JP2015095605A - 半導体装置および半導体基板 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- 230000004888 barrier function Effects 0.000 claims abstract description 71
- 230000014509 gene expression Effects 0.000 claims abstract description 6
- 229910002704 AlGaN Inorganic materials 0.000 claims abstract 5
- 239000010410 layer Substances 0.000 claims description 253
- 239000002356 single layer Substances 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 abstract description 14
- 238000010586 diagram Methods 0.000 description 34
- 230000000052 comparative effect Effects 0.000 description 24
- 229910002601 GaN Inorganic materials 0.000 description 22
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 22
- 241001125929 Trisopterus luscus Species 0.000 description 11
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 7
- 230000010287 polarization Effects 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 5
- 230000005533 two-dimensional electron gas Effects 0.000 description 5
- 101001091538 Homo sapiens Pyruvate kinase PKM Proteins 0.000 description 4
- 102100034911 Pyruvate kinase PKM Human genes 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- AUCDRFABNLOFRE-UHFFFAOYSA-N alumane;indium Chemical compound [AlH3].[In] AUCDRFABNLOFRE-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 1
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
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- H01L29/7784—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material with delta or planar doped donor layer
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Abstract
【解決手段】基板10上に形成されたInxAlyGa1−x−yNからなるバリア層14と、バリア層14上に形成されたGaNまたはInGaNからなるチャネル層16と、チャネル層16上に形成されたAlGaN、InAlNおよびInAlGaNのいずれかからなる電子供給層18と、電子供給層18上に形成されたゲート電極22およびオーミック電極24、26と、を具備し、バリア層14のxおよびyの関係式は、x>0、y>0、x+y≦1、かつ0.533x<y<4.20xである半導体装置。
【選択図】図6
Description
AlN層の成長条件
組成:AlN
膜厚:50nm
成長温度:1080℃
圧力:13.3kPa
原料:TMA(トリメチルアルミニウム)、NH3(アンモニア)
組成:GaN
膜厚:700nm
成長温度:1080℃
圧力:13.3kPa
原料:TMG(トリメチルガリウム)、NH3
流量:120μモル/分(TMG)、0.5モル/分(NH3)
成長レート:0.4nm/秒
組成:InAlN(In組成20%)
膜厚:400nm
成長温度:820℃
圧力:13.3kPa
原料:TMI(トリメチルインジウム)、TMA、NH3
流量:60μモル/分(TMI)、30μモル/分(TMA)、0.5モル/分(NH3)
成長レート:0.2nm/秒
組成:GaN
膜厚:100nm
成長温度:1080℃
圧力:13.3kPa
原料:TMG(トリメチルガリウム)、NH3
流量:120μモル/分(TMG)、0.5モル/分(NH3)
成長レート:0.4nm/秒
組成:AlGaN(Al組成20%)
膜厚:20nm
成長温度:1080℃
圧力:13.3kPa
原料:TMA、TMG、NH3
12 バッファ層
14 バリア層
16 チャネル層
18 電子供給層
20 絶縁膜
22 ゲート電極
24 ソース電極
26 ドレイン電極
Claims (14)
- 基板上に形成されたInxAlyGa1−x−yNからなるバリア層と、
前記バリア層上に形成されたGaNまたはInGaNからなるチャネル層と、
前記チャネル層上に形成されたAlGaN、InAlNおよびInAlGaNのいずれかからなる電子供給層と、
前記電子供給層上に形成されたゲート電極およびオーミック電極と、
を具備し、
前記バリア層の前記xおよびyの関係式は、x>0、y>0、x+y≦1、かつ0.533x<y<4.20xであることを特徴とする半導体装置。 - 前記バリア層のバンドギャップは、3.6eV以上であることを特徴とする請求項1記載の半導体装置。
- 2.10x<yであることを特徴とする請求項1記載の半導体装置。
- 前記チャネル層の膜厚は、20nm以上かつ100nm以下であることを特徴とする請求項1から3のいずれか一項記載の半導体装置。
- 前記電子供給層がInAlNのとき、In組成比は18%より小さいことを特徴とする請求項1から4のいずれか一項記載の半導体装置。
- 前記バリア層は、組成が一様な単層であることを特徴とする請求項1から5のいずれか一項記載の半導体装置。
- 前記バリア層は、それぞれ組成が一様な複数の層を含むことを特徴とする請求項1から5のいずれか一項記載の半導体装置。
- 前記電子供給層がAlGaNのときAl組成比は15〜30%、前記電子供給層がInAlNのときAl組成比は83〜85%、前記電子供給層がInAlGaNのときAl組成比は65〜85%およびGa組成比は0〜20%であることを特徴とする請求項1から7のいずれか一項記載の半導体装置。
- 基板上に形成されたInxAlyGa1−x−yNからなるバリア層と、
前記バリア層上に形成されたGaNまたはInGaNからなるチャネル層と、
前記チャネル層上に形成されたAlGaN、InAlNおよびInAlGaNのいずれかからなる電子供給層と、
を具備し、
前記バリア層の前記xおよびyの関係式は、x>0、y>0、x+y≦1、かつ0.533x<y<4.20xであることを特徴とする半導体基板。 - 前記バリア層のバンドギャップは、3.6eV以上であることを特徴とする請求項9記載の半導体基板。
- 2.10x<yであることを特徴とする請求項9記載の半導体基板。
- 前記チャネル層の膜厚は、20nm以上かつ100nm以下であることを特徴とする請求項9から11のいずれか一項記載の半導体基板。
- 前記電子供給層がInAlNのとき、In組成比は18%より小さいことを特徴とする請求項9から12のいずれか一項記載の半導体基板。
- 前記電子供給層がAlGaNのときAl組成比は15〜30%、前記電子供給層がInAlNのときAl組成比は83〜85%、前記電子供給層がInAlGaNのときAl組成比は65〜85%およびGa組成比は0〜20%であることを特徴とする請求項9から13のいずれか一項記載の半導体基板。
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JP2001196575A (ja) * | 2000-01-13 | 2001-07-19 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JP2004235473A (ja) * | 2003-01-30 | 2004-08-19 | Shin Etsu Handotai Co Ltd | 化合物半導体素子及びその製造方法 |
JP2005268493A (ja) * | 2004-03-18 | 2005-09-29 | National Institute Of Information & Communication Technology | ヘテロ接合電界効果トランジスタ |
JP2008252034A (ja) * | 2007-03-30 | 2008-10-16 | Fujitsu Ltd | 化合物半導体装置 |
JP2010182812A (ja) * | 2009-02-04 | 2010-08-19 | Fujitsu Ltd | 化合物半導体装置及びその製造方法 |
JP2010238699A (ja) * | 2009-03-30 | 2010-10-21 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置 |
JP2012256706A (ja) * | 2011-06-08 | 2012-12-27 | Sumitomo Electric Ind Ltd | 半導体装置 |
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US9437725B2 (en) | 2016-09-06 |
US20150129889A1 (en) | 2015-05-14 |
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