JP2015198121A5 - - Google Patents

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Publication number
JP2015198121A5
JP2015198121A5 JP2014074064A JP2014074064A JP2015198121A5 JP 2015198121 A5 JP2015198121 A5 JP 2015198121A5 JP 2014074064 A JP2014074064 A JP 2014074064A JP 2014074064 A JP2014074064 A JP 2014074064A JP 2015198121 A5 JP2015198121 A5 JP 2015198121A5
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JP
Japan
Prior art keywords
moving body
scanning direction
moves
lithographic apparatus
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014074064A
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English (en)
Japanese (ja)
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JP2015198121A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014074064A priority Critical patent/JP2015198121A/ja
Priority claimed from JP2014074064A external-priority patent/JP2015198121A/ja
Priority to US14/671,898 priority patent/US9823587B2/en
Publication of JP2015198121A publication Critical patent/JP2015198121A/ja
Publication of JP2015198121A5 publication Critical patent/JP2015198121A5/ja
Pending legal-status Critical Current

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JP2014074064A 2014-03-31 2014-03-31 リソグラフィ装置、ステージ装置、及び物品の製造方法 Pending JP2015198121A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014074064A JP2015198121A (ja) 2014-03-31 2014-03-31 リソグラフィ装置、ステージ装置、及び物品の製造方法
US14/671,898 US9823587B2 (en) 2014-03-31 2015-03-27 Lithography apparatus, stage apparatus, and method of manufacturing articles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014074064A JP2015198121A (ja) 2014-03-31 2014-03-31 リソグラフィ装置、ステージ装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
JP2015198121A JP2015198121A (ja) 2015-11-09
JP2015198121A5 true JP2015198121A5 (enExample) 2017-05-18

Family

ID=54190128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014074064A Pending JP2015198121A (ja) 2014-03-31 2014-03-31 リソグラフィ装置、ステージ装置、及び物品の製造方法

Country Status (2)

Country Link
US (1) US9823587B2 (enExample)
JP (1) JP2015198121A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6316084B2 (ja) * 2014-05-01 2018-04-25 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
JP6700932B2 (ja) * 2016-04-20 2020-05-27 キヤノン株式会社 検出装置、検出方法、プログラム、リソグラフィ装置、および物品製造方法
CN106382301B (zh) * 2016-10-17 2018-05-25 哈尔滨工业大学 气悬浮系统的多气足过定位水平共面调节方法
CN112818428B (zh) * 2020-12-31 2023-04-18 新拓三维技术(深圳)有限公司 一种用于cad模型面结构光全自动扫描路径规划方法
JP7465243B2 (ja) * 2021-06-28 2024-04-10 日本電子株式会社 ステージ装置および電子ビーム描画装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040080730A1 (en) * 2002-10-29 2004-04-29 Michael Binnard System and method for clamping a device holder with reduced deformation
JP4266713B2 (ja) 2003-06-03 2009-05-20 キヤノン株式会社 位置決め装置及び露光装置
JP4590846B2 (ja) * 2003-09-01 2010-12-01 株式会社ニコン 磁気浮上式ステージ装置及び露光装置
JP2011199317A (ja) * 2004-11-02 2011-10-06 Nikon Corp ステージ装置及び露光装置並びにデバイス製造方法
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
JP2009212240A (ja) * 2008-03-03 2009-09-17 Canon Inc 駆動装置、産業機械、露光装置およびデバイス製造方法
US9690213B2 (en) * 2011-09-06 2017-06-27 Kla-Tencor Corporation Linear Stage for reflective electron beam lithography

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