01-28 US US14/608,011 patent/US9513109B2/en not_active Expired - Fee Related
- 2015-03-17 JP JP2015052908A patent/JP6298418B2/ja not_active Expired - Fee Related