JP2014093329A - 位置出し治具及び位置調整方法 - Google Patents
位置出し治具及び位置調整方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 18
- 239000004065 semiconductor Substances 0.000 claims abstract description 146
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 235000012431 wafers Nutrition 0.000 description 163
- 238000010438 heat treatment Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/22—Devices influencing the relative position or the attitude of articles during transit by conveyors
- B65G47/24—Devices influencing the relative position or the attitude of articles during transit by conveyors orientating the articles
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/402—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for positioning, e.g. centring a tool relative to a hole in the workpiece, additional detection means to correct position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/37—Measurements
- G05B2219/37608—Center and diameter of hole, wafer, object
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
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- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract
【解決手段】半導体ウエハーW1を搬送する搬送具の開口部9に対する支持プレート3の突出位置を調整する際に使用される治具であって、半導体ウエハーW1の直径に等しく加工された直径の円形部11を有し、かつ、円形部11の所定の位置から、3方向以上に突出した複数のブレード12を有する本体部10と、ブレード12の各々に設けられて開口部9の周縁部位に係合されるノックピン13とを備え、ノックピン13は、円形部11の中心Cから開口部9の半径に等しい長さ分以上隔てた位置に立設され、支持プレート3の突出位置調整時、本体部10のノックピン13が開口部9の周縁部位に装着されるものである。
【選択図】 図1
Description
支持プレート3は、ベースプレート1に位置調整機構40を有しており、開口部9の内縁部位から突出した位置で半導体ウエハーW1や、W2等を支持するように位置の調整ができるようになっている。
続いて、図7及び図8を参照して、変形例としての位置出し治具100’,100”について説明する。図7に示す位置出し治具100’は、ブレード12が3個の場合である。ブレード12A,12B,12Cが直径D=150mmの円形部11’の周囲において、角度θ1=120°毎に突出しているものである。ブレード12A,12B,12Cには対応する位置にノックピン13A〜13Cが圧入されている。
2 搬送ガイド
3,3A,3B,3C,3D 支持プレート(支持部材)
4,4A,4B,4C,4D ピン
5,5A,5B,5C,5D ピンガイド
6,6A,6B,6C,6D ピン
7,7A,7B,7C,7D ピンガイド
8,34 ボルト
9,35 開口部
10 本体部
11,11’11” 円形部
12,12’,12A,12B,12C,12D ブレード(突出部)
13,13A,13B,13C,13D ノックピン(突起部)
100,100’,100” 位置出し治具
200 半導体ウエハー搬送具
Claims (3)
- 所定の大きさの半導体ウエハーの直径よりも大きな口径の開口部が設けられた本体部材と、前記本体部材に位置調整機構を有して、前記開口部の内縁部位から突出した位置で半導体ウエハーを支持する、少なくとも、3つ以上の支持部材とを備えて、半導体ウエハーを搬送する搬送具の前記開口部に対する前記支持部材の突出位置を調整する際に使用される位置出し治具であって、
前記半導体ウエハーの直径に等しく加工された直径の円形部を有し、かつ、前記円形部の所定の位置から、3方向以上に突出した複数の突出部を有する本体部と、
前記突出部の各々に設けられて前記開口部の周縁部位に係合される突起部とを備え、
前記突起部は、前記円形部の中心から前記開口部の半径に等しい長さ分以上隔てた位置に立設され、
前記支持部材の突出位置調整時、前記本体部の突起部が前記開口部の周縁部位に装着される位置出し治具。 - 前記突起部には、
所定の高さを有し、かつ、前記搬送具の開口部の外縁部位に引っ掛けられる部分と、当該開口部の内縁部位に嵌合される部分とを有する段付きピンが使用される請求項1に記載の位置出し治具。 - 所定の大きさの半導体ウエハーの直径よりも大きな口径の開口部が設けられた本体部材と、前記本体部材に位置調整機構を有して、前記開口部の内縁部位から突出した位置で半導体ウエハーを支持する、少なくとも、3つ以上の支持部材とを備えて、半導体ウエハーを搬送する搬送具の前記開口部に対する前記支持部材の突出位置を調整する位置調整方法であって、
前記半導体ウエハーの直径に等しく加工された直径の円形部を有し、かつ、前記円形部の所定の位置から、少なくとも、3方向に突出した3つの突出部を有する本体部と、前記突出部の各々に設けられて前記開口部の外縁部位及び内縁部位に係合される突起部とを備え、前記突起部が、前記円形部の中心から前記開口部の半径に等しい長さ分以上隔てた位置に立設された位置出し治具を準備する工程と、
準備された前記位置出し治具を前記搬送具の開口部に装着する工程と、
装着された前記位置出し治具の円形部の外縁部位に前記支持部材を当接するように位置を調整する工程と、
調整後の前記支持部材を前記本体部材に固定する工程とを有する位置調整方法。
Priority Applications (6)
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JP2012241259A JP5316689B1 (ja) | 2012-10-31 | 2012-10-31 | 位置出し治具及び位置調整方法 |
EP13190690.1A EP2728611B1 (en) | 2012-10-31 | 2013-10-29 | Positioning jig and method of adjusting position |
CN201310528643.9A CN103794532B (zh) | 2012-10-31 | 2013-10-30 | 找位夹具和位置调整方法 |
US14/067,660 US8899402B2 (en) | 2012-10-31 | 2013-10-30 | Positioning jig and method of adjusting position |
KR1020130129870A KR101381071B1 (ko) | 2012-10-31 | 2013-10-30 | 포지셔닝 지그 및 위치 조정 방법 |
TW102139484A TWI464828B (zh) | 2012-10-31 | 2013-10-31 | 定位治具及位置調整方法 |
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JP2012241259A JP5316689B1 (ja) | 2012-10-31 | 2012-10-31 | 位置出し治具及び位置調整方法 |
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JP5316689B1 JP5316689B1 (ja) | 2013-10-16 |
JP2014093329A true JP2014093329A (ja) | 2014-05-19 |
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US (1) | US8899402B2 (ja) |
EP (1) | EP2728611B1 (ja) |
JP (1) | JP5316689B1 (ja) |
KR (1) | KR101381071B1 (ja) |
CN (1) | CN103794532B (ja) |
TW (1) | TWI464828B (ja) |
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US10026639B2 (en) * | 2012-07-26 | 2018-07-17 | Senju Metal Industry Co., Ltd. | Semiconductor wafer conveying tool |
CN104827426A (zh) * | 2015-06-03 | 2015-08-12 | 安徽雷风动力科技有限公司 | 一种便于安装法兰的冷凝器风扇组装夹具 |
US20170032992A1 (en) * | 2015-07-31 | 2017-02-02 | Infineon Technologies Ag | Substrate carrier, a method and a processing device |
KR101650398B1 (ko) * | 2015-09-11 | 2016-08-24 | (주)코맷 | 계측기용 웨이퍼 센터링 디바이스 |
CN106945034B (zh) * | 2016-01-07 | 2021-09-03 | 鸿富锦精密电子(郑州)有限公司 | 机器人点位调节方法与系统 |
KR101857718B1 (ko) * | 2016-07-27 | 2018-05-14 | (주)신진초음파 | 이브이 각형 전지의 세척 및 건조장치 |
CN106449500A (zh) * | 2016-09-27 | 2017-02-22 | 天津华海清科机电科技有限公司 | 定位组件 |
CN110838460B (zh) * | 2018-08-15 | 2023-08-22 | 致茂电子股份有限公司 | 晶片旋转暂置台 |
KR102301191B1 (ko) * | 2019-10-15 | 2021-09-10 | (주)에스티아이 | 기판처리장치 |
CN112736014B (zh) * | 2020-12-30 | 2024-01-16 | 中科晶源微电子技术(北京)有限公司 | 用于锁定晶片的晶片锁定机构、晶片定位装置和晶片输送设备 |
CN115346890A (zh) * | 2021-05-14 | 2022-11-15 | 深圳中科飞测科技股份有限公司 | 校准设备和校准方法 |
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- 2013-10-30 CN CN201310528643.9A patent/CN103794532B/zh active Active
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EP2728611A3 (en) | 2014-12-31 |
TWI464828B (zh) | 2014-12-11 |
KR101381071B1 (ko) | 2014-04-04 |
EP2728611B1 (en) | 2016-06-01 |
EP2728611A2 (en) | 2014-05-07 |
US8899402B2 (en) | 2014-12-02 |
JP5316689B1 (ja) | 2013-10-16 |
CN103794532A (zh) | 2014-05-14 |
US20140116847A1 (en) | 2014-05-01 |
CN103794532B (zh) | 2016-08-24 |
TW201430988A (zh) | 2014-08-01 |
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