JP2014216630A5 - - Google Patents

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Publication number
JP2014216630A5
JP2014216630A5 JP2013095960A JP2013095960A JP2014216630A5 JP 2014216630 A5 JP2014216630 A5 JP 2014216630A5 JP 2013095960 A JP2013095960 A JP 2013095960A JP 2013095960 A JP2013095960 A JP 2013095960A JP 2014216630 A5 JP2014216630 A5 JP 2014216630A5
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JP
Japan
Prior art keywords
charged particle
shot
particle beams
substrate
stage
Prior art date
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Application number
JP2013095960A
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English (en)
Japanese (ja)
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JP6193611B2 (ja
JP2014216630A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2013095960A external-priority patent/JP6193611B2/ja
Priority to JP2013095960A priority Critical patent/JP6193611B2/ja
Priority to TW103113857A priority patent/TWI516858B/zh
Priority to KR1020140047828A priority patent/KR101790829B1/ko
Priority to US14/260,052 priority patent/US9455124B2/en
Priority to CN201410169262.0A priority patent/CN104134605B/zh
Publication of JP2014216630A publication Critical patent/JP2014216630A/ja
Publication of JP2014216630A5 publication Critical patent/JP2014216630A5/ja
Publication of JP6193611B2 publication Critical patent/JP6193611B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013095960A 2013-04-30 2013-04-30 描画装置、及び物品の製造方法 Active JP6193611B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013095960A JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法
TW103113857A TWI516858B (zh) 2013-04-30 2014-04-16 使用帶電粒子束在基板上實施繪圖的繪圖裝置及物件之製造方法
KR1020140047828A KR101790829B1 (ko) 2013-04-30 2014-04-22 묘화 장치 및 물품의 제조 방법
US14/260,052 US9455124B2 (en) 2013-04-30 2014-04-23 Drawing apparatus, and method of manufacturing article
CN201410169262.0A CN104134605B (zh) 2013-04-30 2014-04-25 绘制装置和半导体器件的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013095960A JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014216630A JP2014216630A (ja) 2014-11-17
JP2014216630A5 true JP2014216630A5 (enExample) 2016-06-23
JP6193611B2 JP6193611B2 (ja) 2017-09-06

Family

ID=51789514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013095960A Active JP6193611B2 (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法

Country Status (5)

Country Link
US (1) US9455124B2 (enExample)
JP (1) JP6193611B2 (enExample)
KR (1) KR101790829B1 (enExample)
CN (1) CN104134605B (enExample)
TW (1) TWI516858B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6289181B2 (ja) * 2013-06-26 2018-03-07 キヤノン株式会社 描画装置、及び、物品の製造方法
US9984853B2 (en) 2014-11-28 2018-05-29 Nuflare Technology, Inc. Method for generating writing data
JP6548982B2 (ja) * 2014-11-28 2019-07-24 株式会社ニューフレアテクノロジー 描画データの作成方法
JP6593090B2 (ja) * 2015-10-20 2019-10-23 株式会社ニューフレアテクノロジー 支持ケース及びマルチ荷電粒子ビーム描画装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62144323A (ja) 1985-12-19 1987-06-27 Toshiba Corp 荷電ビ−ム露光装置
JP4818501B2 (ja) * 2000-09-12 2011-11-16 三菱電機株式会社 電子ビーム露光装置
SG125922A1 (en) 2002-09-20 2006-10-30 Asml Netherlands Bv Device inspection
TWI454851B (zh) 2007-12-28 2014-10-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
JP5480496B2 (ja) 2008-03-25 2014-04-23 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置
WO2010013349A1 (ja) * 2008-08-01 2010-02-04 パイオニア株式会社 電子ビーム記録装置及びその制御装置並びに制御方法
CN103069536B (zh) 2010-04-09 2016-04-06 卡尔蔡司Smt有限责任公司 带电粒子探测系统和多小波束检查系统
JP5835892B2 (ja) * 2010-12-27 2015-12-24 キヤノン株式会社 荷電粒子線描画装置及びデバイス製造方法
JP5832141B2 (ja) 2011-05-16 2015-12-16 キヤノン株式会社 描画装置、および、物品の製造方法
JP5859778B2 (ja) * 2011-09-01 2016-02-16 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

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