JP2015005752A - イメージセンサで使用される埋め込みフォトダイオードの改良 - Google Patents
イメージセンサで使用される埋め込みフォトダイオードの改良 Download PDFInfo
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
- H01L27/1461—Pixel-elements with integrated switching, control, storage or amplification elements characterised by the photosensitive area
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
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- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1463—Pixel isolation structures
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- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
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- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
Abstract
Description
第1ドープ領域の上に形成され、第2電位の内部バイアスが印加されている第3ドープ領域と、を備え、
少なくとも第2ドープ領域は、第2電位から独立した第3電位の外部バイアスが印加されて、第1ドープ領域と第2ドープ領域との間にアバランシェ領域を生成することを特徴とする。
1.標準のCIS実装と比べて、画素アレイのアドレス指定および読み出しのための追加のCMOS回路の必要性がない。単に、一定の高い負バイアスを供給する必要があるだけであり、これは全ての画素に共通している。
2.既存の画素回路は、適合させる必要がない。これは、画素において、PPD注入部の最適化以外は、技術の変更が必要とされないことを意味する。そして、同じ設計およびレイアウトのオプションが、画素トランジスタの共有、一般のスケーリング等に関して最新のCISについて利用できる。従って、充填率は、標準のCISと比べて影響を受けず、他のアバランシェ代替案より良好である。
3.信号増幅が、主として微光レベル信号について生じ、より高い光レベルでは生じない。これは、増幅率がPPDでの電圧に大きく依存しているためであり、そして、これは収集した電荷の量に依存する。応答は、ダイナミックレンジを増加させるように非線形である。
Claims (12)
- 第2ドープ領域(120)の上に形成され、第1電位の内部バイアスが印加されている第1ドープ領域(170)と、
第1ドープ領域(170)の上に形成され、第2電位の内部バイアスが印加されている第3ドープ領域(180)とを備え、
少なくとも第2ドープ領域(120)は、第2電位から独立した第3電位の外部バイアスが印加されて、第1ドープ領域(170)と第2ドープ領域(120)との間にアバランシェ領域(230)を生成することを特徴とする埋め込みフォトダイオード画素構造(100)。 - 基板(110)をさらに備え、
基板(110)の上に第2ドープ領域(120)が形成され、
基板(110)は、第3電位の外部バイアスが印加される、請求項1記載の埋め込みフォトダイオード画素構造。 - 第2ドープ領域(120)の上で第1ドープ領域(170)の下方に形成された第4ドープ領域(130)をさらに備え、
第4ドープ領域(130)は、第1ドープ領域(170)と同様な材料型である、請求項1または2記載の埋め込みフォトダイオード画素構造。 - 少なくとも第1ドープ領域(170)の中に延びており、第2ドープ領域(120)から垂直に分離している注入部(140,160)をさらに備える、請求項1〜3のいずれかに記載の埋め込みフォトダイオード画素構造。
- 注入部の一方(140)は、注入部(140)自体に対して反対ドーピングの関連したドープ領域(150)を含み、
注入部(140)およびドープ領域(150)は、少なくとも1つのトランジスタエリアを画定する、請求項4記載の埋め込みフォトダイオード画素構造。 - 少なくとも1つのトランジスタエリアと関連した転送ゲート(190)をさらに備える、請求項5記載の埋め込みフォトダイオード画素構造。
- 注入部の他方(160)は、STIエリア(165)を含む、請求項4記載の埋め込みフォトダイオード画素構造。
- 第1ドープ領域(170)は、n型材料を含み、第2ドープ領域(120)は、p型材料を含む、請求項1〜7のいずれかに記載の埋め込みフォトダイオード画素構造。
- 第3電位は、負の電位を含む、請求項8記載の埋め込みフォトダイオード画素構造。
- 第3ドープ領域(180)は、グランド電位のバイアスが印加されたp型材料を含む、請求項8または9記載の埋め込みフォトダイオード画素構造。
- 第2ドープ領域(170)は、転送ゲート(190)を経由して電荷を抽出することによって、ピンニング電圧の内部バイアスが印加される、請求項1〜10のいずれかに記載の埋め込みフォトダイオード画素構造。
- 請求項1〜11のいずれかに記載の、少なくとも1つの埋め込みフォトダイオード画素画素構造を備えたイメージセンサ。
Applications Claiming Priority (2)
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EP13173087.1 | 2013-06-20 | ||
EP13173087.1A EP2816601B1 (en) | 2013-06-20 | 2013-06-20 | Improvements in or relating to pinned photodiodes for use in image sensors |
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KR20230009400A (ko) | 2020-05-08 | 2023-01-17 | 하마마츠 포토닉스 가부시키가이샤 | 광 검출 장치, 및 광 센서의 구동 방법 |
JP2023502183A (ja) * | 2020-01-28 | 2023-01-20 | アダップス・フォトニクス・インコーポレイテッド | 単一光子アバランシェダイオード装置 |
KR20230084484A (ko) | 2020-10-14 | 2023-06-13 | 하마마츠 포토닉스 가부시키가이샤 | 광 센서 |
US11888003B2 (en) | 2018-03-30 | 2024-01-30 | Panasonic Intellectual Property Management Co., Ltd. | Photodetector |
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EP2816601A1 (en) | 2014-12-24 |
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