JP2014510404A5 - - Google Patents

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Publication number
JP2014510404A5
JP2014510404A5 JP2013556718A JP2013556718A JP2014510404A5 JP 2014510404 A5 JP2014510404 A5 JP 2014510404A5 JP 2013556718 A JP2013556718 A JP 2013556718A JP 2013556718 A JP2013556718 A JP 2013556718A JP 2014510404 A5 JP2014510404 A5 JP 2014510404A5
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JP
Japan
Prior art keywords
laser
light emitter
light source
source
euv light
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JP2013556718A
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English (en)
Japanese (ja)
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JP5819993B2 (ja
JP2014510404A (ja
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Priority claimed from US13/088,166 external-priority patent/US8633459B2/en
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Publication of JP2014510404A publication Critical patent/JP2014510404A/ja
Publication of JP2014510404A5 publication Critical patent/JP2014510404A5/ja
Application granted granted Critical
Publication of JP5819993B2 publication Critical patent/JP5819993B2/ja
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JP2013556718A 2011-03-02 2012-02-21 Ｅｕｖ光源内の光学系洗浄のためのシステム及び方法 Active JP5819993B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161464278P 2011-03-02 2011-03-02
US61/464,278 2011-03-02
US13/088,166 US8633459B2 (en) 2011-03-02 2011-04-15 Systems and methods for optics cleaning in an EUV light source
US13/088,166 2011-04-15
PCT/US2012/025963 WO2012118644A1 (en) 2011-03-02 2012-02-21 Systems and methods for optics cleaning in an euv light source

Publications (3)

Publication Number Publication Date
JP2014510404A JP2014510404A (ja) 2014-04-24
JP2014510404A5 true JP2014510404A5 (enExample) 2015-04-09
JP5819993B2 JP5819993B2 (ja) 2015-11-24

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JP2013556718A Active JP5819993B2 (ja) 2011-03-02 2012-02-21 Ｅｕｖ光源内の光学系洗浄のためのシステム及び方法

Country Status (6)

Country Link
US (2) US8633459B2 (enExample)
EP (1) EP2681164A4 (enExample)
JP (1) JP5819993B2 (enExample)
KR (1) KR101909546B1 (enExample)
TW (1) TWI573495B (enExample)
WO (1) WO2012118644A1 (enExample)

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NL2022644A (en) * 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
JP6913060B2 (ja) * 2018-07-24 2021-08-04 株式会社日立ハイテク プラズマ処理装置及びプラズマ処理方法
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
US11259394B2 (en) * 2019-11-01 2022-02-22 Kla Corporation Laser produced plasma illuminator with liquid sheet jet target
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TWI785447B (zh) * 2020-12-29 2022-12-01 台灣積體電路製造股份有限公司 極紫外光設備與其運作方法
US11543757B2 (en) * 2021-04-20 2023-01-03 Kla Corporation System and method for optical-path coupling of light for in-situ photochemical cleaning in projection imaging systems
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KR20230171945A (ko) * 2021-04-26 2023-12-21 에이에스엠엘 네델란즈 비.브이. 세정 방법 및 연관된 조명 소스 메트롤로지 장치
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JP7607701B2 (ja) * 2023-04-28 2024-12-27 レーザーテック株式会社 光学装置及び光学装置の汚染防止方法

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