JP2020524276A5 - - Google Patents

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Publication number
JP2020524276A5
JP2020524276A5 JP2019570044A JP2019570044A JP2020524276A5 JP 2020524276 A5 JP2020524276 A5 JP 2020524276A5 JP 2019570044 A JP2019570044 A JP 2019570044A JP 2019570044 A JP2019570044 A JP 2019570044A JP 2020524276 A5 JP2020524276 A5 JP 2020524276A5
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JP
Japan
Prior art keywords
overlay target
imaging
design
optical system
scattering measurement
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JP2019570044A
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English (en)
Japanese (ja)
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JP2020524276A (ja
JP7018970B2 (ja
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Priority claimed from US15/995,731 external-priority patent/US11112369B2/en
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Publication of JP2020524276A publication Critical patent/JP2020524276A/ja
Publication of JP2020524276A5 publication Critical patent/JP2020524276A5/ja
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Publication of JP7018970B2 publication Critical patent/JP7018970B2/ja
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JP2019570044A 2017-06-19 2018-06-14 撮像ベースオーバーレイ及び散乱計測ベースオーバーレイのためのハイブリッドオーバーレイ標的設計 Active JP7018970B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762521782P 2017-06-19 2017-06-19
US62/521,782 2017-06-19
US15/995,731 US11112369B2 (en) 2017-06-19 2018-06-01 Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay
US15/995,731 2018-06-01
PCT/US2018/037430 WO2018236653A1 (en) 2017-06-19 2018-06-14 Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay

Publications (3)

Publication Number Publication Date
JP2020524276A JP2020524276A (ja) 2020-08-13
JP2020524276A5 true JP2020524276A5 (enExample) 2021-07-26
JP7018970B2 JP7018970B2 (ja) 2022-02-14

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ID=64657997

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JP2019570044A Active JP7018970B2 (ja) 2017-06-19 2018-06-14 撮像ベースオーバーレイ及び散乱計測ベースオーバーレイのためのハイブリッドオーバーレイ標的設計

Country Status (8)

Country Link
US (1) US11112369B2 (enExample)
EP (1) EP3635488A4 (enExample)
JP (1) JP7018970B2 (enExample)
KR (1) KR102353260B1 (enExample)
CN (1) CN110770654B (enExample)
SG (1) SG11201911992TA (enExample)
TW (1) TWI752237B (enExample)
WO (1) WO2018236653A1 (enExample)

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US12100574B2 (en) * 2020-07-01 2024-09-24 Kla Corporation Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures
US11726410B2 (en) * 2021-04-20 2023-08-15 Kla Corporation Multi-resolution overlay metrology targets
US11703767B2 (en) 2021-06-28 2023-07-18 Kla Corporation Overlay mark design for electron beam overlay
US11862524B2 (en) * 2021-06-28 2024-01-02 Kla Corporation Overlay mark design for electron beam overlay
US11720031B2 (en) 2021-06-28 2023-08-08 Kla Corporation Overlay design for electron beam and scatterometry overlay measurements
US12044982B2 (en) * 2021-12-02 2024-07-23 Micron Technology, Inc. Apparatuses and methods for diffraction base overlay measurements
US11796925B2 (en) * 2022-01-03 2023-10-24 Kla Corporation Scanning overlay metrology using overlay targets having multiple spatial frequencies
US12094100B2 (en) * 2022-03-03 2024-09-17 Kla Corporation Measurement of stitching error using split targets
US12422363B2 (en) 2022-03-30 2025-09-23 Kla Corporation Scanning scatterometry overlay metrology
US12487190B2 (en) 2022-03-30 2025-12-02 Kla Corporation System and method for isolation of specific fourier pupil frequency in overlay metrology
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US20240110780A1 (en) * 2022-09-30 2024-04-04 Kla Corporation Mosaic overlay targets
KR102844370B1 (ko) * 2022-12-07 2025-08-08 (주) 오로스테크놀로지 업샘플링을 이용한 오버레이 측정 방법 및 장치와, 이를 이용한 반도체 소자의 제조 방법
US12235588B2 (en) 2023-02-16 2025-02-25 Kla Corporation Scanning overlay metrology with high signal to noise ratio
US20240337953A1 (en) * 2023-04-04 2024-10-10 Kla Corporation System and method for tracking real-time position for scanning overlay metrology

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US7317531B2 (en) * 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
JP2002231616A (ja) 2001-02-05 2002-08-16 Nikon Corp 位置計測装置及び方法、露光装置及び方法、並びにデバイス製造方法
US7804994B2 (en) * 2002-02-15 2010-09-28 Kla-Tencor Technologies Corporation Overlay metrology and control method
US7193715B2 (en) * 2002-11-14 2007-03-20 Tokyo Electron Limited Measurement of overlay using diffraction gratings when overlay exceeds the grating period
US7230703B2 (en) * 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
US7065737B2 (en) 2004-03-01 2006-06-20 Advanced Micro Devices, Inc Multi-layer overlay measurement and correction technique for IC manufacturing
US20060109463A1 (en) 2004-11-22 2006-05-25 Asml Netherlands B.V. Latent overlay metrology
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US10107621B2 (en) * 2012-02-15 2018-10-23 Nanometrics Incorporated Image based overlay measurement with finite gratings
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US10210606B2 (en) * 2014-10-14 2019-02-19 Kla-Tencor Corporation Signal response metrology for image based and scatterometry overlay measurements
CN112698551B (zh) * 2014-11-25 2024-04-23 科磊股份有限公司 分析及利用景观
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US10451412B2 (en) 2016-04-22 2019-10-22 Kla-Tencor Corporation Apparatus and methods for detecting overlay errors using scatterometry

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