JP2014033185A - 発光素子及び発光素子パッケージ - Google Patents
発光素子及び発光素子パッケージ Download PDFInfo
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- 239000010931 gold Substances 0.000 description 9
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- 229910052759 nickel Inorganic materials 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 7
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- 239000011651 chromium Substances 0.000 description 6
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- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 6
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- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
Abstract
【解決手段】発光素子1は、第1導電型半導体層7と、第1導電型半導体層の上に配置された活性層10と、活性層の上に配置された第2導電型半導体層9とを含む。活性層は、(T+1)個のバリア層と、(T+1)個のバリア層の間に配置されたT個の井戸層と、第2導電型半導体層に隣り合う(adjacent)N個の井戸層とN個の井戸層に隣り合うN個のバリア層との間に配置されるダミー層を含む。T>N≧1である。
【選択図】図1
Description
Claims (17)
- 第1導電型半導体層と、
前記第1導電型半導体層の上に配置された活性層と、
前記活性層の上に配置された第2導電型半導体層と、を含み、
前記活性層は、
(T+1)個のバリア層と、
前記(T+1)個のバリア層の間に配置されたT個の井戸層と、
前記第2導電型半導体層に隣り合う(adjacent)N個の井戸層と前記N個の井戸層に隣り合うN個のバリア層との間に配置される第1ダミー層と、を含み、
T>N≧1であることを特徴とする、発光素子。 - 前記活性層は、
前記第1導電型半導体層に隣り合うM個の井戸層と前記M個の井戸層に隣り合うM個のバリア層との間に配置される第2ダミー層をさらに含み、
N≧M≧1であることを特徴とする、請求項1に記載の発光素子。 - 前記第1ダミー層は前記バリア層の上及び下のうちの1つの上に配置されることを特徴とする、請求項1または2に記載の発光素子。
- 前記第2ダミー層は前記バリア層の上及び下のうちの1つの上に配置されることを特徴とする、請求項1乃至3のうち、いずれか1項に記載の発光素子。
- 前記活性層は、
前記第2導電型半導体層に接する(contact)第1バリア層と前記第1バリア層に接する第1井戸層との間に配置される第3ダミー層をさらに含むことを特徴とする、請求項1乃至4のうち、いずれか1項に記載の発光素子。 - 前記第1及び第3ダミー層の各々は2nm乃至4nmであることを特徴とする、請求項5に記載の発光素子。
- 前記第1ダミー層は前記第1井戸層と接する第2バリア層の上及び下のうちの1つの上に配置されることを特徴とする、請求項5に記載の発光素子。
- 前記活性層は、
前記第1導電型半導体層に接する第3バリア層と前記第3バリア層に接する第2井戸層との間に配置される第4ダミー層をさらに含むことを特徴とする、請求項1乃至7のうち、いずれか1項に記載の発光素子。 - 前記第2及び第4ダミー層の各々は1nm乃至2nmであることを特徴とする、請求項8に記載の発光素子。
- 前記第2ダミー層は前記第2井戸層と接する第4バリア層の上及び下のうちの1つの上に配置されることを特徴とする、請求項8に記載の発光素子。
- 前記第1乃至第4ダミー層のうちの少なくとも1つは、前記第1バリア層と同一なバンドギャップを有することを特徴とする、請求項8に記載の発光素子。
- 前記第1乃至第4ダミー層のうちの少なくとも1つは、前記第1井戸層のバンドギャップと前記第1バリア層のバンドギャップとの間のバンドギャップを有することを特徴とする、請求項8に記載の発光素子。
- 前記第1乃至第4ダミー層のうちの少なくとも1つは、前記第1バリア層と同一な種類の化合物半導体材質で形成されることを特徴とする、請求項8に記載の発光素子。
- 前記(T+1)個のバリア層の各々は同一な厚さを有することを特徴とする、請求項1乃至13のうち、いずれか1項に記載の発光素子。
- 前記活性層は450nm以上のピーク波長の光を生成することを特徴とする、請求項1乃至14のうち、いずれか1項に記載の発光素子。
- 前記第1導電型半導体層はn型半導体層であり、
前記第2導電型半導体層はp型半導体層であることを特徴とする、請求項1乃至15のうち、いずれか1項に記載の発光素子。 - 支持体と、
前記支持体の上に第1及び第2電極ラインと、
前記支持体及び前記第1及び第2電極ラインのうちのいずれか1つの上に配置され、請求項1乃至16のうち、いずれか1項による発光素子と、
を含むことを特徴とする、発光素子パッケージ。
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KR1020120086010A KR20140019635A (ko) | 2012-08-06 | 2012-08-06 | 발광 소자 및 발광 소자 패키지 |
KR10-2012-0086010 | 2012-08-06 |
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JP2014033185A true JP2014033185A (ja) | 2014-02-20 |
JP2014033185A5 JP2014033185A5 (ja) | 2016-06-16 |
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KR (1) | KR20140019635A (ja) |
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JP2015018840A (ja) * | 2013-07-08 | 2015-01-29 | 株式会社東芝 | 半導体発光素子 |
US9640716B2 (en) * | 2015-07-28 | 2017-05-02 | Genesis Photonics Inc. | Multiple quantum well structure and method for manufacturing the same |
EP3940070A1 (en) | 2015-10-05 | 2022-01-19 | Precision Biosciences, Inc. | Engineered meganucleases with recognition sequences found in the human t cell receptor alpha constant region gene |
EP4108255A1 (en) | 2015-10-05 | 2022-12-28 | Precision Biosciences, Inc. | Genetically-modified cells comprising a modified human t cell receptor alpha constant region gene |
WO2018073393A2 (en) | 2016-10-19 | 2018-04-26 | Cellectis | Tal-effector nuclease (talen) -modified allogenic cells suitable for therapy |
EP3645038A1 (en) | 2017-06-30 | 2020-05-06 | Precision Biosciences, Inc. | Genetically-modified t cells comprising a modified intron in the t cell receptor alpha gene |
IL304025A (en) | 2018-04-12 | 2023-08-01 | Prec Biosciences Inc | Optimized engineered nucleases with specificity for the human T cell receptor alpha constant region gene |
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Also Published As
Publication number | Publication date |
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US20140034902A1 (en) | 2014-02-06 |
KR20140019635A (ko) | 2014-02-17 |
US9349914B2 (en) | 2016-05-24 |
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