JP2016527501A5 - - Google Patents

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Publication number
JP2016527501A5
JP2016527501A5 JP2016527043A JP2016527043A JP2016527501A5 JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5 JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5
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JP
Japan
Prior art keywords
target
illumination beam
measurement system
scatterometry
illumination
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Application number
JP2016527043A
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English (en)
Japanese (ja)
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JP2016527501A (ja
JP6486917B2 (ja
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Priority claimed from PCT/US2014/046724 external-priority patent/WO2015009739A1/en
Publication of JP2016527501A publication Critical patent/JP2016527501A/ja
Publication of JP2016527501A5 publication Critical patent/JP2016527501A5/ja
Application granted granted Critical
Publication of JP6486917B2 publication Critical patent/JP6486917B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016527043A 2013-07-18 2014-07-15 スキャトロメトリ測定のための照明配置 Active JP6486917B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361847883P 2013-07-18 2013-07-18
US61/847,883 2013-07-18
PCT/US2014/046724 WO2015009739A1 (en) 2013-07-18 2014-07-15 Illumination configurations for scatterometry measurements

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019028295A Division JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Publications (3)

Publication Number Publication Date
JP2016527501A JP2016527501A (ja) 2016-09-08
JP2016527501A5 true JP2016527501A5 (enExample) 2017-08-24
JP6486917B2 JP6486917B2 (ja) 2019-03-20

Family

ID=52346681

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016527043A Active JP6486917B2 (ja) 2013-07-18 2014-07-15 スキャトロメトリ測定のための照明配置
JP2019028295A Active JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2019028295A Active JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Country Status (4)

Country Link
JP (2) JP6486917B2 (enExample)
KR (2) KR102202523B1 (enExample)
TW (1) TWI640761B (enExample)
WO (1) WO2015009739A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105807573B (zh) * 2014-12-31 2017-12-29 上海微电子装备（集团）股份有限公司 用于套刻误差检测的装置和方法
US10732516B2 (en) * 2017-03-01 2020-08-04 Kla Tencor Corporation Process robust overlay metrology based on optical scatterometry
US11112369B2 (en) * 2017-06-19 2021-09-07 Kla-Tencor Corporation Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay
US11112691B2 (en) * 2019-01-16 2021-09-07 Kla Corporation Inspection system with non-circular pupil
EP3876037A1 (en) * 2020-03-06 2021-09-08 ASML Netherlands B.V. Metrology method and device for measuring a periodic structure on a substrate
US20230064193A1 (en) * 2020-01-29 2023-03-02 Asml Netherlands B.V. Metrology method and device for measuring a periodic structure on a substrate
US11346657B2 (en) * 2020-05-22 2022-05-31 Kla Corporation Measurement modes for overlay
CN114253065B (zh) * 2021-12-20 2025-08-01 武汉天马微电子有限公司 掩膜版及其制备方法、显示面板、显示装置和光刻设备

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5859424A (en) * 1997-04-08 1999-01-12 Kla-Tencor Corporation Apodizing filter system useful for reducing spot size in optical measurements and other applications
US6538730B2 (en) * 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7528953B2 (en) * 2005-03-01 2009-05-05 Kla-Tencor Technologies Corp. Target acquisition and overlay metrology based on two diffracted orders imaging
US7589832B2 (en) * 2006-08-10 2009-09-15 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method
US7573584B2 (en) * 2006-09-25 2009-08-11 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
EP2089656B2 (en) * 2006-11-27 2018-05-23 Philips Lighting North America Corporation Methods and apparatus for providing uniform projection lighting
US7618163B2 (en) * 2007-04-02 2009-11-17 Ruud Lighting, Inc. Light-directing LED apparatus
DE102008046362A1 (de) * 2008-09-09 2010-03-18 Diehl Bgt Defence Gmbh & Co. Kg Gegenstandserfassungssystem mit einem Bilderfassungssystem
KR101654599B1 (ko) * 2009-05-11 2016-09-06 에이에스엠엘 네델란즈 비.브이. 오버레이 오차를 결정하는 방법 및 디바이스 제조 방법
JP2012530929A (ja) * 2009-06-22 2012-12-06 エーエスエムエル ネザーランズ ビー．ブイ． オブジェクト検査システムおよび方法
US9223227B2 (en) * 2011-02-11 2015-12-29 Asml Netherlands B.V. Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
DE102011006468B4 (de) * 2011-03-31 2014-08-28 Carl Zeiss Smt Gmbh Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern
NL2008936A (en) 2011-07-28 2013-01-29 Asml Netherlands Bv Illumination source for use in inspection methods and/or lithography inspection and lithographic apparatus and inspection method.
US20130077086A1 (en) * 2011-09-23 2013-03-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser

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