JP2010534946A5 - - Google Patents

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Publication number
JP2010534946A5
JP2010534946A5 JP2010518550A JP2010518550A JP2010534946A5 JP 2010534946 A5 JP2010534946 A5 JP 2010534946A5 JP 2010518550 A JP2010518550 A JP 2010518550A JP 2010518550 A JP2010518550 A JP 2010518550A JP 2010534946 A5 JP2010534946 A5 JP 2010534946A5
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JP
Japan
Prior art keywords
housing
support surface
hydrogen
substrate holder
radicals
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JP2010518550A
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English (en)
Japanese (ja)
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JP5188576B2 (ja
JP2010534946A (ja
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Priority claimed from US11/882,081 external-priority patent/US7894037B2/en
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Publication of JP2010534946A5 publication Critical patent/JP2010534946A5/ja
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JP2010518550A 2007-07-30 2008-07-25 リソグラフィ装置およびデバイス製造方法 Active JP5188576B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/882,081 US7894037B2 (en) 2007-07-30 2007-07-30 Lithographic apparatus and device manufacturing method
US11/882,081 2007-07-30
PCT/EP2008/006145 WO2009015838A1 (en) 2007-07-30 2008-07-25 Lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2010534946A JP2010534946A (ja) 2010-11-11
JP2010534946A5 true JP2010534946A5 (enExample) 2011-09-08
JP5188576B2 JP5188576B2 (ja) 2013-04-24

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ID=39885050

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JP2010518550A Active JP5188576B2 (ja) 2007-07-30 2008-07-25 リソグラフィ装置およびデバイス製造方法

Country Status (7)

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US (1) US7894037B2 (enExample)
JP (1) JP5188576B2 (enExample)
KR (1) KR20100053591A (enExample)
CN (2) CN101765811B (enExample)
NL (1) NL1035732A1 (enExample)
TW (1) TW200916976A (enExample)
WO (1) WO2009015838A1 (enExample)

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US11448955B2 (en) 2018-09-27 2022-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. Mask for lithography process and method for manufacturing the same
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TWI897405B (zh) 2019-03-25 2025-09-11 日商亞多納富有限公司 半導體製造系統、其控制方法及控制該系統的電腦程式
CN110161808B (zh) * 2019-05-09 2022-02-22 上海华力微电子有限公司 光栅尺清洁装置和方法、光刻机
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JP7401396B2 (ja) * 2020-06-04 2023-12-19 キヤノン株式会社 インプリント装置、物品の製造方法、及びインプリント装置のための測定方法
CN112139151A (zh) * 2020-09-11 2020-12-29 韩山师范学院 一种大型设备表面清理装置
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CN114690570B (zh) * 2020-12-29 2025-04-25 上海微电子装备（集团）股份有限公司 光刻机、运动台定位测量系统及其工作方法
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CN114200778A (zh) * 2021-06-25 2022-03-18 四川大学 一种极紫外光刻机lpp光源收集镜的等离子体原位清洗结构
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