JP2014531704A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2014531704A5 JP2014531704A5 JP2014527556A JP2014527556A JP2014531704A5 JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5 JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014527556 A JP2014527556 A JP 2014527556A JP 2014531704 A5 JP2014531704 A5 JP 2014531704A5
- Authority
- JP
- Japan
- Prior art keywords
- seed laser
- beam splitter
- laser beam
- radiation source
- optical amplifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 16
- 230000005855 radiation Effects 0.000 claims 16
- 230000003321 amplification Effects 0.000 claims 4
- 238000003199 nucleic acid amplification method Methods 0.000 claims 4
- 239000000446 fuel Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161530782P | 2011-09-02 | 2011-09-02 | |
| US61/530,782 | 2011-09-02 | ||
| PCT/EP2012/064775 WO2013029895A1 (en) | 2011-09-02 | 2012-07-27 | Radiation source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014531704A JP2014531704A (ja) | 2014-11-27 |
| JP2014531704A5 true JP2014531704A5 (enExample) | 2015-09-10 |
| JP6047573B2 JP6047573B2 (ja) | 2016-12-21 |
Family
ID=46640658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014527556A Active JP6047573B2 (ja) | 2011-09-02 | 2012-07-27 | 放射源 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9516732B2 (enExample) |
| JP (1) | JP6047573B2 (enExample) |
| TW (1) | TWI586222B (enExample) |
| WO (1) | WO2013029895A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU1328597A (en) | 1995-11-30 | 1997-06-19 | Virtual Technologies, Inc. | Tactile feedback man-machine interface device |
| CN104577685B (zh) * | 2015-01-04 | 2017-10-20 | 中国科学院上海光学精密机械研究所 | 光纤激光双程泵浦1.2μm波段范围激光器 |
| NL2016111A (en) * | 2015-02-19 | 2016-09-30 | Asml Netherlands Bv | Radiation Source. |
| US10048199B1 (en) * | 2017-03-20 | 2018-08-14 | Asml Netherlands B.V. | Metrology system for an extreme ultraviolet light source |
| US10524345B2 (en) | 2017-04-28 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Residual gain monitoring and reduction for EUV drive laser |
| CN110692283B (zh) * | 2017-05-30 | 2023-09-19 | Asml荷兰有限公司 | 辐射源 |
| WO2018231344A1 (en) * | 2017-06-12 | 2018-12-20 | Uniqarta, Inc. | Parallel assembly of discrete components onto a substrate |
| US12444901B2 (en) * | 2020-04-09 | 2025-10-14 | Asml Netherlands B.V. | Seed laser system for radiation source |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4194813A (en) * | 1978-10-13 | 1980-03-25 | The United States Of America As Represented By The United States Department Of Energy | Vacuum aperture isolator for retroreflection from laser-irradiated target |
| US5790574A (en) * | 1994-08-24 | 1998-08-04 | Imar Technology Company | Low cost, high average power, high brightness solid state laser |
| US6999491B2 (en) | 1999-10-15 | 2006-02-14 | Jmar Research, Inc. | High intensity and high power solid state laser amplifying system and method |
| US7491954B2 (en) * | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US7372056B2 (en) * | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
| US7087914B2 (en) | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
| FR2871622B1 (fr) | 2004-06-14 | 2008-09-12 | Commissariat Energie Atomique | Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet |
| JP2006172898A (ja) | 2004-12-15 | 2006-06-29 | National Institute Of Advanced Industrial & Technology | レーザープラズマｘ線発生装置 |
| US7308007B2 (en) | 2004-12-23 | 2007-12-11 | Colorado State University Research Foundation | Increased laser output energy and average power at wavelengths below 35 nm |
| CN101002305A (zh) | 2005-01-12 | 2007-07-18 | 株式会社尼康 | 激光等离子euv光源、靶材构件、胶带构件、靶材构件的制造方法、靶材的提供方法以及euv曝光装置 |
| JP2006228998A (ja) | 2005-02-18 | 2006-08-31 | Komatsu Ltd | 極端紫外線光源装置 |
| US7999915B2 (en) | 2005-11-01 | 2011-08-16 | Cymer, Inc. | Laser system |
| US7289263B1 (en) | 2006-08-02 | 2007-10-30 | Coherent, Inc. | Double-pass fiber amplifier |
| US20080181266A1 (en) | 2007-01-26 | 2008-07-31 | Institut National D'optique | Enhanced seeded pulsed fiber laser source |
| NL1036272A1 (nl) * | 2007-12-19 | 2009-06-22 | Asml Netherlands Bv | Radiation source, lithographic apparatus and device manufacturing method. |
| US7903697B2 (en) | 2008-01-16 | 2011-03-08 | Pyrophotonics Lasers Inc. | Method and system for tunable pulsed laser source |
| US8283643B2 (en) * | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
| WO2011066440A1 (en) | 2009-11-24 | 2011-06-03 | Applied Energetics Inc. | Axial and off axis walk off multi-pass amplifiers |
| US9113540B2 (en) | 2010-02-19 | 2015-08-18 | Gigaphoton Inc. | System and method for generating extreme ultraviolet light |
| JP5722061B2 (ja) | 2010-02-19 | 2015-05-20 | ギガフォトン株式会社 | 極端紫外光源装置及び極端紫外光の発生方法 |
| US8587768B2 (en) * | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
-
2012
- 2012-07-27 US US14/241,986 patent/US9516732B2/en active Active
- 2012-07-27 WO PCT/EP2012/064775 patent/WO2013029895A1/en not_active Ceased
- 2012-07-27 JP JP2014527556A patent/JP6047573B2/ja active Active
- 2012-08-16 TW TW101129772A patent/TWI586222B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2014531704A5 (enExample) | ||
| TWI636709B (zh) | 極紫外線(euv)光源及產生euv光之方法 | |
| JP2014510377A5 (enExample) | ||
| JP2016522887A5 (enExample) | ||
| CN105190776B (zh) | 用于极紫外光源的标靶 | |
| JP2013524464A5 (enExample) | ||
| TWI787648B (zh) | 產生極紫外（ｅｕｖ）光之方法與系統及相關之ｅｕｖ光源 | |
| JP2017510823A5 (enExample) | ||
| JP2016512913A5 (enExample) | ||
| WO2012125287A3 (en) | Drive laser delivery systems for euv light source | |
| MX2018011468A (es) | Dispositivo para fumar y metodo para generar aerosol. | |
| JP2010539700A5 (enExample) | ||
| JP2015511769A5 (enExample) | ||
| WO2012107815A3 (en) | Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light | |
| RU2015123440A (ru) | Анализ образцов для масс-цитометрии | |
| JP2014534559A5 (ja) | 放射源およびリソグラフィ装置 | |
| MX360043B (es) | Dispositivo y procedimiento de marcado laser de una lentilla oftalmica con un pulso laser de longitud de onda y energia por pulsos seleccionados. | |
| US9713240B2 (en) | Stabilizing EUV light power in an extreme ultraviolet light source | |
| JP2011530823A5 (enExample) | ||
| JP2012074388A5 (ja) | 放射源、リソグラフィ装置、並びに放射源又はリソグラフィ装置を用いる方法 | |
| JP2015502665A5 (enExample) | ||
| IN2012DN02446A (enExample) | ||
| WO2017189193A1 (en) | Reducing the effect of plasma on an object in an extreme ultraviolet light source | |
| CN109792831A (zh) | 在极紫外光源中的靶轨迹量测 | |
| WO2012024341A3 (en) | Energy emitting device |