JP2015015370A5 - - Google Patents

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Publication number
JP2015015370A5
JP2015015370A5 JP2013141295A JP2013141295A JP2015015370A5 JP 2015015370 A5 JP2015015370 A5 JP 2015015370A5 JP 2013141295 A JP2013141295 A JP 2013141295A JP 2013141295 A JP2013141295 A JP 2013141295A JP 2015015370 A5 JP2015015370 A5 JP 2015015370A5
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JP
Japan
Prior art keywords
heating step
coating film
forming
substrate
film according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013141295A
Other languages
English (en)
Japanese (ja)
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JP6081879B2 (ja
JP2015015370A (ja
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Publication date
Application filed filed Critical
Priority to JP2013141295A priority Critical patent/JP6081879B2/ja
Priority claimed from JP2013141295A external-priority patent/JP6081879B2/ja
Priority to PCT/JP2014/065576 priority patent/WO2015001936A1/ja
Priority to TW103121878A priority patent/TWI569463B/zh
Publication of JP2015015370A publication Critical patent/JP2015015370A/ja
Publication of JP2015015370A5 publication Critical patent/JP2015015370A5/ja
Application granted granted Critical
Publication of JP6081879B2 publication Critical patent/JP6081879B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013141295A 2013-07-05 2013-07-05 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体 Active JP6081879B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013141295A JP6081879B2 (ja) 2013-07-05 2013-07-05 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体
PCT/JP2014/065576 WO2015001936A1 (ja) 2013-07-05 2014-06-12 塗布膜の形成方法及びコンピュータ記憶媒体
TW103121878A TWI569463B (zh) 2013-07-05 2014-06-25 The forming method of the coating film and the computer memory medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013141295A JP6081879B2 (ja) 2013-07-05 2013-07-05 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体

Publications (3)

Publication Number Publication Date
JP2015015370A JP2015015370A (ja) 2015-01-22
JP2015015370A5 true JP2015015370A5 (enrdf_load_stackoverflow) 2015-08-06
JP6081879B2 JP6081879B2 (ja) 2017-02-15

Family

ID=52143519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013141295A Active JP6081879B2 (ja) 2013-07-05 2013-07-05 塗布膜の形成方法、プログラム及びコンピュータ記憶媒体

Country Status (3)

Country Link
JP (1) JP6081879B2 (enrdf_load_stackoverflow)
TW (1) TWI569463B (enrdf_load_stackoverflow)
WO (1) WO2015001936A1 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016125408A1 (ja) * 2015-02-05 2016-08-11 東京エレクトロン株式会社 研磨装置、塗布膜形成装置、塗布膜形成方法、記憶媒体、パターン形成方法及びパターン形成装置
JP7308671B2 (ja) * 2019-07-03 2023-07-14 東京エレクトロン株式会社 基板熱処理装置、基板熱処理方法及び記憶媒体

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6381820A (ja) * 1986-09-25 1988-04-12 Toshiba Corp レジストパタ−ン形成方法
JPS6381923A (ja) * 1986-09-26 1988-04-12 Hitachi Ltd 感光性ポリイミド樹脂処理方法および装置
JPH0289059A (ja) * 1988-09-26 1990-03-29 Hitachi Electron Eng Co Ltd ベーク方法
JPH0561206A (ja) * 1991-08-30 1993-03-12 Oki Electric Ind Co Ltd レジストの平坦化方法
JP3282240B2 (ja) * 1992-10-03 2002-05-13 住友金属工業株式会社 帯状材の連続塗装方法
JP3563434B2 (ja) * 1994-03-22 2004-09-08 株式会社神戸製鋼所 感熱自己接着性樹脂塗装金属板およびその製法並びに該樹脂塗装金属板の接合法
JP3801271B2 (ja) * 1996-08-30 2006-07-26 旭硝子株式会社 アクティブマトリクス基板
JP2001188357A (ja) * 1999-12-28 2001-07-10 Matsushita Electric Ind Co Ltd 表示素子用基板への樹脂膜形成法及び装置、並びに該方法を用いた液晶表示装置の製造方法
CN1891761B (zh) * 2001-12-17 2010-10-06 大金工业株式会社 交联性弹性体组合物及由该组合物形成的成型品
JP2004002752A (ja) * 2002-03-28 2004-01-08 Toray Ind Inc ポリ（脂環式オレフィン）組成物の処理方法並びに半導体装置、光学部品および有機電界発光装置
US20040084774A1 (en) * 2002-11-02 2004-05-06 Bo Li Gas layer formation materials
KR20110002500A (ko) * 2005-07-05 2011-01-07 히다치 가세고교 가부시끼가이샤 감광성 접착제, 및 이것을 이용하여 얻어지는 접착 필름, 접착 시트, 접착제층 부착 반도체 웨이퍼, 반도체장치 및 전자부품
JP2008186934A (ja) * 2007-01-29 2008-08-14 Dainippon Screen Mfg Co Ltd 熱処理装置および熱処理方法

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