JP2016527501A5 - - Google Patents

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Publication number
JP2016527501A5
JP2016527501A5 JP2016527043A JP2016527043A JP2016527501A5 JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5 JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527043 A JP2016527043 A JP 2016527043A JP 2016527501 A5 JP2016527501 A5 JP 2016527501A5
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JP
Japan
Prior art keywords
target
illumination beam
measurement system
scatterometry
illumination
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JP2016527043A
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English (en)
Japanese (ja)
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JP2016527501A (ja
JP6486917B2 (ja
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Priority claimed from PCT/US2014/046724 external-priority patent/WO2015009739A1/en
Publication of JP2016527501A publication Critical patent/JP2016527501A/ja
Publication of JP2016527501A5 publication Critical patent/JP2016527501A5/ja
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Publication of JP6486917B2 publication Critical patent/JP6486917B2/ja
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JP2016527043A 2013-07-18 2014-07-15 スキャトロメトリ測定のための照明配置 Active JP6486917B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361847883P 2013-07-18 2013-07-18
US61/847,883 2013-07-18
PCT/US2014/046724 WO2015009739A1 (en) 2013-07-18 2014-07-15 Illumination configurations for scatterometry measurements

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019028295A Division JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Publications (3)

Publication Number Publication Date
JP2016527501A JP2016527501A (ja) 2016-09-08
JP2016527501A5 true JP2016527501A5 (enExample) 2017-08-24
JP6486917B2 JP6486917B2 (ja) 2019-03-20

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JP2016527043A Active JP6486917B2 (ja) 2013-07-18 2014-07-15 スキャトロメトリ測定のための照明配置
JP2019028295A Active JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Family Applications After (1)

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JP2019028295A Active JP6745367B2 (ja) 2013-07-18 2019-02-20 スキャトロメトリ測定システム及び方法

Country Status (5)

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US (2) US9719920B2 (enExample)
JP (2) JP6486917B2 (enExample)
KR (2) KR102069253B1 (enExample)
TW (1) TWI640761B (enExample)
WO (1) WO2015009739A1 (enExample)

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KR102128488B1 (ko) 2015-12-09 2020-07-01 에이에스엠엘 홀딩 엔.브이. 플렉시블 일루미네이터
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US10622238B2 (en) 2018-06-07 2020-04-14 Kla-Tencor Corporation Overlay measurement using phase and amplitude modeling
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US12105431B2 (en) * 2022-01-25 2024-10-01 Kla Corporation Annular apodizer for small target overlay measurement
JP2023116048A (ja) * 2022-02-09 2023-08-22 キオクシア株式会社 計測装置および計測方法
US12032300B2 (en) * 2022-02-14 2024-07-09 Kla Corporation Imaging overlay with mutually coherent oblique illumination
KR20250141704A (ko) * 2023-02-02 2025-09-29 에이에스엠엘 네델란즈 비.브이. Yieldstar를 위한 제2 조명 모드 선택기(ims)
US12235588B2 (en) * 2023-02-16 2025-02-25 Kla Corporation Scanning overlay metrology with high signal to noise ratio

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