JP2011530823A5 - - Google Patents
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- Publication number
- JP2011530823A5 JP2011530823A5 JP2011522453A JP2011522453A JP2011530823A5 JP 2011530823 A5 JP2011530823 A5 JP 2011530823A5 JP 2011522453 A JP2011522453 A JP 2011522453A JP 2011522453 A JP2011522453 A JP 2011522453A JP 2011530823 A5 JP2011530823 A5 JP 2011530823A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- lithographic apparatus
- radiation beam
- hydrogen
- projection system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 claims 37
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 8
- 239000001257 hydrogen Substances 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 238000005286 illumination Methods 0.000 claims 6
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000000203 mixture Substances 0.000 claims 5
- 238000000059 patterning Methods 0.000 claims 5
- 239000011261 inert gas Substances 0.000 claims 4
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 2
- 230000003750 conditioning effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13612908P | 2008-08-14 | 2008-08-14 | |
| US13613008P | 2008-08-14 | 2008-08-14 | |
| US61/136,130 | 2008-08-14 | ||
| US61/136,129 | 2008-08-14 | ||
| US19337308P | 2008-11-21 | 2008-11-21 | |
| US61/193,373 | 2008-11-21 | ||
| PCT/EP2009/058898 WO2010018039A1 (en) | 2008-08-14 | 2009-07-13 | Radiation source, lithographic apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011530823A JP2011530823A (ja) | 2011-12-22 |
| JP2011530823A5 true JP2011530823A5 (enExample) | 2012-08-30 |
| JP5732393B2 JP5732393B2 (ja) | 2015-06-10 |
Family
ID=41110410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011522453A Active JP5732393B2 (ja) | 2008-08-14 | 2009-07-13 | リソグラフィ装置、およびデバイス製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8685632B2 (enExample) |
| JP (1) | JP5732393B2 (enExample) |
| KR (1) | KR101626012B1 (enExample) |
| CN (1) | CN102119366B (enExample) |
| NL (1) | NL2003152A1 (enExample) |
| WO (1) | WO2010018039A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8587768B2 (en) * | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
| DE102010038697B4 (de) * | 2010-07-30 | 2012-07-19 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie |
| US9594306B2 (en) | 2011-03-04 | 2017-03-14 | Asml Netherlands B.V. | Lithographic apparatus, spectral purity filter and device manufacturing method |
| US8916831B2 (en) | 2011-03-16 | 2014-12-23 | Kla-Tencor Corporation | EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating |
| CN103718654B (zh) * | 2011-08-05 | 2016-04-20 | Asml荷兰有限公司 | 辐射源和用于光刻设备的方法和器件制造方法 |
| NL2011237A (en) * | 2012-08-03 | 2014-02-04 | Asml Netherlands Bv | Lithographic apparatus and method. |
| EP3257054B1 (en) * | 2015-02-10 | 2019-10-16 | Carl Zeiss SMT GmbH | Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror |
| CN114556225A (zh) * | 2019-10-15 | 2022-05-27 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
| JP6919699B2 (ja) | 2019-11-28 | 2021-08-18 | 凸版印刷株式会社 | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP7421411B2 (ja) | 2020-04-30 | 2024-01-24 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
| WO2021221123A1 (ja) | 2020-04-30 | 2021-11-04 | 凸版印刷株式会社 | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP7525354B2 (ja) | 2020-09-28 | 2024-07-30 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP7538050B2 (ja) | 2021-01-08 | 2024-08-21 | 株式会社トッパンフォトマスク | 反射型フォトマスクブランク及び反射型フォトマスク |
| JP7614949B2 (ja) | 2021-06-02 | 2025-01-16 | テクセンドフォトマスク株式会社 | 反射型フォトマスクブランク及び反射型フォトマスク |
| DE102022212168A1 (de) | 2022-11-16 | 2024-05-16 | Carl Zeiss Smt Gmbh | EUV-Optik-Modul für eine EUV-Projektionsbelichtungsanlage |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG139554A1 (en) * | 2002-12-20 | 2008-02-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| TWI264620B (en) | 2003-03-07 | 2006-10-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US8094288B2 (en) * | 2004-05-11 | 2012-01-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2006011105A2 (en) * | 2004-07-22 | 2006-02-02 | Philips Intellectual Property & Standards Gmbh | Optical system having a cleaning arrangement |
| US7453645B2 (en) * | 2004-12-30 | 2008-11-18 | Asml Netherlands B.V. | Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
| US7518128B2 (en) * | 2006-06-30 | 2009-04-14 | Asml Netherlands B.V. | Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned |
| US7473908B2 (en) * | 2006-07-14 | 2009-01-06 | Asml Netherlands B.V. | Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface |
| DE102006054726B4 (de) | 2006-11-21 | 2014-09-11 | Asml Netherlands B.V. | Verfahren zum Entfernen von Kontaminationen auf optischen Oberflächen und optische Anordnung |
| NL2004787A (en) * | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter. |
-
2009
- 2009-07-08 NL NL2003152A patent/NL2003152A1/nl not_active Application Discontinuation
- 2009-07-13 CN CN200980131416.4A patent/CN102119366B/zh active Active
- 2009-07-13 WO PCT/EP2009/058898 patent/WO2010018039A1/en not_active Ceased
- 2009-07-13 US US13/058,788 patent/US8685632B2/en active Active
- 2009-07-13 KR KR1020117005827A patent/KR101626012B1/ko active Active
- 2009-07-13 JP JP2011522453A patent/JP5732393B2/ja active Active
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