JP2017527780A5 - - Google Patents
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- JP2017527780A5 JP2017527780A5 JP2016575210A JP2016575210A JP2017527780A5 JP 2017527780 A5 JP2017527780 A5 JP 2017527780A5 JP 2016575210 A JP2016575210 A JP 2016575210A JP 2016575210 A JP2016575210 A JP 2016575210A JP 2017527780 A5 JP2017527780 A5 JP 2017527780A5
- Authority
- JP
- Japan
- Prior art keywords
- different
- aperture
- collection
- images
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462017264P | 2014-06-26 | 2014-06-26 | |
| US62/017,264 | 2014-06-26 | ||
| US201562111402P | 2015-02-03 | 2015-02-03 | |
| US62/111,402 | 2015-02-03 | ||
| US14/749,564 | 2015-06-24 | ||
| US14/749,564 US9709510B2 (en) | 2014-06-26 | 2015-06-24 | Determining a configuration for an optical element positioned in a collection aperture during wafer inspection |
| PCT/US2015/038115 WO2015200856A1 (en) | 2014-06-26 | 2015-06-26 | Determining a configuration for an optical element positioned in a collection aperture during wafer inspection |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017527780A JP2017527780A (ja) | 2017-09-21 |
| JP2017527780A5 true JP2017527780A5 (enExample) | 2018-07-26 |
| JP6652511B2 JP6652511B2 (ja) | 2020-02-26 |
Family
ID=54930191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016575210A Active JP6652511B2 (ja) | 2014-06-26 | 2015-06-26 | ウェハ検査中に集光アパーチャ内に位置付けられる光学要素の構成の決定 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9709510B2 (enExample) |
| JP (1) | JP6652511B2 (enExample) |
| KR (1) | KR102269512B1 (enExample) |
| CN (2) | CN106415249B (enExample) |
| IL (1) | IL248647B (enExample) |
| WO (1) | WO2015200856A1 (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10062156B2 (en) | 2016-02-25 | 2018-08-28 | Kla-Tencor Corporation | Method and system for detecting defects on a substrate |
| IL266774B2 (en) * | 2016-11-23 | 2024-03-01 | Nova Ltd | Optical system and method for measuring parameters of patterned structures in microelectronic devices |
| US10429315B2 (en) * | 2017-07-18 | 2019-10-01 | Samsung Electronics Co., Ltd. | Imaging apparatus and imaging method |
| JP7115826B2 (ja) * | 2017-07-18 | 2022-08-09 | 三星電子株式会社 | 撮像装置および撮像方法 |
| CN109425619B (zh) * | 2017-08-31 | 2021-12-28 | 深圳中科飞测科技股份有限公司 | 光学测量系统及方法 |
| CN109425618B (zh) * | 2017-08-31 | 2021-12-28 | 深圳中科飞测科技股份有限公司 | 光学测量系统及方法 |
| US10607119B2 (en) * | 2017-09-06 | 2020-03-31 | Kla-Tencor Corp. | Unified neural network for defect detection and classification |
| KR102633672B1 (ko) * | 2017-11-15 | 2024-02-05 | 코닝 인코포레이티드 | 유리 시트들 상의 표면 결함들을 검출하기 위한 방법들 및 장치 |
| US11067389B2 (en) | 2018-03-13 | 2021-07-20 | Kla Corporation | Overlay metrology system and method |
| WO2020074250A1 (en) | 2018-10-12 | 2020-04-16 | Asml Netherlands B.V. | Detection system for an alignment sensor |
| US10902582B2 (en) * | 2019-01-17 | 2021-01-26 | Applied Materials Israel, Ltd. | Computerized system and method for obtaining information about a region of an object |
| US11815470B2 (en) | 2019-01-17 | 2023-11-14 | Applied Materials Israel, Ltd. | Multi-perspective wafer analysis |
| CN110006684A (zh) * | 2019-03-13 | 2019-07-12 | 广州金域医学检验中心有限公司 | 数字病理切片的生成系统和方法 |
| WO2020203592A1 (ja) * | 2019-03-29 | 2020-10-08 | 国立大学法人大阪大学 | 光検出装置、光検出方法、光検出装置の設計方法、試料分類方法、及び、不良検出方法 |
| NL2025265A (en) | 2019-05-06 | 2020-11-23 | Asml Netherlands Bv | Dark field microscope |
| US10921261B2 (en) | 2019-05-09 | 2021-02-16 | Kla Corporation | Strontium tetraborate as optical coating material |
| US11011366B2 (en) | 2019-06-06 | 2021-05-18 | Kla Corporation | Broadband ultraviolet illumination sources |
| US11255797B2 (en) | 2019-07-09 | 2022-02-22 | Kla Corporation | Strontium tetraborate as optical glass material |
| WO2021091634A1 (en) | 2019-11-04 | 2021-05-14 | Tokyo Electron Limited | System and method to calibrate a plurality of wafer inspection system (wis) modules |
| US11624607B2 (en) | 2020-01-06 | 2023-04-11 | Tokyo Electron Limited | Hardware improvements and methods for the analysis of a spinning reflective substrates |
| JP7671558B2 (ja) | 2020-03-10 | 2025-05-02 | 東京エレクトロン株式会社 | トラックシステムに統合するための長波赤外線熱センサ |
| US11738363B2 (en) | 2021-06-07 | 2023-08-29 | Tokyo Electron Limited | Bath systems and methods thereof |
| US12488452B2 (en) | 2021-06-16 | 2025-12-02 | Tokyo Electron Limited | Wafer bath imaging |
| US12072606B2 (en) | 2021-07-30 | 2024-08-27 | Kla Corporation | Protective coating for nonlinear optical crystal |
| KR102695451B1 (ko) * | 2021-12-03 | 2024-08-23 | 참엔지니어링(주) | 하전입자를 이용한 시료 처리 장치 |
| US11899338B2 (en) | 2021-12-11 | 2024-02-13 | Kla Corporation | Deep ultraviolet laser using strontium tetraborate for frequency conversion |
| WO2024056296A1 (en) * | 2022-09-13 | 2024-03-21 | Asml Netherlands B.V. | Metrology method and associated metrology device |
| EP4339703A1 (en) * | 2022-09-13 | 2024-03-20 | ASML Netherlands B.V. | Metrology method and associated metrology device |
| US20250383294A1 (en) * | 2024-06-18 | 2025-12-18 | Kla Corporation | Speckle noise reduction using pupil masks |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7957066B2 (en) * | 2003-02-21 | 2011-06-07 | Kla-Tencor Corporation | Split field inspection system using small catadioptric objectives |
| US7041998B2 (en) | 2003-03-24 | 2006-05-09 | Photon Dynamics, Inc. | Method and apparatus for high-throughput inspection of large flat patterned media using dynamically programmable optical spatial filtering |
| US20060012781A1 (en) | 2004-07-14 | 2006-01-19 | Negevtech Ltd. | Programmable spatial filter for wafer inspection |
| US7502101B2 (en) * | 2005-02-25 | 2009-03-10 | Nanometrics Incorporated | Apparatus and method for enhanced critical dimension scatterometry |
| JP4625716B2 (ja) * | 2005-05-23 | 2011-02-02 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| US7345825B2 (en) * | 2005-06-30 | 2008-03-18 | Kla-Tencor Technologies Corporation | Beam delivery system for laser dark-field illumination in a catadioptric optical system |
| US7345754B1 (en) | 2005-09-16 | 2008-03-18 | Kla-Tencor Technologies Corp. | Fourier filters and wafer inspection systems |
| US8711346B2 (en) * | 2009-06-19 | 2014-04-29 | Kla-Tencor Corporation | Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| KR20110055787A (ko) | 2009-11-20 | 2011-05-26 | 재단법인 서울테크노파크 | 레이저를 이용한 접합웨이퍼 검사장치 |
| CN103201682B (zh) * | 2010-11-12 | 2015-06-17 | Asml荷兰有限公司 | 量测方法和设备、光刻系统和器件制造方法 |
| US9223227B2 (en) | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
| WO2012126684A1 (en) * | 2011-03-24 | 2012-09-27 | Asml Netherlands B.V. | Substrate and patterning device for use in metrology, metrology method and device manufacturing method |
| AU2012322965B2 (en) * | 2011-10-12 | 2015-07-16 | Ventana Medical Systems, Inc. | Polyfocal interferometric image acquisition |
| US8614790B2 (en) * | 2011-12-12 | 2013-12-24 | Applied Materials Israel, Ltd. | Optical system and method for inspection of patterned samples |
| JP6345125B2 (ja) * | 2012-03-07 | 2018-06-20 | ケーエルエー−テンカー コーポレイション | ウェハおよびレチクル検査システムならびに照明瞳配置を選択するための方法 |
| WO2013143814A1 (en) * | 2012-03-27 | 2013-10-03 | Asml Netherlands B.V. | Metrology method and apparatus, lithographic system and device manufacturing method |
| US8896827B2 (en) | 2012-06-26 | 2014-11-25 | Kla-Tencor Corporation | Diode laser based broad band light sources for wafer inspection tools |
| KR101442792B1 (ko) | 2012-08-31 | 2014-09-23 | (주)유텍시스템 | 사파이어 웨이퍼의 검사 방법 |
| US9075027B2 (en) * | 2012-11-21 | 2015-07-07 | Kla-Tencor Corporation | Apparatus and methods for detecting defects in vertical memory |
| US9091650B2 (en) * | 2012-11-27 | 2015-07-28 | Kla-Tencor Corporation | Apodization for pupil imaging scatterometry |
| US9726617B2 (en) * | 2013-06-04 | 2017-08-08 | Kla-Tencor Corporation | Apparatus and methods for finding a best aperture and mode to enhance defect detection |
-
2015
- 2015-06-24 US US14/749,564 patent/US9709510B2/en active Active
- 2015-06-26 JP JP2016575210A patent/JP6652511B2/ja active Active
- 2015-06-26 CN CN201580029498.7A patent/CN106415249B/zh active Active
- 2015-06-26 CN CN201810473396.XA patent/CN108508028B/zh active Active
- 2015-06-26 WO PCT/US2015/038115 patent/WO2015200856A1/en not_active Ceased
- 2015-06-26 KR KR1020177000065A patent/KR102269512B1/ko active Active
-
2016
- 2016-10-31 IL IL248647A patent/IL248647B/en active IP Right Grant
-
2017
- 2017-06-18 US US15/626,123 patent/US10215713B2/en active Active
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