JP2015009358A - 被覆切削工具 - Google Patents
被覆切削工具 Download PDFInfo
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- JP2015009358A JP2015009358A JP2014132416A JP2014132416A JP2015009358A JP 2015009358 A JP2015009358 A JP 2015009358A JP 2014132416 A JP2014132416 A JP 2014132416A JP 2014132416 A JP2014132416 A JP 2014132416A JP 2015009358 A JP2015009358 A JP 2015009358A
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- 238000005520 cutting process Methods 0.000 title claims abstract description 79
- 238000000576 coating method Methods 0.000 claims abstract description 36
- 239000011248 coating agent Substances 0.000 claims abstract description 29
- 238000002441 X-ray diffraction Methods 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 230000005855 radiation Effects 0.000 claims abstract description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 47
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000004364 calculation method Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 19
- 238000002347 injection Methods 0.000 description 15
- 239000007924 injection Substances 0.000 description 15
- 238000005229 chemical vapour deposition Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 229910002091 carbon monoxide Inorganic materials 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000012937 correction Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910000975 Carbon steel Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000001247 metal acetylides Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910017488 Cu K Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007405 data analysis Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005555 metalworking Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910017541 Cu-K Inorganic materials 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 102000002262 Thromboplastin Human genes 0.000 description 1
- 108010000499 Thromboplastin Proteins 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010896 thin film analysis Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0254—Physical treatment to alter the texture of the surface, e.g. scratching or polishing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
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- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/04—Aluminium oxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2224/00—Materials of tools or workpieces composed of a compound including a metal
- B23B2224/32—Titanium carbide nitride (TiCN)
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
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- Metallurgy (AREA)
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- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
[試料A(本発明)]
本発明の1つの実施形態による被覆切削工具(インサート)を製造した。旋削用のISOタイプ CNMG120408の焼結炭化物基材を、7.2重量%のCo、2.7重量%のTa、1.8重量%のTi、0.4重量%のNb、0.1重量%のN、及び残分のWCから製造した。この基材は、基材表面から、実質的に立方晶炭化物を含まない本体の中へ入り込んだ深さまで約25μmのCoの濃度の高い表面ゾーンを含む。
下記に開示するように別のCVD被膜蒸着工程を使用したことを除いて、試料Aの工程に合致する工程で被覆インサートを製造した。
噴射加工を切削工具のすくい面上で行った。このブラスタースラリーは、水に懸濁させた20体積%のアルミナからなり、切削インサートのすくい面とブラスタースラリーの方向の角度は90°であった。ガンノズルとインサートの表面の間の距離は、約145mmであった。ガンに対するスラリーの圧力は、すべての試料について1.8バールであり、一方、ガンに対する空気の圧力は、2.1バール(噴射処理1)、2.2バール(噴射処理2)、又は2.5バール(噴射処理3)であった。アルミナ粗粒子は、F220メッシュ(FEPA 42−1:2006)であった。面積単位当たりの噴射の平均時間は4.4秒であった。3種類の異なる噴射処理を試料Aについて評価した。噴射処理1で処理された試料Aを、以後試料A1と呼ぶ。また噴射処理2で処理された場合、試料A2と呼び、噴射処理3で処理された場合、試料A3と呼ぶ。試料Bは、噴射処理2で処理された(試料B2)。
測定にはCu−KαX線を使用した。マイクロフォーカスX線源に取り付けられたミラーにより、ピンホールコリメータなしに約0.8×0.8mmにビームの焦点を合わせた。測定は50kVの電圧及び1mAの電流を用いて行われ、50Wの最大出力を生み出した。インサート上の小さな平坦な領域ですくい面を測定することを可能にするにはピンホールコリメータを使用した。試料からの回折強度を、3個の画像を用いて異なる2θ位置で面検出器により測定し、2θが15から105°の間の回折情報をもたらした。その後、これら画像をBrukers EVA(V3.0)ソフトウェアで一つにし、そのBrukerソフトウェアでGamma directionと定義されるものに統合することによって1Dディフラクトグラムに変換した。
TiCN層のXRD測定のために使用される設備は、例3におけるα−Al2O3のTC測定の場合と同じものであり、同じ方法論及び設備パラメータを使用した。この事例では噴射加工されない逃げ面が測定された。
ロッキングカーブの測定を、Philips MRD(Materials Research Diffractometer)で行った。この回折計を、CuKα(α1及びα2の両方)放射線による線焦点で動作させた。入射光学系は、0.04°の発散を有するX線ミラー及びクロススリットコリメータであった。回折される側の光学系は、0.27°平行平板コリメータ及びガス比例点(gas proportional point)検出器であった。90.665°の固定2θ角で、ωを連続モードにおいて1°のステップ幅及び10秒/ステップで6.3から69.3°の間をスキャンした。アルミナ層の上側のTiNなどの外層は、XRD測定結果に実質上影響を与えない方法、例えばエッチングによって除去することができる。α−Al2O3層は有限厚であるので、α−Al2O3層内のX線ビームの経路長はω角の関数として相違するはずであり、それに対して強度データを補正する必要がある。それは、例えばBricholz(Thin Film Analysis by X−ray Scattering,2006,Wiley−VLC Verlag,ISBN 3−527−31052−5,chapter 5.5.3,pages 211〜215)が述べているように、厚さ及び線吸収係数を考慮に入れて行うことができる。
例3で開示したものに合致する、X線回折θ〜2θスキャンにおける(0012)回折ピークのFHWMを、噴射加工されたすくい面上及び噴射加工されない逃げ面上で測定した。
熱処理が、噴射加工された被膜を変えて噴射加工前の応力状態に戻すことを確かめるために下記の実験を行った。そのすくい面に噴射加工することによって処理された切削インサートは、0.51の差Δ=FHWM(すくい面)−FHWM(逃げ面)を示した。このインサートをN2中で1030℃において3時間熱処理した。熱処理後、差Δ=FHWM(すくい面)−FHWM(逃げ面)は0.08であった。したがってインサートがすくい面上だけでなく逃げ面上にも噴射加工されている場合、対応する熱処理を使用して、噴射加工されない逃げ面の被膜と似た被膜を生成することができる。
例2に従って噴射加工された被覆切削工具、すなわち試料A1、A2、A3、B2を、下記の切削データを使用して軸受け鋼(100CrMo7〜3)において縦方向旋削で試験した。
切削速度Vc:220m/分
切削送りf:0.3mm/回転
切り込みap:2mm
インサート形式:CNMG120408−PM
水混和性金属加工液を使用した。
切削工具につき1個の切り刃を評価した。
例2の被覆切削工具、すなわち試料A1、A2、A3、B2を靱性試験に使用した。
下記の切削データを使用した。
切削速度Vc:80m/分
切り込みap:1.5mm
水混和性金属加工液を使用した。
Claims (6)
- 基材及び被膜を備えた被覆切削工具であって、前記被膜が、
MTCVD TiCN層、及び
α−Al2O3層
を含み、前記α−Al2O3層が、CuKα放射線及びθ〜2θスキャンを使用して測定されるX線回折パターンを示し、組織係数TC(hkl)がハリスの式
使用される(hkl)反射が、(012)、(104)、(110)、(113)、(116)、(300)、(214)及び(0012)であり、TC(0012)が5を超え、好ましくは6を超え、最も好ましくは7を超え、
前記切削工具の逃げ面上で測定されるX線回折を用いたα−Al2O3の(0012)面のロッキングカーブピークの半値全幅(FWHM)が30°未満、好ましくは26°未満、より好ましくは22°未満のFWHMであり、
前記TiCN層が、CuKα放射線を用いて測定されるX線回折パターンを示し、220ピークの積分面積強度と331ピークの積分面積強度の関係I220/I311が3未満、好ましくは2未満、最も好ましくは1未満である、被覆切削工具。 - 前記切削工具のすくい面上の前記α−Al2O3層のX線回折における(0012)回折ピークのFWHMと、前記切削工具の逃げ面上のα−Al2O3のX線回折における(0012)回折ピークのFWHMの差Δが、Δ>0.2、好ましくはΔ>0.3、最も好ましくはΔ>0.4である、請求項1に記載の被覆切削工具。
- 前記α−Al2O3層のX線回折における(0012)回折ピークのFWHMと、1030℃においてN2中で3時間熱処理した後の切削工具のX線回折における(0012)回折ピークのFWHMの差Δが、Δ>0.20、好ましくはΔ>0.3、最も好ましくはΔ>0.4である、請求項1に記載の被覆切削工具。
- 前記α−Al2O3層が2〜15μm、好ましくは3〜7μm、最も好ましくは4〜6μmである、請求項1〜3のいずれか1項に記載の被覆切削工具。
- 前記TiCN層が2〜15μm、好ましくは5〜12μm、最も好ましくは7〜11μmである、請求項1〜4のいずれか1項に記載の被覆切削工具。
- 前記MTCVD TiCN層と前記α−Al2O3層の間に1〜2μm厚さの結合層をさらに含む、請求項1〜5のいずれか1項に記載の被覆切削工具。
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RU2667187C2 (ru) | 2018-09-17 |
BR102014015836B1 (pt) | 2022-01-25 |
EP2818573A1 (en) | 2014-12-31 |
KR102256425B1 (ko) | 2021-05-25 |
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KR20170049473A (ko) | 2017-05-10 |
EP2818573B1 (en) | 2016-02-03 |
KR20150001680A (ko) | 2015-01-06 |
ES2570537T3 (es) | 2016-05-18 |
CN104249165B (zh) | 2018-11-27 |
US20150003925A1 (en) | 2015-01-01 |
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