JP2014526805A5 - - Google Patents

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Publication number
JP2014526805A5
JP2014526805A5 JP2014531950A JP2014531950A JP2014526805A5 JP 2014526805 A5 JP2014526805 A5 JP 2014526805A5 JP 2014531950 A JP2014531950 A JP 2014531950A JP 2014531950 A JP2014531950 A JP 2014531950A JP 2014526805 A5 JP2014526805 A5 JP 2014526805A5
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Japan
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wafer
determining
optical
simulating
model
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JP2014531950A
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Japanese (ja)
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JP2014526805A (ja
JP5959648B2 (ja
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Priority claimed from US13/411,433 external-priority patent/US8468471B2/en
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JP2014531950A 2011-09-23 2012-09-20 プロセス認識メトロロジー Active JP5959648B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161538699P 2011-09-23 2011-09-23
US61/538,699 2011-09-23
US13/411,433 2012-03-02
US13/411,433 US8468471B2 (en) 2011-09-23 2012-03-02 Process aware metrology
PCT/US2012/056272 WO2013043831A2 (en) 2011-09-23 2012-09-20 Process aware metrology

Publications (3)

Publication Number Publication Date
JP2014526805A JP2014526805A (ja) 2014-10-06
JP2014526805A5 true JP2014526805A5 (enExample) 2015-11-12
JP5959648B2 JP5959648B2 (ja) 2016-08-02

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JP2014531950A Active JP5959648B2 (ja) 2011-09-23 2012-09-20 プロセス認識メトロロジー

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US (2) US8468471B2 (enExample)
EP (1) EP2758990B1 (enExample)
JP (1) JP5959648B2 (enExample)
KR (1) KR102060209B1 (enExample)
IL (1) IL231667B (enExample)
WO (1) WO2013043831A2 (enExample)

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