JP2014527021A - 化合物及びこれを用いた有機電気素子、その電子装置 - Google Patents
化合物及びこれを用いた有機電気素子、その電子装置 Download PDFInfo
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- JP2014527021A JP2014527021A JP2014502476A JP2014502476A JP2014527021A JP 2014527021 A JP2014527021 A JP 2014527021A JP 2014502476 A JP2014502476 A JP 2014502476A JP 2014502476 A JP2014502476 A JP 2014502476A JP 2014527021 A JP2014527021 A JP 2014527021A
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- alkyl
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 97
- 239000000126 substance Substances 0.000 claims abstract description 52
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical group [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 claims abstract description 4
- 229910052722 tritium Chemical group 0.000 claims abstract description 4
- 238000002347 injection Methods 0.000 claims description 46
- 239000007924 injection Substances 0.000 claims description 46
- 125000001424 substituent group Chemical group 0.000 claims description 43
- 125000000217 alkyl group Chemical group 0.000 claims description 32
- 229910052805 deuterium Inorganic materials 0.000 claims description 28
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 25
- 125000002560 nitrile group Chemical group 0.000 claims description 25
- 230000005525 hole transport Effects 0.000 claims description 24
- 125000003545 alkoxy group Chemical group 0.000 claims description 23
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 21
- 239000011368 organic material Substances 0.000 claims description 21
- 125000003277 amino group Chemical group 0.000 claims description 20
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 20
- 125000003342 alkenyl group Chemical group 0.000 claims description 18
- 125000000623 heterocyclic group Chemical group 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 14
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 12
- 150000002367 halogens Chemical class 0.000 claims description 12
- 125000005018 aryl alkenyl group Chemical group 0.000 claims description 11
- 125000005843 halogen group Chemical group 0.000 claims description 11
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims description 10
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 10
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical group NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 claims description 9
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 9
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 9
- 125000001072 heteroaryl group Chemical group 0.000 claims description 9
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims description 9
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 5
- 125000006749 (C6-C60) aryl group Chemical group 0.000 claims description 5
- CAJILKYXPOWWBF-UHFFFAOYSA-N 2-prop-2-enylthiophene Chemical group C=CCC1=CC=CS1 CAJILKYXPOWWBF-UHFFFAOYSA-N 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 5
- 125000003282 alkyl amino group Chemical group 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical group [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 claims description 4
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims description 3
- 125000005549 heteroarylene group Chemical group 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 125000005336 allyloxy group Chemical group 0.000 claims description 2
- 108091008695 photoreceptors Proteins 0.000 claims description 2
- 125000006761 (C6-C60) arylene group Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 6
- 239000001257 hydrogen Substances 0.000 abstract description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 123
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 75
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 69
- 230000015572 biosynthetic process Effects 0.000 description 55
- 238000003786 synthesis reaction Methods 0.000 description 52
- 239000000463 material Substances 0.000 description 48
- 238000006243 chemical reaction Methods 0.000 description 46
- 239000000047 product Substances 0.000 description 33
- 239000012044 organic layer Substances 0.000 description 31
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 29
- 238000001308 synthesis method Methods 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 description 20
- 0 *C1=CC=C(*)CC1 Chemical compound *C1=CC=C(*)CC1 0.000 description 17
- 239000000543 intermediate Substances 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 239000000741 silica gel Substances 0.000 description 13
- 229910002027 silica gel Inorganic materials 0.000 description 13
- 229960001866 silicon dioxide Drugs 0.000 description 13
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 238000005401 electroluminescence Methods 0.000 description 11
- 239000007787 solid Substances 0.000 description 11
- 239000007858 starting material Substances 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- -1 acridyl group Chemical group 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 229910052799 carbon Inorganic materials 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- UCCUXODGPMAHRL-UHFFFAOYSA-N 1-bromo-4-iodobenzene Chemical compound BrC1=CC=C(I)C=C1 UCCUXODGPMAHRL-UHFFFAOYSA-N 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000012267 brine Substances 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- YGNUPJXMDOFFDO-AQAXYKDHSA-N C1(=CC=CC=C1)NC1=C(C(=C(C(=C1[2H])[2H])C=1C(=CC=CC=1)[2H])[2H])[2H] Chemical compound C1(=CC=CC=C1)NC1=C(C(=C(C(=C1[2H])[2H])C=1C(=CC=CC=1)[2H])[2H])[2H] YGNUPJXMDOFFDO-AQAXYKDHSA-N 0.000 description 5
- 150000001412 amines Chemical group 0.000 description 5
- YCOXTKKNXUZSKD-UHFFFAOYSA-N as-o-xylenol Natural products CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- SNHMUERNLJLMHN-UHFFFAOYSA-N iodobenzene Chemical compound IC1=CC=CC=C1 SNHMUERNLJLMHN-UHFFFAOYSA-N 0.000 description 5
- 150000002825 nitriles Chemical class 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 4
- 238000007641 inkjet printing Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- IBGUDZMIAZLJNY-UHFFFAOYSA-N 1,4-dibromonaphthalene Chemical compound C1=CC=C2C(Br)=CC=C(Br)C2=C1 IBGUDZMIAZLJNY-UHFFFAOYSA-N 0.000 description 3
- CZYAFTZIQWCKOI-UHFFFAOYSA-N 1,5-dibromonaphthalene Chemical compound C1=CC=C2C(Br)=CC=CC2=C1Br CZYAFTZIQWCKOI-UHFFFAOYSA-N 0.000 description 3
- KBVDUUXRXJTAJC-UHFFFAOYSA-N 2,5-dibromothiophene Chemical compound BrC1=CC=C(Br)S1 KBVDUUXRXJTAJC-UHFFFAOYSA-N 0.000 description 3
- PJZDEYKZSZWFPX-UHFFFAOYSA-N 2,6-dibromonaphthalene Chemical compound C1=C(Br)C=CC2=CC(Br)=CC=C21 PJZDEYKZSZWFPX-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
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- 230000003247 decreasing effect Effects 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000005283 ground state Effects 0.000 description 3
- 238000004770 highest occupied molecular orbital Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 239000007774 positive electrode material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 238000010345 tape casting Methods 0.000 description 3
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 3
- 238000003868 zero point energy Methods 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- WRGKKASJBOREMB-UHFFFAOYSA-N 1,4-dibromo-2-nitrobenzene Chemical compound [O-][N+](=O)C1=CC(Br)=CC=C1Br WRGKKASJBOREMB-UHFFFAOYSA-N 0.000 description 2
- UHXOHPVVEHBKKT-UHFFFAOYSA-N 1-(2,2-diphenylethenyl)-4-[4-(2,2-diphenylethenyl)phenyl]benzene Chemical compound C=1C=C(C=2C=CC(C=C(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=2)C=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 UHXOHPVVEHBKKT-UHFFFAOYSA-N 0.000 description 2
- XHLHPRDBBAGVEG-UHFFFAOYSA-N 1-tetralone Chemical compound C1=CC=C2C(=O)CCCC2=C1 XHLHPRDBBAGVEG-UHFFFAOYSA-N 0.000 description 2
- NIKMXXDCBKHEFO-UHFFFAOYSA-N 11-bromo-9h-dibenzo[a,c]carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2C2=C1C1=CC=C(Br)C=C1N2 NIKMXXDCBKHEFO-UHFFFAOYSA-N 0.000 description 2
- MYKQKWIPLZEVOW-UHFFFAOYSA-N 11h-benzo[a]carbazole Chemical group C1=CC2=CC=CC=C2C2=C1C1=CC=CC=C1N2 MYKQKWIPLZEVOW-UHFFFAOYSA-N 0.000 description 2
- DWWHXKXYTBXMOS-UHFFFAOYSA-N 17-bromo-21-phenyl-21-azapentacyclo[12.7.0.02,7.08,13.015,20]henicosa-1(14),2,4,6,8,10,12,15(20),16,18-decaene Chemical compound C12=CC=CC=C2C2=CC=CC=C2C2=C1C1=CC(Br)=CC=C1N2C1=CC=CC=C1 DWWHXKXYTBXMOS-UHFFFAOYSA-N 0.000 description 2
- BKLYMJMSQYGGDL-UHFFFAOYSA-N 18-bromo-21-phenyl-21-azapentacyclo[12.7.0.02,7.08,13.015,20]henicosa-1(14),2,4,6,8,10,12,15(20),16,18-decaene Chemical compound C=1C(Br)=CC=C(C2=C3C4=CC=CC=C4C4=CC=CC=C42)C=1N3C1=CC=CC=C1 BKLYMJMSQYGGDL-UHFFFAOYSA-N 0.000 description 2
- ONCCVJKFWKAZAE-UHFFFAOYSA-N 2-bromo-9,9'-spirobi[fluorene] Chemical compound C12=CC=CC=C2C2=CC=CC=C2C21C1=CC=CC=C1C1=CC=C(Br)C=C12 ONCCVJKFWKAZAE-UHFFFAOYSA-N 0.000 description 2
- SOODLDGRGXOSTA-UHFFFAOYSA-N 2-bromo-9-phenylcarbazole Chemical compound C=1C(Br)=CC=C(C2=CC=CC=C22)C=1N2C1=CC=CC=C1 SOODLDGRGXOSTA-UHFFFAOYSA-N 0.000 description 2
- PJRGCJBBXGNEGD-UHFFFAOYSA-N 2-bromo-9h-carbazole Chemical compound C1=CC=C2C3=CC=C(Br)C=C3NC2=C1 PJRGCJBBXGNEGD-UHFFFAOYSA-N 0.000 description 2
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 2
- JQTDEAITGPQCFS-UHFFFAOYSA-N 8-bromo-11-phenylbenzo[a]carbazole Chemical compound C1=CC2=CC=CC=C2C2=C1C1=CC(Br)=CC=C1N2C1=CC=CC=C1 JQTDEAITGPQCFS-UHFFFAOYSA-N 0.000 description 2
- KCNQXTCFWRXIIB-UHFFFAOYSA-N 9-(4-bromo-2-nitrophenyl)phenanthrene Chemical compound [O-][N+](=O)C1=CC(Br)=CC=C1C1=CC2=CC=CC=C2C2=CC=CC=C12 KCNQXTCFWRXIIB-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 238000005411 Van der Waals force Methods 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
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- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002883 imidazolyl group Chemical group 0.000 description 2
- 230000009878 intermolecular interaction Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000007523 nucleic acids Chemical class 0.000 description 2
- 102000039446 nucleic acids Human genes 0.000 description 2
- 108020004707 nucleic acids Proteins 0.000 description 2
- 229960003540 oxyquinoline Drugs 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- JCDAUYWOHOLVMH-UHFFFAOYSA-N phenanthren-9-ylboronic acid Chemical compound C1=CC=C2C(B(O)O)=CC3=CC=CC=C3C2=C1 JCDAUYWOHOLVMH-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- 230000003313 weakening effect Effects 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RGGOWBBBHWTTRE-UHFFFAOYSA-N (4-bromophenyl)hydrazine;hydron;chloride Chemical compound Cl.NNC1=CC=C(Br)C=C1 RGGOWBBBHWTTRE-UHFFFAOYSA-N 0.000 description 1
- KZPYGQFFRCFCPP-UHFFFAOYSA-N 1,1'-bis(diphenylphosphino)ferrocene Chemical compound [Fe+2].C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=C[C-]1P(C=1C=CC=CC=1)C1=CC=CC=C1 KZPYGQFFRCFCPP-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
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- 238000003756 stirring Methods 0.000 description 1
- 101150075118 sub1 gene Proteins 0.000 description 1
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- 229910052718 tin Inorganic materials 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
- H10K85/633—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/54—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to two or three six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/91—Dibenzofurans; Hydrogenated dibenzofurans
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/30—Hetero atoms other than halogen
- C07D333/36—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/76—Dibenzothiophenes
-
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Abstract
Description
R3〜R7は隣り合う基と結合して飽和または不飽和環、即ち指環族または芳香族環を形成することができ、ヘテロ環も形成することができる。この際、隣り合う基とは、置換基だけでなく母核自体を含む概念である。
以下、製造例及び実験例を通じて本発明をより詳細に説明する。しかしながら、以下の製造例及び実験例は、本発明を例示するためのものであり、本発明の範囲がこれらにより限定されるものではない。
以下、(化学式1)乃至(化学式4)に属する化合物に対する製造例または合成例を説明する。
500mLの3つ口丸底フラスコにフルオレン(22g、130mmol)及び水分を除去したTHF(100mL)を窒素大気状態で入れて混合物を攪拌しながら−78℃に冷却した後、30分間温度を維持し、攪拌する。その後、冷却された混合物に核酸溶液にある2.6Mn−BuLi(120mL、320mmol)を滴加した。
暗反応のために反応を進行させるフードに光を遮断した後、500mLの3つ口丸底フラスコに1A−1(9.7g、50mmol)、クロロホルム(100mL)、FeCl2(0.2g)を入れた。反応フラスコを0℃に冷却した後、Br2(12g、75mmol)を滴加し、24時間反応を進行した。
1Lの3つ口丸底フラスコに2-Bromo-9H-fluoren-9-one(41.5g、160mmol)及び無水THF(900mL)を窒素大気状態で入れて混合物を攪拌しながら−78℃に冷却した後、30分間温度を維持し、攪拌する。その後、冷却された混合物に核酸溶液にある2.6M n−BuLi(64mL、160mmol)を滴加した。この反応フラスコを−78℃に維持しながら1時間を攪拌する。
1Lの丸底フラスコに3A−1(35.7g、86.38mmol)、アセト酸(96mL)を入れて攪拌して溶媒に溶かす。反応温度を0℃に低めて、塩酸(112mL)をゆっくり滴加する。滴加時、ゆっくり生成される固体を確認した後、これ以上固体の量が増加しない時に反応を終了、沈殿物を濾過分離し、水、エタノールで洗浄してくれる。得られた固体は加熱乾燥して27.3g(80%)の3A−Brを得た。
中間体1(4-Bromo-2-nitrobiphenyl)の合成
1Lの丸底フラスコにα-Tetralone(21.6g、148mmol)、4-bromophenylhydrazinechloride(20.4g、91mmol)を少量のアセト酸を入れてエタノール300mLに4時間の間窒素大気状態で還流させた。反応完了後、常温に冷却させた後、形成された沈殿物を濾過し乾燥して中間体1を19.6g(86%)得た。
1Lの丸底フラスコに中間体1(24.1g、80.5mmol)、tetrachloro-1,4-benzoquione(27.45g、111.7mmol)、xyleneを入れて窒素大気状態で還流させた。反応が完了すれば、10%NaOH水溶液で反応を終了させた後、メチレンクロライドと水、brineを用いて抽出し、MgSO4で有機層を乾燥する。有機溶液を濃縮させ、EtOHで再結晶して中間体2を22.9g(96%)得た。
中間体2(20g、67.53mmol)、iodobenzene(27.6g、135.06mmol)、K2CO3(28g、202.59mmol)、Cu powder(4.3g、67.53mmol)、18-crown-6(8.92g、33.77mmol)、o-dichlorobenzene(415mL)を上記1D−Br−2合成方法と同一に進行して、17.1g(68%)を得た。
中間体1:9-(5-bromo-2-nitrophenyle)phenanthreneの合成
中間体1:9-(4-bromo-2-nitrophenyl)phenanthreneの合成
1a〜3aの合成例示
丸底フラスコに1番の化合物(1.2当量)、アミン化合物(1当量)、Pd2(dba)3(0.05mmol)、PPh3(0.1当量)、NaOt−Bu(3当量)、toluene(10.5mL/1mmol)を入れた後、100℃で反応を進行する。反応が完了すれば、etherと水で抽出した後、有機層をMgSO4で乾燥し濃縮した後、生成された有機物をsilicagel column及び再結晶して生成物を得た。
丸底フラスコに2−1の化合物(1当量)、Bis(pinacolato)diboron(1当量)、Pd(dppf)Cl2(0.03当量)、KOAc(3当量)、DMF(6.3mL/1mmol)を入れた後、130℃で加熱、還流反応を進行する。
丸底フラスコに2−2の化合物(1当量)、Br−L−Br(1.1当量)、Pd(PPh3)4(0.03〜0.05当量)、NaOH(3当量)、THF(3mL/1mmol)、水(1.5mL/1mmol)を入れる。
1-Bromo-4-iodobenzene(16.97g、60mmol)、dibiphenyl-d10-4-amine(16.57g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17g(収率:70%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、dibiphenyl-d5-4-amine(16.32g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して16.4g(収率:68%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、N-phenylbiphenyl-d5-4-amine(12.52g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して14.6g(収率:72%)の生成物を得た。
1,4-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d10-4-amine(16.57g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17.4g(収率:65%)の生成物を得た。
1,4-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d5-4-amine(16.32g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して16.5g(収率:62%)の生成物を得た。
1,4-dibromonaphthalene(17.2g、60mmol)、N-phenylbiphenyl-d5-4-amine(12.52g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して14.6g(収率:64%)の生成物を得た。
1,5-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d10-4-amine(16.57g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して18g(収率:67%)の生成物を得た。
1,5-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d5-4-amine(16.32g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17g(収率:64%)の生成物を得た。
1,5-dibromonaphthalene(17.2g、60mmol)、N-phenylbiphenyl-d5-4-amine(12.52g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して14.8g(収率:65%)の生成物を得た。
2,6-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d10-4-amine(16.57g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17.7g(収率:66%)の生成物を得た。
2,6-dibromonaphthalene(17.2g、60mmol)、dibiphenyl-d5-4-amine(16.32g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17.6g(収率:66%)の生成物を得た。
2,6-dibromonaphthalene(17.2g、60mmol)、N-phenylbiphenyl-d5-4-amine(12.52g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して14.6g(収率:64%)の生成物を得た。
2,5-dibromothiophene(14.5g、60mmol)、dibiphenyl-d10-4-amine(16.57g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して15.5g(収率:63%)の生成物を得た。
2,5-dibromothiophene(14.5g、60mmol)、dibiphenyl-d5-4-amine(16.32g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して15.6g(収率:64%)の生成物を得た。
2,5-dibromothiophene(14.5g、60mmol)、N-phenylbiphenyl-d5-4-amine(12.52g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して13.2g(収率:64%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、amine誘導体(20.63g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して20.7g(収率:73%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、amine誘導体(20.4g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して20g(収率:71%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、amine誘導体(16.6g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して17.5g(収率:72%)の生成物を得た。
1-Bromo-4-iodobenzene(16.97g、60mmol)、amine誘導体(20.1g、50mmol)、Pd2(dba)3(2.3g、2.5mmol)、PPh3(1.31g、5mmol)、NaOt−Bu(14.42g、150mmol)、toluene(525mL)を上記2−1の合成法を使用して20.1g(収率:72%)の生成物を得た。
丸底フラスコに3a−B(OH)2、または4a−B(OH)2または5a−B(OH)2の化合物(1当量)、2−1化合物または2−3の化合物(1.1当量)、Pd(PPh3)4(0.03〜0.05当量)、NaOH(3当量)、THF(3mL/1mmol)、水(1.5mL/1mmol)を入れる。
本発明の化合物を正孔輸送層に測定した場合、比較のために本発明の化合物の代りに以下の化学式で表示される化合物を正孔輸送物質として使用して比較実験した。
Claims (8)
- 以下の化学式のうちの1つで表示される化合物。
(1)R1乃至R7は各々独立的に、水素原子;
ハロゲン、アミノ基、ニトリル基、ニトロ基、C1〜C20のアルキル基、C1〜C20のアルコキシ基、C1〜C20のアルキルアミン基、C1〜C20のアルキルチオフェン基、C6〜C20のアリルチオフェン基、C2〜C20のアルケニル基、C2〜C20のアルキニル基、C3〜C20のシクロアルキル基、C6〜C60のアリル基、C8〜C20のアリルアルケニル基、シラン基、硼素基、ゲルマニウム基、及びC2〜C20のヘテロ環基からなる群から選択された1つ以上の置換基に置換または非置換されたC6〜C60のアリル基;
ハロゲン基、C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C6〜C20のアリルアミン基、C6〜C60のアリル基、C7〜C20のアリルアルキル基、C8〜C20のアリルアルケニル基、C2〜C20のヘテロ環基、ニトリル基、及びアセチレン基からなる群から選択された1つ以上の置換基に置換または非置換され、O、N、Sを少なくとも1つ含むC3〜C60のヘテロアリル基;
ハロゲン基、アミノ基、ニトリル基、ニトロ基、C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C3〜C30のシクロアルキル基、C2〜C30のヘテロシクロアルキル基、C6〜C60のアリル基、C3〜C60のヘテロアリル基からなる群から選択された1つ以上の置換基に置換または非置換されたC1〜C30のアルコキシ基;
ハロゲン基、アミノ基、ニトリル基、ニトロ基、C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C3〜C30のシクロアルキル基、C2〜C30のヘテロシクロアルキル基、C6〜C60のアリル基、C3〜C60のヘテロアリル基からなる群から選択された1つ以上の置換基に置換または非置換されたC6〜C30のアリルオキシ基;
ハロゲン基、アミノ基、ニトリル基、ニトロ基、C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C3〜C30のシクロアルキル基、C2〜C30のヘテロシクロアルキル基、C6〜C60のアリル基、C3〜C60のヘテロアリル基からなる群から選択された1つ以上の置換基に置換または非置換されたC6〜C60のアリルアミン基;及び、
C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C6〜C20のアリル基、C7〜C20のアリルアルキル基、C8〜C20のアリルアルケニル基、C2〜C20のヘテロ環基、ニトリル基、及びアセチレン基からなる群から選択された置換基に置換または非置換されたC1〜C50のアルキル基からなる群から選択され、
R1〜R7は隣り合う基と互いに結合して飽和または不飽和環を形成し、
(2)Lはニトロ基、ニトリル基、ハロゲン、アルキル基、アルコキシ基、及びアミノ基からなる群から選択された1つ以上の置換基に置換または非置換されたC6〜C60のアリレン基;またはニトロ基、ニトリル基、ハロゲン、アルキル基、アルコキシ基、及びアミノ基からなる群から選択された1つ以上の置換基に置換または非置換されたC3〜C60のヘテロアリレン基であり、
(3)Dは重水素または三重水素であり、
(4)XはCR'R"、NR'、O、及びSからなるグループから選択され、ここで、R'、R"は各々独立的に水素原子;C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C6〜C20のアリル基、C7〜C20のアリルアルキル基、C8〜C20のアリルアルケニル基、C2〜C20のヘテロ環基、ニトリル基、及びアセチレン基からなる群から選択された置換基に置換または非置換されたC1〜C50のアルキル基;ハロゲン、アミノ基、ニトリル基、ニトロ基、C1〜C20のアルキル基、C1〜C20のアルコキシ基、C1〜C20のアルキルアミン基、C1〜C20のアルキルチオフェン基、C6〜C20のアリルチオフェン基、C2〜C20のアルケニル基、C2〜C20のアルキニル基、C3〜C20のシクロアルキル基、C6〜C60のアリル基、C8〜C20のアリルアルケニル基、シラン基、硼素基、ゲルマニウム基、C2〜C20のヘテロ環基からなる群から選択される1つ以上の置換基に置換または非置換されたC6〜C60のアリル基;ハロゲン基、C1〜C20のアルキル基、C2〜C20のアルケニル基、C1〜C20のアルコキシ基、C6〜C20のアリルアミン基、C6〜C60のアリル基、C7〜C20のアリルアルキル基、C8〜C20のアリルアルケニル基、C2〜C20のヘテロ環基、ニトリル基、及びアセチレン基からなる群から1つ以上の置換基に置換または非置換され、O、N、Sを少なくとも1つ含むC2〜C60がヘテロ環基であり、
(5)aは1〜5の整数であり、b、h、j、kは1〜4の整数であり、cは0〜2の整数であり、dとeは0〜5の整数であり、fとgは0〜3の整数であり、iとlは1〜3の整数であり、d+e=1以上であり、f+g=1以上である。 - 請求項1の化合物を含む1層以上の有機物層を含む有機電気素子。
- 前記化合物を溶液工程(soluble process)により前記有機物層に形成することを特徴とする、請求項3に記載の有機電気素子。
- 順次的に積層された第1電極、前記有機物層、及び第2電極を含む有機電界発光素子であることを特徴とする、請求項3に記載の有機電気素子。
- 有機物層は、正孔注入層、正孔輸送層、発光層、電子輸送層、及び電子注入層のうち、少なくとも1つであることを特徴とする、請求項5に記載の有機電気素子。
- 請求項3の有機電気素子を含むディスプレイ装置と、
前記ディスプレイ装置を駆動する制御部と、
を含む電子装置。 - 前記有機電気素子は、有機電界発光素子(OLED)、有機太陽電池、有機感光体(OPC)ドラム、及び有機トランジスタ(有機TFT)のうち、少なくとも1つであることを特徴とする、請求項7に記載の電子装置。
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JP2017034270A (ja) * | 2011-05-27 | 2017-02-09 | 株式会社半導体エネルギー研究所 | 発光素子、発光装置、電子機器、照明装置 |
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JP2014527067A (ja) * | 2011-09-09 | 2014-10-09 | エルジー・ケム・リミテッド | 有機発光素子材料およびこれを利用した有機発光素子 |
JP2014531421A (ja) * | 2011-09-09 | 2014-11-27 | エルジー・ケム・リミテッド | 有機発光素子材料およびこれを利用した有機発光素子 |
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JP2016076566A (ja) * | 2014-10-06 | 2016-05-12 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 有機エレクトロルミネッセンス素子用材料及びそれを用いた有機エレクトロルミネッセンス素子 |
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KR20240001140A (ko) | 2021-04-28 | 2024-01-03 | 이데미쓰 고산 가부시키가이샤 | 화합물, 유기 전기발광 소자용 재료, 유기 전기발광 소자 및 전자 기기 |
KR20240004351A (ko) | 2021-04-28 | 2024-01-11 | 이데미쓰 고산 가부시키가이샤 | 화합물, 유기 전기발광 소자용 재료, 유기 전기발광 소자 및 전자 기기 |
Also Published As
Publication number | Publication date |
---|---|
TWI464234B (zh) | 2014-12-11 |
US20140027747A1 (en) | 2014-01-30 |
US9691990B2 (en) | 2017-06-27 |
TW201247840A (en) | 2012-12-01 |
WO2012134203A3 (ko) | 2013-01-10 |
KR20120111670A (ko) | 2012-10-10 |
JP5801468B2 (ja) | 2015-10-28 |
WO2012134203A2 (ko) | 2012-10-04 |
KR101298483B1 (ko) | 2013-08-21 |
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