JP2015029045A5 - - Google Patents

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Publication number
JP2015029045A5
JP2015029045A5 JP2014049317A JP2014049317A JP2015029045A5 JP 2015029045 A5 JP2015029045 A5 JP 2015029045A5 JP 2014049317 A JP2014049317 A JP 2014049317A JP 2014049317 A JP2014049317 A JP 2014049317A JP 2015029045 A5 JP2015029045 A5 JP 2015029045A5
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JP
Japan
Prior art keywords
charged particle
substrate
particle beams
drawing apparatus
control unit
Prior art date
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Application number
JP2014049317A
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English (en)
Japanese (ja)
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JP2015029045A (ja
JP6289181B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2014049317A external-priority patent/JP6289181B2/ja
Priority to JP2014049317A priority Critical patent/JP6289181B2/ja
Priority to TW103119550A priority patent/TWI551955B/zh
Priority to KR1020140074142A priority patent/KR101721070B1/ko
Priority to CN201410282724.XA priority patent/CN104253011B/zh
Priority to US14/312,908 priority patent/US9171698B2/en
Publication of JP2015029045A publication Critical patent/JP2015029045A/ja
Publication of JP2015029045A5 publication Critical patent/JP2015029045A5/ja
Publication of JP6289181B2 publication Critical patent/JP6289181B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014049317A 2013-06-26 2014-03-12 描画装置、及び、物品の製造方法 Expired - Fee Related JP6289181B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2014049317A JP6289181B2 (ja) 2013-06-26 2014-03-12 描画装置、及び、物品の製造方法
TW103119550A TWI551955B (zh) 2013-06-26 2014-06-05 繪畫裝置和物品的製造方法
KR1020140074142A KR101721070B1 (ko) 2013-06-26 2014-06-18 묘화 장치 및 물품의 제조 방법
CN201410282724.XA CN104253011B (zh) 2013-06-26 2014-06-23 绘画装置和制造物品的方法
US14/312,908 US9171698B2 (en) 2013-06-26 2014-06-24 Drawing apparatus, and method of manufacturing article

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013134211 2013-06-26
JP2013134211 2013-06-26
JP2014049317A JP6289181B2 (ja) 2013-06-26 2014-03-12 描画装置、及び、物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015029045A JP2015029045A (ja) 2015-02-12
JP2015029045A5 true JP2015029045A5 (enExample) 2017-04-20
JP6289181B2 JP6289181B2 (ja) 2018-03-07

Family

ID=52116007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014049317A Expired - Fee Related JP6289181B2 (ja) 2013-06-26 2014-03-12 描画装置、及び、物品の製造方法

Country Status (5)

Country Link
US (1) US9171698B2 (enExample)
JP (1) JP6289181B2 (enExample)
KR (1) KR101721070B1 (enExample)
CN (1) CN104253011B (enExample)
TW (1) TWI551955B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6627632B2 (ja) * 2016-02-08 2020-01-08 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP7002837B2 (ja) * 2016-10-26 2022-01-20 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP6665809B2 (ja) * 2017-02-24 2020-03-13 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びその調整方法
JP6854215B2 (ja) * 2017-08-02 2021-04-07 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP7189729B2 (ja) * 2018-10-30 2022-12-14 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置およびマルチ荷電粒子ビーム描画方法
JP7180515B2 (ja) * 2019-04-11 2022-11-30 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3394237B2 (ja) * 2000-08-10 2003-04-07 株式会社日立製作所 荷電粒子ビーム露光方法及び装置
GB2414111B (en) * 2004-04-30 2010-01-27 Ims Nanofabrication Gmbh Advanced pattern definition for particle-beam processing
CN101194208B (zh) * 2005-04-15 2012-09-05 麦克罗尼克激光系统公司 用于多曝光射束光刻装置的方法
JP2008004596A (ja) * 2006-06-20 2008-01-10 Canon Inc 荷電粒子線描画方法、露光装置、及びデバイス製造方法
JP5530688B2 (ja) * 2009-09-18 2014-06-25 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置およびその近接効果補正方法
CN102043344B (zh) * 2009-10-15 2013-07-17 联华电子股份有限公司 曝光机台的监测方法
WO2011078968A2 (en) * 2009-12-26 2011-06-30 D2S, Inc. Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
US20120085919A1 (en) * 2010-10-08 2012-04-12 Shinichi Kojima Apparatus and methods for pattern generation
NL2007818A (en) * 2010-12-20 2012-06-21 Asml Netherlands Bv Method of updating calibration data and a device manufacturing method.
JP5859778B2 (ja) * 2011-09-01 2016-02-16 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
JP2013165121A (ja) * 2012-02-09 2013-08-22 Canon Inc 描画装置、生成方法、プログラム及び物品の製造方法
JP6193611B2 (ja) * 2013-04-30 2017-09-06 キヤノン株式会社 描画装置、及び物品の製造方法
JP6212299B2 (ja) * 2013-06-26 2017-10-11 キヤノン株式会社 ブランキング装置、描画装置、および物品の製造方法

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